Patents by Inventor Takaya Okada

Takaya Okada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180052398
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis of a circle corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).
    Type: Application
    Filed: November 1, 2017
    Publication date: February 22, 2018
    Applicant: NIKON CORPORATION
    Inventors: Yasuhiro OMURA, Takaya OKADA, Hiroyuki NAGASAKA
  • Patent number: 9891539
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY·axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: February 13, 2018
    Assignee: NIKON CORPORATION
    Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
  • Patent number: 9823588
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY·axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: November 21, 2017
    Assignee: NIKON CORPORATION
    Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
  • Publication number: 20160252825
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).
    Type: Application
    Filed: May 10, 2016
    Publication date: September 1, 2016
    Applicant: NIKON CORPORATION
    Inventors: Yasuhiro OMURA, Takaya OKADA, Hiroyuki NAGASAKA
  • Patent number: 9429851
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
    Type: Grant
    Filed: January 4, 2013
    Date of Patent: August 30, 2016
    Assignee: NIKON CORPORATION
    Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
  • Patent number: 9360763
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
    Type: Grant
    Filed: September 15, 2014
    Date of Patent: June 7, 2016
    Assignee: NIKON CORPORATION
    Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
  • Patent number: 9310696
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
    Type: Grant
    Filed: September 15, 2014
    Date of Patent: April 12, 2016
    Assignee: NIKON CORPORATION
    Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
  • Publication number: 20150029482
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
    Type: Application
    Filed: September 15, 2014
    Publication date: January 29, 2015
    Inventors: Yasuhiro OMURA, Takaya OKADA, Hiroyuki NAGASAKA
  • Publication number: 20150029476
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
    Type: Application
    Filed: September 15, 2014
    Publication date: January 29, 2015
    Inventors: Yasuhiro OMURA, Takaya OKADA, Hiroyuki NAGASAKA
  • Patent number: 8854601
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
    Type: Grant
    Filed: September 9, 2011
    Date of Patent: October 7, 2014
    Assignee: Nikon Corporation
    Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
  • Publication number: 20120307220
    Abstract: An exposure apparatus irradiates an exposure light beam EL in a state that a space KS, between predetermined optical elements LS1 and LS2 among a plurality of optical elements included in a projection optical system, is filled with a liquid LQ. When the exposure light beam EL is not irradiated during, for example, the maintenance or the like, the liquid LQ in the space KS is substituted by a functional fluid LK different from the liquid LQ. This makes it possible to reduce any influence exerted by the liquid LQ on the exposure apparatus.
    Type: Application
    Filed: August 15, 2012
    Publication date: December 6, 2012
    Applicant: NIKON CORPORATION
    Inventors: Hiroyuki NAGASAKA, Takaya Okada, Motoi Ueda, Ryuichi Hoshika
  • Publication number: 20120002186
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
    Type: Application
    Filed: September 9, 2011
    Publication date: January 5, 2012
    Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
  • Publication number: 20100033700
    Abstract: An optical element (LS2) has, in a side face (T6), a groove portion (50) for insertion of a portion of an optical element holding device.
    Type: Application
    Filed: June 13, 2006
    Publication date: February 11, 2010
    Inventors: Takaya Okada, Ryu Sugawara
  • Publication number: 20090046268
    Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
    Type: Application
    Filed: May 8, 2006
    Publication date: February 19, 2009
    Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
  • Publication number: 20080291555
    Abstract: An optical element holding apparatus includes an aluminum buffer member accommodated in a stainless steel frame body and having a linear expansion coefficient differing from that of the frame body. The buffer member contacts a first member of a rotation link block. The frame body includes slits defining the rotation link block, a second connection block, a first connection block, and a displacement block. Drive force generated by expansion of the buffer member when the temperature changes is amplified by the rotation link block, the second connection block, the first connection block, and the displacement block and transmitted to the support member to move the support member toward the lens.
    Type: Application
    Filed: May 23, 2008
    Publication date: November 27, 2008
    Inventor: Takaya OKADA
  • Publication number: 20080192222
    Abstract: An exposure apparatus irradiates a substrate with exposure light via a projection optical system to expose the substrate. The projection optical system has a first optical element nearest to an image plane of the projection optical system and a second optical element second nearest to the image plane after the first optical element. The exposure apparatus includes: an immersion mechanism that fills a first space on a bottom surface side of the second optical element with a liquid; a gas substitution apparatus that fills a second space on an upper surface side of the second optical element with a gas; and a control apparatus that adjusts a pressure difference between a pressure of the liquid in the first space and a pressure of the gas in the second space.
    Type: Application
    Filed: December 2, 2005
    Publication date: August 14, 2008
    Applicant: Nikon Corporation
    Inventor: Takaya Okada
  • Publication number: 20080106718
    Abstract: An exposure apparatus emits exposure light onto a substrate (P) via a projection optical system (PL) to expose the substrate (P). The projection optical system (PL) includes a first optical element (LS1) closest to an image plane of the projection optical system (PL) and a second optical element (LS2) closest to the image plane next to the first optical element (LS1). The exposure apparatus is disposed alia position higher than a lower surface (T3) of the second optical element (LS2) and includes a second collection port (42) that recovers a second liquid (LQ2) held in a second space (K2) between an upper surface (T2) of the first optical element (LS1) and the lower surface (T3) of the second optical element (LS2).
    Type: Application
    Filed: November 30, 2005
    Publication date: May 8, 2008
    Applicant: NIKON CORPORATION
    Inventors: Takaya Okada, Ryu Sugawara
  • Publication number: 20070285634
    Abstract: An exposure apparatus irradiates an exposure light beam a state that a space, between predetermined optical elements and among a plurality of optical elements included in a projection optical system, is filled with a liquid. When the exposure light beam is not irradiated during, for example, the maintenance or the like, the liquid in the space is substituted by a functional fluid different from the liquid. This makes it possible to reduce any influence exerted by the liquid on the exposure apparatus.
    Type: Application
    Filed: November 18, 2005
    Publication date: December 13, 2007
    Applicant: NIKON CORPORATION
    Inventors: Hiroyuki Nagasaka, Takaya Okada, Motoi Ueda, Ryuichi Hoshika