Patents by Inventor Takashi Kyotani

Takashi Kyotani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8476739
    Abstract: A graphene-on-oxide substrate according to the present invention includes: a substrate having a metal oxide layer formed on its surface; and, formed on the metal oxide layer, a graphene layer including at least one atomic layer of the graphene. The graphene layer is grown generally parallel to the surface of the metal oxide layer, and the inter-atomic-layer distance between the graphene atomic layer adjacent to the surface of the metal oxide layer and the surface atomic layer of the metal oxide layer is 0.34 nm or less. Preferably, the arithmetic mean surface roughness Ra of the metal oxide layer is 1 nm or less.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: July 2, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Okai, Motoyuki Hirooka, Takashi Kyotani, Hironori Orikasa
  • Publication number: 20110052486
    Abstract: The present invention provides a microporous carbon material capable of expressing functions that supported metal has while maintaining pore functions that the microporous carbon material inherently possesses. The microporous carbon material 5 includes: a three-dimensional long-range ordered structure within a range from 0.7 nm or more to 2 nm or less; and micropores 2a, wherein a transition metal 4 is supported on surfaces of the micropores 2a. The microporous carbon material is obtained by a method including: introducing an organic compound on a surface of and inside the micropores of a porous material containing transition metal, and obtaining a composite of the microporous carbon material containing the transition metal and the porous material by carbonizing the organic compound by a chemical vapor deposition method; and removing the porous material.
    Type: Application
    Filed: February 25, 2009
    Publication date: March 3, 2011
    Inventors: Masashi Ito, Takashi Kyotani, Hirotomo Nishihara, Peng-Xiang Hou, Li-Xiang Li, Kyohei Hada, Kazuhiko Mizuuchi
  • Publication number: 20100200839
    Abstract: A graphene-on-oxide substrate according to the present invention includes: a substrate having a metal oxide layer formed on its surface; and, formed on the metal oxide layer, a graphene layer including at least one atomic layer of the graphene. The graphene layer is grown generally parallel to the surface of the metal oxide layer, and the inter-atomic-layer distance between the graphene atomic layer adjacent to the surface of the metal oxide layer and the surface atomic layer of the metal oxide layer is 0.34 nm or less. Preferably, the arithmetic mean surface roughness Ra of the metal oxide layer is 1 nm or less.
    Type: Application
    Filed: November 24, 2009
    Publication date: August 12, 2010
    Inventors: Makoto Okai, Motoyuki Hirooka, Takashi Kyotani, Hironori Orikasa
  • Patent number: 7736440
    Abstract: A solid product removal method for removing a solid product adhering to a gas exhaust pipe member having a rinsing water inlet pipe member with a tip opening located inside the gas exhaust pipe member for feeding rinsing water into the inside of the gas exhaust pipe member from the tip opening thereof; hence a solid product formed newly upon reaction with the rinsing water and adhering thereto can be rinsed off with the rinsing water introduced from another tip opening located at a different position; and therefore, an adherence of the solid product can be prevented from heating the inner face of the gas exhaust pipe member. A scraping member for scraping the solid product stuck to the inner face of the gas exhaust pipe member may be used.
    Type: Grant
    Filed: August 8, 2001
    Date of Patent: June 15, 2010
    Assignee: Ebara Corporation
    Inventors: Hiroshi Ikeda, Takashi Kyotani, Takanori Samejima, Kenji Kamimura, Munetaka Kitajima
  • Publication number: 20100086459
    Abstract: An impurity removing apparatus is simple in structure for removing impurities from a rare gas and enable to make the rare gas reusable. The impurity removing apparatus includes a first treatment device 21 for removing fluorine and fluorine compound which are mixed with a rare gas discharged from an excimer laser oscillation apparatus 10, a second treatment device 23 for removing oxygen generated by the first treatment device, and a circulation device 25 for circulating the rare gas discharged from the excimer laser oscillation apparatus 10 and returning the rare gas to the excimer laser oscillation apparatus 10.
    Type: Application
    Filed: September 29, 2009
    Publication date: April 8, 2010
    Inventors: Hiroshi Ikeda, Takashi Kyotani, Yasuhiko Suzuki, Masaaki Osato
  • Patent number: 7375366
    Abstract: A carbon nanotube has a carbon network film of polycrystalline structure divided into crystal regions along the axis of the tube, and the length along the tube axis of each crystal region preferably ranges from 3 to 6 nm. An electron source includes a carbon nanotube having a cylindrical shape and the end of which on the substrate side is closed and disposed in a fine hole. The end on the substrate side of the tube is firmly adhered to the substrate. The carbon nanotube is produced by a method in which carbon is deposited under the condition that no metal catalyst is present in the fine hole and produced by a method in which after the carbon deposition the end of the carbon deposition film is modified by etching the carbon deposition film using a plasma.
    Type: Grant
    Filed: February 22, 2001
    Date of Patent: May 20, 2008
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Hiroshi Ohki, Tsunaki Tsunesada, Masao Urayama, Takashi Kyotani, Keitarou Matsui, Akira Tomita
  • Patent number: 7335408
    Abstract: A carbon nanotube composite material contains a carbon nanotube and a continuous layer of a metal covering the inner surface of the carbon nanotube. It is produced by forming a metallic matrix layer and treating the metallic matrix layer to form plural nanoholes in the metallic matrix layer to thereby form a nanohole structure, the nanoholes extending in a direction substantially perpendicular to the plane of the metallic matrix layer; forming carbon nanotubes inside the nanoholes; and covering inner surfaces of the carbon nanotubes with a continuous layer of a metal. It has a well controlled small size, has excellent and uniform physical properties, is resistant to oxidation of the metal with time, is highly chemically stable, has good durability enabling repetitive use, has good coatability, high wettability and dispersibility with other materials, is easily chemically modified, is easily handled and is useful in various fields.
    Type: Grant
    Filed: September 22, 2004
    Date of Patent: February 26, 2008
    Assignees: Fujitsu Limited, Tohoku University
    Inventors: Takashi Kyotani, Tomonori Ogawa, Kenichi Ito, Hideyuki Kikuchi, Hiroshi Nakao, Tsugio Kumai
  • Publication number: 20070237705
    Abstract: To provide a carbon nanotube chain consisting of a row of carbon nanotubes, the carbon nanotube chain being suitably used for instance as a target detector or sensor, and an efficient production process for the same. The carbon nanotube chain includes a support, and a plurality of carbon nanotubes bonded at one end to a surface of the support, wherein the plurality of carbon nanotubes is oriented in a direction substantially orthogonal to the surface of the support.
    Type: Application
    Filed: March 29, 2007
    Publication date: October 11, 2007
    Applicants: FUJITSU LIMITED, TOHOKU UNIVERSITY, KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY
    Inventors: Ken-Ichi Itoh, Hideki Masuda, Takashi Kyotani
  • Publication number: 20050271568
    Abstract: An apparatus for treatment of a waste gas, containing fluorine-containing compounds, comprises: a solids treating device for separating solids from the waste gas; an addition device for adding H2 and/or H2O, or H2 and/or H2O and O2, as a decomposition assist gas to the waste gas leaving the solids treating device; a thermal decomposition device that is packed with ?-alumina heated at 600-900° C., and which thermally decomposes the waste gas to which the decomposition assist gas has been added; an acidic gas treating device for removing acidic gases from the thermally decomposed waste gas; and channels or lines for connecting these devices in sequence. The apparatus preferably includes an air ejector which is capable of adjusting an internal pressure of the apparatus.
    Type: Application
    Filed: August 12, 2005
    Publication date: December 8, 2005
    Inventors: Yoichi Mori, Takashi Kyotani, Toyoji Shinohara
  • Publication number: 20050255313
    Abstract: A carbon nanotube composite material contains a carbon nanotube and a continuous layer of a metal covering the inner surface of the carbon nanotube. It is produced by forming a metallic matrix layer and treating the metallic matrix layer to form plural nanoholes in the metallic matrix layer to thereby form a nanohole structure, the nanoholes extending in a direction substantially perpendicular to the plane of the metallic matrix layer; forming carbon nanotubes inside the nanoholes; and covering inner surfaces of the carbon nanotubes with a continous layer of a metal. It has a well controlled small size, has excellent and uniform physical properties, is resistant to oxidation of the metal with time, is highly chemically stable, has good durability enabling repetitive use, has good coatability, high wettability and dispersibility with other materials, is easily chemically modified, is easily handled and is useful in various fields.
    Type: Application
    Filed: September 22, 2004
    Publication date: November 17, 2005
    Applicants: FUJITSU LIMITED, TAKASHI KYOTANI
    Inventors: Takashi Kyotani, Tomonori Ogawa, Kenichi Ito, Hideyuki Kikuchi, Hiroshi Nakao, Tsugio Kumai
  • Patent number: 6953557
    Abstract: A process and an apparatus for treating exhaust gases, comprising an aeration stirring tank (5) employing an aqueous alkaline liquid, and, as a posterior stage, a gas-liquid contact device (7) and/or a packed column (11). The apparatus can remove at the posterior stage harmful gases that the aeration stirring tank fails to remove, for example, water-soluble organic compounds such as ethanol, halogenated silicon compounds such as SiCl4, and halogen gases such as F2 and Cl2. The process and apparatus are particularly suitable for purifying exhaust gases discharged from a semiconductor production device.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: October 11, 2005
    Assignee: Ebara Corporation
    Inventors: Hiroshi Ikeda, Yasuhiro Kubota, Takashi Kyotani
  • Patent number: 6949225
    Abstract: An apparatus for treatment of a waste gas, containing fluorine-containing compounds, comprises: a solids treating device for separating solids from the waste gas; an addition device for adding H2 and/or H2O, or H2 and/or H2O and O2, as a decomposition assist gas to the waste gas leaving the solids treating device; a thermal decomposition device that is packed with ?-alumina heated at 600–900° C., and which thermally decomposes the waste gas to which the decomposition assist gas has been added; an acidic gas treating device for removing acidic gases from the thermally decomposed waste gas; and channels or lines for connecting these devices in sequence. The apparatus preferably includes an air ejector which is capable of adjusting an internal pressure of the apparatus.
    Type: Grant
    Filed: November 17, 2000
    Date of Patent: September 27, 2005
    Assignee: Ebara Corporation
    Inventors: Yoichi Mori, Takashi Kyotani, Toyoji Shinohara
  • Patent number: 6682002
    Abstract: An ejector is provided with an interior surface wetting device for introducing a cleaning liquid into a suction chamber of the ejector to form a thin wall of the cleaning liquid covering an interior surface of the ejector. The interior surface wetting device includes a cleaning liquid inlet opening to be fluidly connected to a source of cleaning liquid and a cleaning liquid outlet opening for introducing the cleaning liquid into a suction chamber. The wetting device may be in the form of a pipe which extends from the outside of the ejector into the suction chamber to supply a cleaning liquid to a desired portion in the suction chamber.
    Type: Grant
    Filed: August 9, 2001
    Date of Patent: January 27, 2004
    Assignee: Ebara Corporation
    Inventor: Takashi Kyotani
  • Publication number: 20030175176
    Abstract: A solid product removal apparatus for removing a solid product adhering to an gas exhaust pipe member has a rinsing water inlet pipe member having a tip opening located inside the gas exhaust pipe member for feeding rinsing water into the inside of the gas exhaust pipe member from the tip opening thereof. The solid product removal apparatus is particularly useful when exhaust gas contains an ingredient capable of forming a solid product upon reaction with water inside the gas exhaust pipe member and can rinse off the solid product adhering to the inner face of the gas exhaust pipe member with rinsing water.
    Type: Application
    Filed: February 5, 2003
    Publication date: September 18, 2003
    Inventors: Hiroshi Ikeda, Takashi Kyotani, Takanori Samejima, Kenji Kamimura, Munetaka Kitajima
  • Publication number: 20030143398
    Abstract: A carbon nanotube has a carbon network film of polycrystalline structure divided into crystal regions along the axis of the tube, and the length along the tube axis of each crystal region preferably ranges from 3 to 6 nm. An electron source includes a carbon nanotube having a cylindrical shape and the end of which on the substrate side is closed and disposed in a fine hole. The end on the substrate side of the tube is firmly adhered to the substrate. The carbon nanotube is produced by a method in which carbon is deposited under the condition that no metal catalyst is present in the fine hole and produced by a method in which after the carbon deposition the end of the carbon deposition film is modified by etching the carbon deposition film using a plasma.
    Type: Application
    Filed: December 12, 2002
    Publication date: July 31, 2003
    Inventors: Hiroshi Ohki, Tsunaki Tsunesada, Masao Urayama, Takashi Kyotani, Keitarou Matsui, Akira Tomita
  • Patent number: 6409802
    Abstract: A method for preventing scale formation in a wet type exhaust gas treating apparatus is disclosed. An exhaust gas is contacted with a washing liquid containing water. The washing liquid contains at least one chelating agent which reacts with ions becoming a cause of scale formation to form a water-soluble chelate compound.
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: June 25, 2002
    Assignee: Ebara Corporation
    Inventor: Takashi Kyotani
  • Publication number: 20020030121
    Abstract: An ejector is provided with an Interior surface wetting device for introducing a cleaning liquid into a suction chamber of the ejector to form a thin wall of the cleaning liquid covering an interior surface of the ejector. The interior surface wetting device includes a cleaning liquid inlet opening to be fluidly connected to a source of cleaning liquid and a cleaning liquid outlet opening for introducing the cleaning liquid into a suction chamber The wetting device may be in the form of a pipe which extends from the outside of the ejector into the suction chamber to supply a cleaning liquid to a desired portion in the suction chamber.
    Type: Application
    Filed: August 9, 2001
    Publication date: March 14, 2002
    Inventor: Takashi Kyotani
  • Patent number: 5693210
    Abstract: Disclosed is a method of manufacturing a porous alumina tube with numerous pores having a uniform shape and a uniform diameter of 5 to 200 nm and extending linearly in the vertical direction to the outer peripheral surface thereof, which comprises the steps of forming an anodized layer by anodizing the outer peripheral surface of an aluminum tube, and removing the aluminum tube after the anodized layer is formed.
    Type: Grant
    Filed: August 26, 1996
    Date of Patent: December 2, 1997
    Assignee: President of Tohoku University
    Inventors: Akira Tomita, Takashi Kyotani, Yoshio Kobayashi
  • Patent number: 4921687
    Abstract: A method making high-orientation sheet-like graphite by inserting monomer of high molecular compound between layers of laminar compound such as montmorillonite, polymerizing the monomer, preliminarily carbonizing the thus formed polymer, removing the laminar compound by acid treatment, and effecting graphitization at a high temperature.
    Type: Grant
    Filed: July 26, 1988
    Date of Patent: May 1, 1990
    Assignee: Tohoku University
    Inventors: Akira Tomita, Takashi Kyotani, Naohiro Sonobe