Abstract: A photomask blank (1) having: a transparent substrate (10); a first film (11) etched by chlorine/oxygen-based dry etching and made of a material having resistance against fluorine-based dry etching; and a second film (12) formed adjacent to the first film and made of a material which comprises silicon and oxygen or silicon, oxygen, and nitrogen and has an Si—Si bond and which is substantially not etched by chlorine/oxygen-based dry etching, wherein: the photoresist adhesive performance is improved; the resist pattern is stably maintained without degrading, collapsing, or peeling even when a fine resist pattern is formed from a photoresist film; and an excellent shape and dimensional accuracy is obtained in regard to etching of a lower layer film in which the resist pattern is used.

Abstract: According to one embodiment, a display device includes a display panel, switching elements, a power supply, a controller and a noise suppression circuit. The display panel displays an image. The switching elements supply a pixel signal to the display panel. The power supply supplies a power source voltage to the switching elements. The controller switches between a display period during which the display panel displays an image and a non-display period during which the display panel does not display an image. The noise suppression circuit preliminarily reduces a potential difference between the switching elements and the power supply when the controller switches between the display period and the non-display period.

Abstract: A component mounting device includes a mounting head that is movable in a horizontal direction and mounts a held component on a substrate and a control portion that controls the operation of the mounting head. The control portion is configured to perform control of a speed of mounting, by the mounting head, of a component to be located closely adjacent to another component and to be mounted on the substrate such that an interval to an adjacent component is equal to or less than a predetermined threshold, on the substrate. A speed of mounting of the component is less than a speed of mounting in a normal state in which the mounting head mounts a component, which is not the component to be located closely adjacent to another component, on the substrate.

Abstract: A photomask blank (1) having: a transparent substrate (10); a first film (11) etched by chlorine/oxygen-based dry etching and made of a material having resistance against fluorine-based dry etching; and a second film (12) formed adjacent to the first film and made of a material which comprises silicon and oxygen or silicon, oxygen, and nitrogen and has an Si—Si bond and which is substantially not etched by chlorine/oxygen-based dry etching, wherein: the photoresist adhesive performance is improved; the resist pattern is stably maintained without degrading, collapsing, or peeling even when a fine resist pattern is formed from a photoresist film; and an excellent shape and dimensional accuracy is obtained in regard to etching of a lower layer film in which the resist pattern is used.

Abstract: A photomask blank comprising a transparent substrate (1), an etching stop film (2), a light-shielding film (3), and an etching mask film (4) has on the substrate side a reflectance of up to 35% with respect to exposure light. The etching stop film (2) consists of a first layer (21) which is disposed contiguous to the substrate and functions as an antireflective layer and a second layer (22) functioning as a fluorine-base dry etching-resistant layer, one of the first and second layers is a layer having compressive stress and the other is a layer having tensile stress.

Abstract: A method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate includes forming the silicon-containing inorganic film such that a surface has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent, the silicon-containing inorganic film being an SiO film or an SiON film and serving as a hard mask film.

Abstract: A photomask blank comprising a transparent substrate (1), an etching stop film (2), a light-shielding film (3), and an etching mask film (4) has on the substrate side a reflectance of up to 35% with respect to exposure light. The etching stop film (2) consists of a first layer (21) which is disposed contiguous to the substrate and functions as an antireflective layer and a second layer (22) functioning as a fluorine-base dry etching-resistant layer, one of the first and second layers is a layer having compressive stress and the other is a layer having tensile stress.

Abstract: A method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate includes forming the silicon-containing inorganic film such that a surface has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent, the silicon-containing inorganic film being an SiO film or an SiON film and serving as a hard mask film.

Abstract: A component mounting device includes a mounting head that is movable in a horizontal direction and mounts a held component on a substrate and a control portion that controls the operation of the mounting head. The control portion is configured to perform control of a speed of mounting, by the mounting head, of a component to be located closely adjacent to another component and to be mounted on the substrate such that an interval to an adjacent component is equal to or less than a predetermined threshold, on the substrate. A speed of mounting of the component is less than a speed of mounting in a normal state in which the mounting head mounts a component, which is not the component to be located closely adjacent to another component, on the substrate.

Abstract: According to one embodiment, a display device includes a display and a driver. The display displays an image. The driver supplies a drive signal to the display. The driver determines, if power to drive the driver is supplied from power sources, whether a sequence of supplying the power is a predetermined sequence. A status of the driver remains as a status in which various commands are unacceptable in the case being determined that the sequence of supplying the power is not the predetermined sequence. The status of the driver is shifted to a status in which the various commands supplied to the driver are acceptable in the case being determined that the sequence of supplying the power is the predetermined sequence.

Abstract: According to one embodiment, a display device includes a display panel, switching elements, a power supply, a controller and a noise suppression circuit. The display panel displays an image. The switching elements supply a pixel signal to the display panel. The power supply supplies a power source voltage to the switching elements. The controller switches between a display period during which the display panel displays an image and a non-display period during which the display panel does not display an image. The noise suppression circuit preliminarily reduces a potential difference between the switching elements and the power supply when the controller switches between the display period and the non-display period.

Abstract: The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the silicon-containing inorganic film, comprising: forming the silicon-containing inorganic film such that a surface that will contact the resist film has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent; performing a silylation process after forming the silicon-containing inorganic film; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development.

Abstract: The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the inorganic film, comprising: forming the silicon-containing inorganic film; heat treating the formed silicon-containing inorganic film at a temperature more than 200° C. under an atmosphere containing oxygen; performing a silylation process after the heat treatment; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development.

Abstract: The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the silicon-containing inorganic film, comprising: forming the silicon-containing inorganic film such that a surface that will contact the resist film has an oxygen concentration not less than 55 atomic percent and not more than 75 atomic percent; performing a silylation process after forming the silicon-containing inorganic film; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development.

Abstract: The present invention relates to a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film and provides a method for manufacturing a photomask blank having at least a silicon-containing inorganic film over a transparent substrate and a resist film on the inorganic film, comprising: forming the silicon-containing inorganic film; heat treating the formed silicon-containing inorganic film at a temperature more than 200° C. under an atmosphere containing oxygen; performing a silylation process after the heat treatment; and then forming the resist film by application. The method can inhibit generation of defects due to resist residues or the like after development.

Abstract: It is an object to prevent the image quality deterioration of a moving image likely to include a plurality of the same consecutive images such as a movie video and an animation video due to the motion-compensated frame rate conversion (FRC) processing. An image displaying device is provided with an FRC portion (10) for converting the number of frames in an input image signal by interpolating an image signal to which a motion compensation processing has been given between the frames in the input image signal, a genre determining portion (14) for determining whether the input image signal is a predetermined genre, and a controlling portion (15).

Abstract: A shift register including a plurality of unit circuits sequentially transfers a start signal supplied to a first one of the unit circuits. Each unit circuit includes a clock terminal, an inverted clock terminal, a control terminal to which an output signal output from the output terminal of a subsequent unit circuit is supplied, a power supply terminal, a first transistor disposed between the clock terminal and the output terminal, a second transistor disposed between the output terminal and the power supply terminal, a capacitor, and a controller that supplies the start signal or the output signal of a previous unit circuit to the gate of the first transistor, and that controls the first transistor to be turned OFF later than a time at which the output signal of the subsequent unit circuit is supplied to the control terminal.

Abstract: Deterioration in image quality of a moving image obtained by special reproduction caused by frame rate conversion (FRC) processing of a motion compensation type is prevented. An image displaying device includes an FRC portion 10 that converts the number of frames of the input image signal by interpolating an image signal to which motion compensation processing has been performed between frames of an input image signal, a special reproduction determining portion 14 that determines whether or not the input image signal is an image signal relating to a predetermined genre, and a controlling portion 15. The FRC portion 10 includes a motion vector detecting portion lie that detects a motion vector between frames of the input image signal, an interpolation vector evaluating portion 11f that assigns an interpolation vector between frames based on the motion vector information, and an interpolation frame generating portion 12d that generates an interpolation frame from the interpolation vector.

Abstract: An image processing device and method, and an image display device and method which realizes a high-definition displayed video by reducing motion blur caused by a holding-type display system and reducing motion blurs of the displayed video caused by the time integration effect of an image sensor while suppressing deterioration of an image. The image display device includes a motion vector detection section (101) which detects a motion vector in each predetermined region between the frames of an inputted image signal, and an edge emphasis part (2) which emphasizes the high-frequency component of the inputted image signal and an interpolated image signal generated by an FRC part (100) according to the motion amount of the inputted image signal detected by the motion vector detection section (101). This compensates the high-frequency component attenuated by the time integration effect of the image sensor to reduce the apparent motion blurs to improve the sharpness of the displayed image.

Abstract: A liquid crystal display device in which a frame of the image signal to be displayed is written into a liquid crystal display panel while a backlight is activated intermittently within one frame period so as to prevent blur injury arising when displaying motion pictures includes: sections and for variably controlling the illumination duration of the backlight based on the detected type of the image content to be displayed. This configuration makes it possible to appropriately control the image quality degradation caused by blur injury, stroboscopic effect and flickering, hence realize total image quality improvement.