Patents by Inventor Takashi Kashiwaba
Takashi Kashiwaba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11566177Abstract: The present invention aims to provide a dry etching agent having less load on global environment and capable of anisotropic etching without the use of special equipment and obtaining a good processing shape and to provide a dry etching method using the dry etching agent. The dry etching agent according the present invention contains at least a hydrofluoroalkylene oxide represented by the following chemical formula: CF3—CxHyFzO (where x=2 or 3; y=1, 2, 3, 4 or 5; and z=2x?1?y) and having an oxygen-containing three-membered ring. The dry etching method according to the present invention includes selectively etching of at least one kind of silicon-based material selected from the group consisting of silicon dioxide, silicon nitride, polycrystalline silicon, amorphous silicon and silicon carbide with the use of a plasma gas generated by plasmatization of the dry etching agent.Type: GrantFiled: February 20, 2018Date of Patent: January 31, 2023Assignee: Central Glass Company, LimitedInventors: Hiroyuki Oomori, Akifumi Yao, Takashi Kashiwaba
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Patent number: 10793540Abstract: The present invention provides an industrially applicable method for production of a fluorine-containing cyclopropane carboxylic acid compound useful as an intermediate for pharmaceutical and agrichemical products. A fluorine-containing cyclopropane monoester is obtained by: forming a fluorine-containing cyclic sulfate with the use of a fluorine-containing diol compound and sulfuryl fluoride (as a cyclic sulfuric esterification step); reacting the fluorine-containing cyclic sulfate with a malonic diester, thereby forming a fluorine-containing cyclopropane diester (as a cyclopropanation step); and hydrolyzing the fluorine-containing cyclopropane diester (as a hydrolysis step).Type: GrantFiled: September 5, 2019Date of Patent: October 6, 2020Assignee: Central Glass Company, LimitedInventors: Takashi Kashiwaba, Takako Yamazaki, Shoko Ishii, Shunsuke Mimura, Masanori Fushimi, Ryuichi Okamoto, Haruki Kobayashi, Manabu Yasumoto
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Publication number: 20190389831Abstract: The present invention provides an industrially applicable method for production of a fluorine-containing cyclopropane carboxylic acid compound useful as an intermediate for pharmaceutical and agrichemical products. A fluorine-containing cyclopropane monoester is obtained by: forming a fluorine-containing cyclic sulfate with the use of a fluorine-containing diol compound and sulfuryl fluoride (as a cyclic sulfuric esterification step); reacting the fluorine-containing cyclic sulfate with a malonic diester, thereby forming a fluorine-containing cyclopropane diester (as a cyclopropanation step); and hydrolyzing the fluorine-containing cyclopropane diester (as a hydrolysis step).Type: ApplicationFiled: September 5, 2019Publication date: December 26, 2019Inventors: Takashi KASHIWABA, Takako YAMAZAKI, Shoko ISHII, Shunsuke MIMURA, Masanori FUSHIMI, Ryuichi OKAMOTO, Haruki KOBAYASHI, Manabu YASUMOTO
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Publication number: 20190345385Abstract: The present invention aims to provide a dry etching agent having less load on global environment and capable of anisotropic etching without the use of special equipment and obtaining a good processing shape and to provide a dry etching method using the dry etching agent. The dry etching agent according the present invention contains at least a hydrofluoroalkylene oxide represented by the following chemical formula: CF3—CxHyFzO (where x=2 or 3; y=1, 2, 3, 4 or 5; and z=2x?1?y) and having an oxygen-containing three-membered ring. The dry etching method according to the present invention includes selectively etching of at least one kind of silicon-based material selected from the group consisting of silicon dioxide, silicon nitride, polycrystalline silicon, amorphous silicon and silicon carbide with the use of a plasma gas generated by plasmatization of the dry etching agent.Type: ApplicationFiled: February 20, 2018Publication date: November 14, 2019Inventors: Hiroyuki OOMORI, Akifumi YAO, Takashi KASHIWABA
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Patent number: 10450291Abstract: The present invention provides an industrially applicable method for production of a fluorine-containing cyclopropane carboxylic acid compound useful as an intermediate for pharmaceutical and agrichemical products. A fluorine-containing cyclopropane monoester is obtained by: forming a fluorine-containing cyclic sulfate with the use of a fluorine-containing dial compound and sulfuryl fluoride (as a cyclic sulfuric esterification step); reacting the fluorine-containing cyclic sulfate with a malonic diester, thereby forming a fluorine-containing cyclopropane diester (as a cyclopropanation step); and hydrolyzing the fluorine-containing cyclopropane diester (as a hydrolysis step).Type: GrantFiled: June 24, 2016Date of Patent: October 22, 2019Assignee: Central Glass Company, LimitedInventors: Takashi Kashiwaba, Takako Yamazaki, Shoko Ishii, Shunsuke Mimura, Masanori Fushimi, Ryuichi Okamoto, Haruki Kobayashi, Manabu Yasumoto
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Publication number: 20180186763Abstract: The present invention provides an industrially applicable method for production of a fluorine-containing cyclopropane carboxylic acid compound useful as an intermediate for pharmaceutical and agrichemical products. A fluorine-containing cyclopropane monoester is obtained by: forming a fluorine-containing cyclic sulfate with the use of a fluorine-containing dial compound and sulfuryl fluoride (as a cyclic sulfuric esterification step); reacting the fluorine-containing cyclic sulfate with a malonic diester, thereby forming a fluorine-containing cyclopropane diester (as a cyclopropanation step); and hydrolyzing the fluorine-containing cyclopropane diester (as a hydrolysis step).Type: ApplicationFiled: June 24, 2016Publication date: July 5, 2018Inventors: Takashi KASHIWABA, Takako YAMAZAKI, Shoko ISHII, Shunsuke MIMURA, Masanori FUSHIMI, Ryuichi OKAMOTO, Haruki KOBAYASHI, Manabu YASUMOTO
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Publication number: 20180050976Abstract: It is possible to produce a fluorine-containing ?-ketocarboxylic ester hydrate by reacting a fluorine-containing ?-hydroxycarboxylic ester with sodium hypochlorite or calcium hypochlorite of 21 mass % or greater in mass percentage of composition. Furthermore, it is possible to produce a fluorine-containing ?-ketocarboxylic ester by reacting the hydrate with a dehydrating agent. Furthermore, it is possible to produce a fluorine-containing ?-ketocarboxylic ester hemiketal by reacting the fluorine-containing ?-ketocarboxylic ester hydrate with a lower alcohol or a trialkyl orthocarboxylate. Moreover, it is possible to produce a fluorine-containing ?-ketocarboxylic ester by reacting the hemiketal with a dealcoholization agent.Type: ApplicationFiled: January 22, 2016Publication date: February 22, 2018Inventors: Shoko ISHII, Takako YAMAZAKI, Takashi KASHIWABA, Ryuichi OKAMOTO, Akihiro ISHII
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Patent number: 9073828Abstract: In a method for obtaining an alkali metal perfluoroalkanesulfinate by reacting a perfluoroalkanesulfonyl halide with a sulfur-containing reducing agent in the presence of water, a reaction liquid containing the alkali metal sulfinate obtained after the reaction is concentrated till a specific concentration, thereby inorganic salts, which are impurities in the solution, are precipitated and removed, and a filtrate after removing the inorganic salts is subjected to an operation such as concentration and drying, thereby obtaining the target alkali metal perfluorosulfinate with a high purity and a good operability. Furthermore, an organic solvent for extraction becomes unnecessary. Therefore, it is possible to greatly reduce wastes.Type: GrantFiled: March 3, 2011Date of Patent: July 7, 2015Assignee: Central Glass Company, LimitedInventors: Takashi Kashiwaba, Tsutomu Nanmyo, Yoichi Takenaka
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Patent number: 8987507Abstract: Disclosed is a method for producing a fluoroalkanesulfonic acid including (1) the step of reacting concentrated sulfuric acid and/or fuming sulfuric acid with a fluoroalkanesulfonate to cause an acid decomposition, thereby obtaining a reaction mixture containing the fluoroalkanesulfonic acid and a sulfur component; and (2) the step of adding an oxidizing agent to the reaction mixture obtained by the above step and then conducting a distillation, thereby obtaining the fluoroalkanesulfonic acid from the reaction mixture. It is possible by this method to efficiently reduce the sulfur component, thereby industrially advantageously obtaining fluoroalkanesulfonic acid of high purity.Type: GrantFiled: August 2, 2012Date of Patent: March 24, 2015Assignee: Central Glass Company, LimitedInventors: Tatsuya Irie, Kenji Isoyama, Tatsuo Miyazaki, Takashi Kashiwaba, Tsutomu Nanmyo
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Publication number: 20140171678Abstract: Disclosed is a method for producing a fluoroalkanesulfonic acid including (1) the step of reacting concentrated sulfuric acid and/or fuming sulfuric acid with a fluoroalkanesulfonate to cause an acid decomposition, thereby obtaining a reaction mixture containing the fluoroalkanesulfonic acid and a sulfur component; and (2) the step of adding an oxidizing agent to the reaction mixture obtained by the above step and then conducting a distillation, thereby obtaining the fluoroalkanesulfonic acid from the reaction mixture. It is possible by this method to efficiently reduce the sulfur component, thereby industrially advantageously obtaining fluoroalkanesulfonic acid of high purity.Type: ApplicationFiled: August 2, 2012Publication date: June 19, 2014Applicant: Central Glass Company, LimitedInventors: Tatsuya Irie, Kenji Isoyama, Tatsuo Miyazaki, Takashi Kashiwaba, Tsutomu Nanmyo
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Publication number: 20130023695Abstract: In a method for obtaining an alkali metal perfluoroalkanesulfinate by reacting a perfluoroalkanesulfonyl halide with a sulfur-containing reducing agent in the presence of water, a reaction liquid containing the alkali metal sulfinate obtained after the reaction is concentrated till a specific concentration, thereby inorganic salts, which are impurities in the solution, are precipitated and removed, and a filtrate after removing the inorganic salts is subjected to an operation such as concentration and drying, thereby obtaining the target alkali metal perfluorosulfinate with a high purity and a good operability. Furthermore, an organic solvent for extraction becomes unnecessary. Therefore, it is possible to greatly reduce wastes.Type: ApplicationFiled: March 3, 2011Publication date: January 24, 2013Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Takashi Kashiwaba, Tsutomu Nanmyo, Yoichi Takenaka