Patents by Inventor Takashi Miyazaki

Takashi Miyazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170308773
    Abstract: According to one aspect of an embodiment a learning device includes a generating unit that generates a new second learner by using a part of a first learner in which deep learning has been performed on the relationship held by a combination of first content and second content that has a type different from that of the first content. The learning device includes a learning unit that allows the second learner generated by the generating unit to perform deep learning on the relationship held by a combination of the first content and third content that has a type different from that of the second content.
    Type: Application
    Filed: February 7, 2017
    Publication date: October 26, 2017
    Applicant: YAHOO JAPAN CORPORATION
    Inventors: Takashi MIYAZAKI, Nobuyuki SHIMIZU
  • Publication number: 20170270097
    Abstract: According to one aspect of an embodiment a determination apparatus includes an association unit that associates three words between which association is to be determined, on a distributed representation space. The determination apparatus includes a determination unit that determines association between the three words as an angle defined by the three words associated with each other on the distributed representation space.
    Type: Application
    Filed: March 8, 2017
    Publication date: September 21, 2017
    Applicant: YAHOO JAPAN CORPORATION
    Inventors: Hayato KOBAYASHI, Takashi MIYAZAKI, Yuusuke WATANABE
  • Publication number: 20170255097
    Abstract: The present invention provides a positive photosensitive resin composition containing (A) a polymer compound containing a siloxane chain, the polymer compound having a repeating unit shown by the general formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, (C) a crosslinking agent, and (D) a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination caused on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern having a forward tapered shape without generating a scum and a footing profile in the pattern bottom and on the substrate when a widely used 2.38% TMAH aqueous solution is used as the developer.
    Type: Application
    Filed: February 14, 2017
    Publication date: September 7, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuya TAKEMURA, Masashi IIO, Hiroyuki URANO, Takashi MIYAZAKI
  • Patent number: 9748580
    Abstract: Provided is an oxygen reduction catalyst having a high oxygen reduction performance. An oxygen reduction catalyst according to the present embodiment includes a transition metal oxide to which an oxygen defect is introduced, and a layer that is provided on the transition metal oxide and that contains an electron conductive substance. A method for producing an oxygen reduction catalyst according to the present embodiment includes heating a transition metal carbonitride as a starting material in an oxygen-containing mixed gas. In addition, a method for producing an oxygen reduction catalyst according to the present embodiment includes heating a transition-metal phthalocyanine and a carbon fiber powder as starting materials in an oxygen-containing mixed gas.
    Type: Grant
    Filed: March 21, 2012
    Date of Patent: August 29, 2017
    Assignee: Yokohama National University
    Inventors: Ken-ichiro Ota, Akimitsu Isihara, Shigenori Mitsushima, Koichi Matsuzawa, Keisuke Ukita, Hideto Imai, Masashi Matsumoto, Takashi Miyazaki
  • Patent number: 9721994
    Abstract: According to an embodiment, a semiconductor device includes a silicon substrate, a photoelectric conversion layer, a termination layer, and an electrode layer. In the silicon substrate, first semiconductor regions and second semiconductor regions are alternately arranged along a first surface on a light incident side of the silicon substrate. The first semiconductor regions are doped with impurities of first concentration and have a conductivity of either one of p-type and n-type. The second semiconductor regions are doped with impurities of a second concentration lower than the first concentration and have a conductivity of the other type. The photoelectric conversion layer is disposed on a first surface side of the silicon substrate. The termination layer is disposed between the silicon substrate and the photoelectric conversion layer, in contact with the first surface, and to terminate dangling bonds of the silicon substrate. The electrode layer is provided on the light incident side.
    Type: Grant
    Filed: November 17, 2015
    Date of Patent: August 1, 2017
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takashi Miyazaki, Hideyuki Funaki, Yoshinori Iida, Isao Takasu, Yuki Nobusa
  • Patent number: 9690113
    Abstract: An optical apparatus includes an image pickup optical system, a base member, a holder holding an optical element, and a moving member including a magnetic member and configured to move in a plane perpendicular to an optical axis. The moving member moves in a predetermined straight line between the optical axis and a center of the magnetic member in a surface perpendicular to a center of the optical element. The base member includes a first restricting portion restricting moving amounts of the moving member in one direction of the predetermined straight line, and a second restricting portion restricting moving amounts of the moving member in other direction of the predetermined straight line. The first restricting portion and the second restricting portion are arranged so that the magnetic member is sandwiched between the first restricting portion and the second restricting portion.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: June 27, 2017
    Assignee: Canon Kabushiki Kaisha
    Inventor: Takashi Miyazaki
  • Publication number: 20170128363
    Abstract: The present invention relates to a rhinovaccination system of influenza vaccine, comprising a medical syringe filled with an influenza vaccine composition which comprises an inactivated whole influenza virion and a gel base material comprising carboxy vinyl polymer to administer the influenza vaccine composition to nasal mucosa, which is characterized by not comprising an adjuvant.
    Type: Application
    Filed: June 24, 2015
    Publication date: May 11, 2017
    Inventors: Taizou KAMISHITA, Takashi MIYAZAKI
  • Publication number: 20170128364
    Abstract: The present invention has a purpose to achieve desired spray characteristics when a pharmaceutical formulation is sprayed by means of a rhinal spray nozzle used for a metered-dose syringe-based squirt. The present invention relates to a rhinal spray nozzle used for a medical syringe having a tip opening in fluid communication with a syringe barrel for storing a pharmaceutical formulation. The rhinal spray nozzle comprises a hollow nozzle body having a tip portion defining a nozzle orifice thereon, a solid packing rod arranged within the nozzle body, and a nozzle chamber defined between the packing rod and the nozzle body to allow a fluid communication between the tip opening and the nozzle orifice, wherein the formulation comprises the gel material containing viscosity modification agent and carboxy vinyl polymer of which viscosity is modified by applying an exogenous shear force, and wherein the nozzle orifice has a diameter in a range between 0.25 mm and 0.30 mm.
    Type: Application
    Filed: June 24, 2015
    Publication date: May 11, 2017
    Applicant: TOKO YAKUHIN KOGYO KABUSHIKI KAISHA
    Inventors: Taizou KAMISHITA, Takashi MIYAZAKI, Shinya HOSHINO
  • Patent number: 9603919
    Abstract: The present invention provides a vaccine composition for transnasal mucous membrane administration, which contains an influenza virus antigen, polyriboinosinic polyribocytidylic acid (poly (I:C)) or a derivative thereof and a carboxyvinyl polymer. The present invention also provides a prophylactic method of influenza, including a step of administering the vaccine composition at least once to the nasal mucosa of a subject in need thereof.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: March 28, 2017
    Assignees: JAPAN AS REPRESENTED BY THE DIRECTOR-GENERAL OF NATIONAL INSTITUTE OF INFECTIOUS DISEASES, THE RESEARCH FOUNDATION FOR MICROBIAL DISEASES OF OSAKA UNIVERSITY, TOKO YAKUHIN KOGYO KABUSHIKI KAISHA
    Inventors: Hideki Hasegawa, Sadao Manabe, Takeshi Tanimoto, Takashi Miyazaki, Taizou Kamishita
  • Patent number: 9557645
    Abstract: A positive photosensitive resin composition containing a polymer compound obtained in the presence of an acid catalyst by condensation of at least a siloxane compound shown by formula (1), a phenol compounds shown by formula (2) and/or formula (3), and aldehydes and ketones shown by formula (4), a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, a crosslinker, and a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination generated on metal wiring, electrode, and substrate such as Cu and Al, especially on substrate SiN, and can form fine pattern having forward tapered shape without generating scum and footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: January 31, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuya Takemura, Masashi Iio, Hiroyuki Urano, Takashi Miyazaki
  • Publication number: 20160268345
    Abstract: According to an embodiment, a semiconductor device includes a silicon substrate, a photoelectric conversion layer, a termination layer, and an electrode layer. In the silicon substrate, first semiconductor regions and second semiconductor regions are alternately arranged along a first surface on a light incident side of the silicon substrate. The first semiconductor regions are doped with impurities of first concentration and have a conductivity of either one of p-type and n-type. The second semiconductor regions are doped with impurities of a second concentration lower than the first concentration and have a conductivity of the other type. The photoelectric conversion layer is disposed on a first surface side of the silicon substrate. The termination layer is disposed between the silicon substrate and the photoelectric conversion layer, in contact with the first surface, and to terminate dangling bonds of the silicon substrate. The electrode layer is provided on the light incident side.
    Type: Application
    Filed: November 17, 2015
    Publication date: September 15, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Takashi MIYAZAKI, Hideyuki FUNAKI, Yoshinori llDA, lsao TAKASU, Yuki NOBUSA
  • Publication number: 20160243669
    Abstract: Provided is a clamp jig which includes: a workpiece bonding member in which a curved workpiece is bonded to one end side thereof to be held; one clamping member and the other clamping member between which an end of the workpiece bonded to the workpiece bonding member to be held is sandwiched from both sides thereof; an elastic member made of an elastic material that comes in contact with an end of the one clamping member; and a plurality of holding members that push the workpiece by supporting the end of the workpiece at multiple points of the elastic member. In the clamp jig, the end of the workpiece is supported at multi-contacts in a state where curvature of the workpiece is maintained.
    Type: Application
    Filed: February 17, 2016
    Publication date: August 25, 2016
    Inventors: Kyosuke IMAI, Takashi MIYAZAKI, Hajime OOBUCHI, Atsushi MORIYA
  • Patent number: 9400428
    Abstract: A polymer compound includes a carboxyl group and a siloxane chain and is obtained in the presence of an acid catalyst by condensation of at least; (I) a siloxane compound having phenol groups at both terminals, as shown by formula (1), (II) phenols shown by formula (2) and/or phenols shown by formula (3), and (III) one or more kinds of aldehydes and ketones shown by the following general formula (4). The polymer compound can be used suitably as a base resin of a chemically amplified negative resist composition with which the problem of delamination generated on metal wires, an electrode, and a substrate, can be improved, and with which a fine pattern can be formed without generating a scum and a footing profile in the pattern bottom and on the substrate, using a widely used aqueous 2.38% TMAH solution as a developer.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: July 26, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Urano, Masashi Iio, Katsuya Takemura, Takashi Miyazaki
  • Publication number: 20160200877
    Abstract: The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1). There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate.
    Type: Application
    Filed: December 4, 2015
    Publication date: July 14, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki URANO, Masashi IIO, Katsuya TAKEMURA, Takashi Miyazaki
  • Patent number: 9366961
    Abstract: A silicone structure-bearing polymer having a crosslinking group within the molecule, containing an isocyanurate structure bonded within the molecule, and having a Mw of 3,000-500,000 is provided. The polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.
    Type: Grant
    Filed: June 23, 2015
    Date of Patent: June 14, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Urano, Katsuya Takemura, Takashi Miyazaki
  • Patent number: 9331125
    Abstract: According to one embodiment, a solid-state imaging device includes: a first inorganic photoelectric converter; a semiconductor substrate that includes a light-receiving face to which light is to be incident and a circuit-formed surface on which a circuit including a readout circuit is formed, the light-receiving face facing the first inorganic photoelectric converter, the semiconductor substrate including a second inorganic photoelectric converter thereinside; and a first part including a microstructure arranged between the first inorganic photoelectric converter and the second inorganic photoelectric converter.
    Type: Grant
    Filed: November 28, 2014
    Date of Patent: May 3, 2016
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takashi Miyazaki, Ikuo Fujiwara, Hideyuki Funaki
  • Patent number: 9268108
    Abstract: A lens barrel enables to improve the optical performance thereof while realizing size reduction, structure simplification, and cost reduction in the lens barrel. A second group holding frame 21, in a collapsed state, is rotated with respect to the second group base plate 22 in a direction retracting from the optical axis A, and in a photographing state, is rotated toward the optical axis A. A compression spring 23 regulates an optical axis A direction position of the second group holding frame 21 with respect to the second group base plate 22 by urging, in the optical axis A direction, a portion of the second group holding frame 21. An engaging pin 22d and an engaging groove 21e, in the photographing state, regulate the optical axis A direction position of the second group holding frame 21 with respect to the second group base plate 22.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: February 23, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Takashi Miyazaki
  • Patent number: 9268074
    Abstract: According to one embodiment, a display device includes an interference filter including following layers, and a display layer. The first common layer includes first and second regions. The second common layer faces the first common layer. The first spacer layer is provided between the first and second common layers and includes first and second portions facing the first and second regions. The thickness of the first portion is different from the thickness of the second portion. The second spacer layer faces at least one of the first and second portions through the second common layer and is made of the same material as that of the first spacer layer. The coating layer faces the second common layer through the second spacer layer.
    Type: Grant
    Filed: September 10, 2013
    Date of Patent: February 23, 2016
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Hitoshi Nagato, Takashi Miyazaki, Rei Hasegawa, Kouji Suzuki, Masaki Atsuta
  • Publication number: 20150370166
    Abstract: A positive photosensitive resin composition containing a polymer compound obtained in the presence of an acid catalyst by condensation of at least a siloxane compound shown by formula (1), a phenol compounds shown by formula (2) and/or formula (3), and aldehydes and ketones shown by formula (4), a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, a crosslinker, and a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination generated on metal wiring, electrode, and substrate such as Cu and Al, especially on substrate SiN, and can form fine pattern having forward tapered shape without generating scum and footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.
    Type: Application
    Filed: June 1, 2015
    Publication date: December 24, 2015
    Inventors: Katsuya TAKEMURA, Masashi IIO, Hiroyuki URANO, Takashi MIYAZAKI
  • Patent number: 9195024
    Abstract: A lens barrel including a focus motor, a screw that is provided on an axis of the focus motor and that is rotatably driven by the focus motor, a pulse plate that rotates integrally with the screw, and a holding unit that is provided adjacent to the focus motor. The pulse plate is attached to an outer periphery of the holding unit and an outer diameter of the holding unit is greater than that of the screw.
    Type: Grant
    Filed: June 6, 2013
    Date of Patent: November 24, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventor: Takashi Miyazaki