Patents by Inventor Takashi Meguro

Takashi Meguro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11972950
    Abstract: There is provided a semiconductor device, a hydrogen concentration distribution has a hydrogen concentration peak, a helium concentration distribution has a helium concentration peak, and a donor concentration distribution has a first donor concentration peak and a second donor concentration peak; the hydrogen concentration peak and the first donor concentration peak are located at a first depth, and the helium concentration peak and the second donor concentration peak are located at a second depth; each concentration peak has an upward slope; and a value which is obtained by normalizing a gradient of the upward slope of the second donor concentration peak by a gradient of the upward slope of the helium concentration peak is smaller than a value which is obtained by normalizing a gradient of the upward slope of the first donor concentration peak by a gradient of the upward slope of the hydrogen concentration peak.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: April 30, 2024
    Assignee: FUJI ELECTRIC CO., LTD.
    Inventors: Misaki Meguro, Takashi Yoshimura, Hiroshi Takishita, Naoko Kodama, Yasunori Agata
  • Patent number: 11935945
    Abstract: Provided is a semiconductor device, comprising: a semiconductor substrate having an upper surface, a lower surface, and a center position equidistant from the upper surface and the lower surface in a depth direction of the semiconductor substrate. An N-type region with an N-type conductivity is provided in the semiconductor substrate such that the N-type region includes the center position of the semiconductor substrate. The N-type region includes an acceptor with a concentration that is a lower concentration than a carrier concentration, and is 0.001 times or more of a carrier concentration at the center position of the semiconductor substrate.
    Type: Grant
    Filed: April 21, 2021
    Date of Patent: March 19, 2024
    Assignee: FUJI ELECTRIC CO., LTD.
    Inventors: Hiroshi Takishita, Takashi Yoshimura, Misaki Meguro, Michio Nemoto
  • Patent number: 11013824
    Abstract: An adhesive for hard tissue bonding which has a sufficient pot life and excellent biocompatibility and is replaced with bone over time, and an adhesive kit for hard tissue bonding are provided. In addition, bone cement is provided which has excellent biocompatibility and is replaced with bone over time. An adhesive for hard tissue bonding includes: a cyanoacrylate monomer; and beta-tricalcium phosphate or hydroxyapatite. An adhesive kit for hard tissue bonding includes: a liquid agent containing a cyanoacrylate monomer; and a powdery agent containing beta-tricalcium phosphate or hydroxyapatite. Bone cement includes: a cyanoacrylate polymer; and beta-tricalcium phosphate or hydroxyapatite.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: May 25, 2021
    Assignees: Chiba Institute of Technology, Fukuyamaika Corporation
    Inventors: Kazuaki Hashimoto, Hirobumi Shibata, Syuhei Aida, Shigeo Fukuyama, Takashi Meguro, Shinya Tanaka
  • Publication number: 20200023095
    Abstract: An adhesive for hard tissue bonding which has a sufficient pot life and excellent biocompatibility and is replaced with bone over time, and an adhesive kit for hard tissue bonding are provided. In addition, bone cement is provided which has excellent biocompatibility and is replaced with bone over time. An adhesive for hard tissue bonding includes: a cyanoacrylate monomer; and beta-tricalcium phosphate or hydroxyapatite. An adhesive kit for hard tissue bonding includes: a liquid agent containing a cyanoacrylate monomer; and a powdery agent containing beta-tricalcium phosphate or hydroxyapatite. Bone cement includes: a cyanoacrylate polymer; and beta-tricalcium phosphate or hydroxyapatite.
    Type: Application
    Filed: March 27, 2018
    Publication date: January 23, 2020
    Applicants: Chiba Institute of Technology, Fukuyamaika Corporation
    Inventors: Kazuaki Hashimoto, Hirobumi Shibata, Syuhei Aida, Shigeo Fukuyama, Takashi Meguro, Shinya Tanaka
  • Publication number: 20190228605
    Abstract: An information providing system includes a distribution device configured to distribute a display information item corresponding to an address information item, a controller configured to link the address information item to an identification information item, a transmitter in a place where an entertainment is held, the transmitter configured to transmit a transmission signal obtained by encoding the identification information item, and a receiving terminal configured to receive the transmission signal from the transmitter and decode the transmission signal into the identification information item. The display information item displays a ranking based on a number of received votes each of entrants for the entertainment has received. The distribution device is configured to update, at predetermined time intervals, the display information item that indicates the ranking based on the number of received votes and to set the address information item to correspond to a plurality of display information items.
    Type: Application
    Filed: July 12, 2016
    Publication date: July 25, 2019
    Inventors: Ryuichiro YAO, Takashi MEGURO
  • Patent number: 8400611
    Abstract: An apparatus including an original stage that holds an original, a substrate stage that holds a substrate, and a projection optical system that projects a pattern of the original onto the substrate, and being configured to scan and expose the substrate during a period in which the speeds of the original stage and the substrate stage change, comprises a controller configured to correct, a distortion generated in an image transferred onto the substrate due to at least one of deformation of the original stage in response to a change in speed of the original stage and deformation of the substrate stage in response to a change in speed of the substrate stage, based on a correction value determined by an acceleration of the substrate stage.
    Type: Grant
    Filed: November 17, 2009
    Date of Patent: March 19, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tomohiro Harayama, Takashi Meguro
  • Publication number: 20100123891
    Abstract: An apparatus including an original stage that holds an original, a substrate stage that holds a substrate, and a projection optical system that projects a pattern of the original onto the substrate, and being configured to scan and expose the substrate during a period in which the speeds of the original stage and the substrate stage change, comprises a controller configured to correct, a distortion generated in an image transferred onto the substrate due to at least one of deformation of the original stage in response to a change in speed of the original stage and deformation of the substrate stage in response to a change in speed of the substrate stage, based on a correction value determined by an acceleration of the substrate stage.
    Type: Application
    Filed: November 17, 2009
    Publication date: May 20, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Tomohiro Harayama, Takashi Meguro
  • Patent number: 7463335
    Abstract: An exposure apparatus for illuminating an original through an illumination system and for transferring a pattern of the original onto a substrate. The apparatus includes a movable element having a blade, the blade being provided in the illumination system and blocking at least a portion of illumination light, a stator configured to relatively move the movable element, and a resilient supporting member configured to resiliently support the stator without contacting the stator.
    Type: Grant
    Filed: June 13, 2007
    Date of Patent: December 9, 2008
    Assignee: Canon Kabuhsiki Kaisha
    Inventors: Yoshikazu Miyajima, Takashi Meguro
  • Publication number: 20070285648
    Abstract: An exposure apparatus for illuminating an original through an illumination system and for transferring a pattern of the original onto a substrate. The apparatus includes a movable element having a blade, the blade being provided in the illumination system and blocking at least a portion of illumination light, a stator configured to relatively move the movable element, and a resilient supporting member configured to resiliently support the stator without contacting the stator.
    Type: Application
    Filed: June 13, 2007
    Publication date: December 13, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Yoshikazu MIYAJIMA, Takashi Meguro
  • Patent number: 7253877
    Abstract: An exposure apparatus for projecting, by exposure, a pattern of an original onto a substrate. The apparatus includes a light blocking device for blocking at least a portion of exposure light. The light blocking device includes two plate-like members which are disposed in a vertical direction with a clearance kept therebetween, and two plate-like members which are disposed in a horizontal direction with a clearance kept therebetween. The apparatus further includes a driving member for moving the light blocking device, wherein the driving member includes the stator, and a reaction force absorbing device for absorbing a drive reaction force of the driving member. The reaction force absorbing device absorbs the reaction force by moving the stator of the driving member.
    Type: Grant
    Filed: October 18, 2005
    Date of Patent: August 7, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshikazu Miyajima, Takashi Meguro
  • Publication number: 20060114433
    Abstract: Disclosed is an exposure apparatus for projecting, by exposure, a pattern of an original onto a substrate, the exposure apparatus including comprising a light blocking system for blocking at least a portion of exposure light, a driving system for moving the light blocking system, and a reaction force absorbing system for absorbing a drive reaction force of the driving system, wherein the driving system includes a stator, and wherein the reaction force absorbing system absorbs the reaction force by moving the stator of the driving system. With this structure, adverse influence of vibratory external disturbance to be caused by a drive reaction force as the blade of the light blocking system is driven, can be reduced significantly.
    Type: Application
    Filed: October 18, 2005
    Publication date: June 1, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Yoshikazu Miyajima, Takashi Meguro
  • Publication number: 20060017909
    Abstract: A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.
    Type: Application
    Filed: August 25, 2005
    Publication date: January 26, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Yasuyo Muto, Kazunori Iwamoto, Yukio Takabayashi, Takashi Meguro
  • Patent number: 6965428
    Abstract: A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: November 15, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasuyo Muto, Kazunori Iwamoto, Yukio Takabayashi, Takashi Meguro
  • Publication number: 20040124594
    Abstract: A stage apparatus is a stage apparatus having a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted, and a fixing member which fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.
    Type: Application
    Filed: November 12, 2003
    Publication date: July 1, 2004
    Applicant: Canon Kabushiki Kaisha
    Inventors: Yasuyo Muto, Kazunori Iwamoto, Yukio Takabayashi, Takashi Meguro
  • Patent number: 6451087
    Abstract: The method for producing a mother alloy for an iron-based amorphous alloy has the steps of (a) melting raw materials for elements constituting the amorphous alloy together with at least one oxide of an element constituting the amorphous alloy, the raw materials containing aluminum as an inevitable impurity, and the oxide having a smaller standard free energy of formation than that of Al2O3 in an absolute value; and (b) removing the resultant Al2O3 from the melt, thereby reducing the content of aluminum to 50 ppm or less in the melt.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: September 17, 2002
    Assignee: Hitachi Metals Ltd.
    Inventors: Yoshio Bizen, Setsuo Mishima, Takashi Meguro
  • Patent number: 6425960
    Abstract: A soft magnetic alloy strip is manufactured by a single roll method. The soft magnetic alloy strip is 0.2×d mm or less (, which “d” is a width of the strip,) in warpage in the widthwise direction of the strip, and has a continuous, long length not less than 50 m, in which a width of an air pockets occurring on a roll contact face is not more than 35 &mgr;m, a length of the air pockets is not more than 150 &mgr;m, and the centerline average roughness Ra of the roll contact face is not more than 0.5 &mgr;m.
    Type: Grant
    Filed: April 14, 2000
    Date of Patent: July 30, 2002
    Assignee: Hitachi Metals, Ltd.
    Inventors: Yoshihito Yoshizawa, Yoshio Bizen, Shunsuke Arakawa, Michihiro Nagao, Takashi Meguro
  • Publication number: 20010054330
    Abstract: The method for producing a mother alloy for an iron-based amorphous alloy has the steps of (a) melting raw materials for elements constituting the amorphous alloy together with at least one oxide of an element constituting the amorphous alloy, the raw materials containing aluminum as an inevitable impurity, and the oxide having a smaller standard free energy of formation than that of Al2O3 in an absolute value; and (b) removing the resultant Al2O3 from the melt, thereby reducing the content of aluminum to 50 ppm or less in the melt.
    Type: Application
    Filed: May 11, 2001
    Publication date: December 27, 2001
    Applicant: HITACHI METALS, LTD
    Inventors: Yoshio Bizen, Setsuo Mishima, Takashi Meguro
  • Patent number: 5607780
    Abstract: Disclosed are a target material for magneto-optical recording medium having a structure formed by sintering of an RE-TM phase (A) having a composition with an RE content higher than that of the composition of an intermetallic compound represented by the chemical formula TM.sub.2 RE, and a TM-RE phase (B) having a composition with an RE content equal to or lower than that of the composition of an intermetallic compound represented by the chemical formula TM.sub.2 E, wherein RE denotes at least one rare earth element selected from the group of elements consisting of Nd, Gd, Tb, Dy, Ho and Er, and TM denotes at least one element selected from the group of metals of the iron group which consists of Fe, Co and Ni; and a process for producing the same.
    Type: Grant
    Filed: May 20, 1994
    Date of Patent: March 4, 1997
    Assignee: Hitachi Metals, Ltd.
    Inventors: Kaoru Masuda, Takashi Meguro
  • Patent number: 5352268
    Abstract: A flat-shaped fine Fe-Ni alloy powder suitable for use as a magnetic shield coating material for cards or the like. The powder has a mean particle size of 0.1 to 30 .mu.m, a mean thickness not greater than 2 .mu.m and a coercive force not greater than 400 A/m. The flat-shaped fine powder is produced by preparing an Fe-Ni alloy powder of a composition which exhibits, in a bulk state, a saturated magnetostriction constant value falling within the range of .+-.15.times.10.sup.-6 and which contains, by weight, 70 to 83% Ni, 2 to 6% Mo, 3 to 6% Cu, 1 to 2% Mn, not more than 0.05% C and the balance Fe and incidental impurities, pulverizing the alloy powder by an attrition mill, and annealing the pulverized powder in a fluidized or moving state in a substantially non-oxidizing atmosphere.
    Type: Grant
    Filed: February 19, 1993
    Date of Patent: October 4, 1994
    Assignee: Hitachi Metals, Ltd.
    Inventors: Takashi Meguro, Hideki Nakamura, Yoichi Mochida, Tsutomu Inui
  • Patent number: 5260056
    Abstract: An organic germanium compound to be effectively used for curing AIDS or making AIDS asymtomatic in various forms is expressed by the following rational formula: ##STR1## wherein n is an integer of 1 or 2 or more, is in the form of a white acicular or needle crystal, shows a solubility of 1.570/100 ml in water at 25.degree. C. and exhibits a melting (decomposition) point of 240.degree. C.
    Type: Grant
    Filed: January 14, 1991
    Date of Patent: November 9, 1993
    Assignee: Sanwa Kagaku Kenkyusho Co. Ltd.
    Inventors: Kiichi Sawai, Masayasu Kurono, Takahiko Mitani, Naohisa Ninomiya, Yoshiro Ishiwata, Syoji Yokochi, Kyoichi Asano, Kaneo Yamada, Masashi Taki, Takashi Meguro, Mikio Minamitani, Takao Matumoto, Yuichi Shiokawa