Patents by Inventor Takaya Okada
Takaya Okada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180052398Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis of a circle corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).Type: ApplicationFiled: November 1, 2017Publication date: February 22, 2018Applicant: NIKON CORPORATIONInventors: Yasuhiro OMURA, Takaya OKADA, Hiroyuki NAGASAKA
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Patent number: 9891539Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY·axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).Type: GrantFiled: May 10, 2016Date of Patent: February 13, 2018Assignee: NIKON CORPORATIONInventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
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Patent number: 9823588Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY·axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).Type: GrantFiled: May 10, 2016Date of Patent: November 21, 2017Assignee: NIKON CORPORATIONInventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
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Publication number: 20160252825Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).Type: ApplicationFiled: May 10, 2016Publication date: September 1, 2016Applicant: NIKON CORPORATIONInventors: Yasuhiro OMURA, Takaya OKADA, Hiroyuki NAGASAKA
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Patent number: 9429851Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).Type: GrantFiled: January 4, 2013Date of Patent: August 30, 2016Assignee: NIKON CORPORATIONInventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
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Patent number: 9360763Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).Type: GrantFiled: September 15, 2014Date of Patent: June 7, 2016Assignee: NIKON CORPORATIONInventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
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Patent number: 9310696Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).Type: GrantFiled: September 15, 2014Date of Patent: April 12, 2016Assignee: NIKON CORPORATIONInventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
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Publication number: 20150029482Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).Type: ApplicationFiled: September 15, 2014Publication date: January 29, 2015Inventors: Yasuhiro OMURA, Takaya OKADA, Hiroyuki NAGASAKA
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Publication number: 20150029476Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).Type: ApplicationFiled: September 15, 2014Publication date: January 29, 2015Inventors: Yasuhiro OMURA, Takaya OKADA, Hiroyuki NAGASAKA
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Patent number: 8854601Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).Type: GrantFiled: September 9, 2011Date of Patent: October 7, 2014Assignee: Nikon CorporationInventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
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Publication number: 20120307220Abstract: An exposure apparatus irradiates an exposure light beam EL in a state that a space KS, between predetermined optical elements LS1 and LS2 among a plurality of optical elements included in a projection optical system, is filled with a liquid LQ. When the exposure light beam EL is not irradiated during, for example, the maintenance or the like, the liquid LQ in the space KS is substituted by a functional fluid LK different from the liquid LQ. This makes it possible to reduce any influence exerted by the liquid LQ on the exposure apparatus.Type: ApplicationFiled: August 15, 2012Publication date: December 6, 2012Applicant: NIKON CORPORATIONInventors: Hiroyuki NAGASAKA, Takaya Okada, Motoi Ueda, Ryuichi Hoshika
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Publication number: 20120002186Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).Type: ApplicationFiled: September 9, 2011Publication date: January 5, 2012Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
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OPTICAL ELEMENT, OPTICAL ELEMENT HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
Publication number: 20100033700Abstract: An optical element (LS2) has, in a side face (T6), a groove portion (50) for insertion of a portion of an optical element holding device.Type: ApplicationFiled: June 13, 2006Publication date: February 11, 2010Inventors: Takaya Okada, Ryu Sugawara -
Publication number: 20090046268Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).Type: ApplicationFiled: May 8, 2006Publication date: February 19, 2009Inventors: Yasuhiro Omura, Takaya Okada, Hiroyuki Nagasaka
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Publication number: 20080291555Abstract: An optical element holding apparatus includes an aluminum buffer member accommodated in a stainless steel frame body and having a linear expansion coefficient differing from that of the frame body. The buffer member contacts a first member of a rotation link block. The frame body includes slits defining the rotation link block, a second connection block, a first connection block, and a displacement block. Drive force generated by expansion of the buffer member when the temperature changes is amplified by the rotation link block, the second connection block, the first connection block, and the displacement block and transmitted to the support member to move the support member toward the lens.Type: ApplicationFiled: May 23, 2008Publication date: November 27, 2008Inventor: Takaya OKADA
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Publication number: 20080192222Abstract: An exposure apparatus irradiates a substrate with exposure light via a projection optical system to expose the substrate. The projection optical system has a first optical element nearest to an image plane of the projection optical system and a second optical element second nearest to the image plane after the first optical element. The exposure apparatus includes: an immersion mechanism that fills a first space on a bottom surface side of the second optical element with a liquid; a gas substitution apparatus that fills a second space on an upper surface side of the second optical element with a gas; and a control apparatus that adjusts a pressure difference between a pressure of the liquid in the first space and a pressure of the gas in the second space.Type: ApplicationFiled: December 2, 2005Publication date: August 14, 2008Applicant: Nikon CorporationInventor: Takaya Okada
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Publication number: 20080106718Abstract: An exposure apparatus emits exposure light onto a substrate (P) via a projection optical system (PL) to expose the substrate (P). The projection optical system (PL) includes a first optical element (LS1) closest to an image plane of the projection optical system (PL) and a second optical element (LS2) closest to the image plane next to the first optical element (LS1). The exposure apparatus is disposed alia position higher than a lower surface (T3) of the second optical element (LS2) and includes a second collection port (42) that recovers a second liquid (LQ2) held in a second space (K2) between an upper surface (T2) of the first optical element (LS1) and the lower surface (T3) of the second optical element (LS2).Type: ApplicationFiled: November 30, 2005Publication date: May 8, 2008Applicant: NIKON CORPORATIONInventors: Takaya Okada, Ryu Sugawara
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Publication number: 20070285634Abstract: An exposure apparatus irradiates an exposure light beam a state that a space, between predetermined optical elements and among a plurality of optical elements included in a projection optical system, is filled with a liquid. When the exposure light beam is not irradiated during, for example, the maintenance or the like, the liquid in the space is substituted by a functional fluid different from the liquid. This makes it possible to reduce any influence exerted by the liquid on the exposure apparatus.Type: ApplicationFiled: November 18, 2005Publication date: December 13, 2007Applicant: NIKON CORPORATIONInventors: Hiroyuki Nagasaka, Takaya Okada, Motoi Ueda, Ryuichi Hoshika