Abstract: An electronic apparatus includes a plurality of contacts electrically connectable to an accessory and arranged in a first direction orthogonal to a direction in which the accessory is attached. The contacts include an attachment detection contact to detect an attachment of the accessory to the electronic apparatus, and a communication request contact for a communication request from the accessory to the electronic apparatus. The attachment detection and communication request contacts are disposed between a contact closest one end and a contact closest to another end in the first direction. The attachment detection contact is disposed between the communication request contact and the contact closest to the one end. In the first direction, a distance between the attachment detection contact and the communication request contact is shorter than that between the communication request contact and the contact closest to the other end.

Abstract: A film forming apparatus is disclosed. The apparatus comprises a chamber; an exhaust unit configured to reduce the pressure in the chamber to a predetermined vacuum level; a holder disposed in the chamber and configured to hold a film forming target member on which a film is to be formed; a supply unit configured to supply a film forming material containing silicon to a surface of the film forming target member; and a heat source configured to perform heating at the predetermined vacuum level to melt the supplied film forming material.

Abstract: A delivery server includes a processor including hardware, the processor being configured to: transmit arrival information of a product to a user terminal carried by a user who has ordered the product; transmit, in a case where unattended delivery is instructed by the user terminal, unattended delivery information to a home delivery terminal of a delivery person who delivers the product, and request a signature of the user; transmit the signature information to the home delivery terminal in response to receiving signature information regarding the signature of the user from the user terminal; and transmit delivery completion information of the product to the user terminal.

Abstract: A bonding apparatus includes a first holder configured to hold a first substrate divided into multiple chips with a tape and a ring frame therebetween, the first substrate being attached to the tape, and an edge of the tape being attached to the ring frame; a second holder configured to hold a second substrate, which is disposed on an opposite side to the tape with respect to the first substrate therebetween, while maintaining a distance from the first substrate; and a pressing device configured to press the multiple chips one by one with the tape therebetween to press and bond the corresponding chip to the second substrate.

Abstract: A gear housing for an electric power steering device has a front-side housing and a rear-side housing. The front-side housing has a worm wheel housing portion, a worm housing portion, and reinforcing ribs. The worm wheel housing portion has a worm wheel cylindrical portion and a ring shaped worm wheel bottom portion bent inward in a radial direction from a front end portion of the worm wheel cylindrical portion. The worm housing portion is provided on a part in a circumferential direction of an outer-diameter side portion of the worm wheel housing portion. The reinforcing ribs are provided on a front side surface of the front-side housing, extend in a direction in which an engagement reaction force acts between the worm wheel and a worm of the worm shaft, and span between the worm housing portion and the worm wheel bottom portion.

Abstract: A film forming apparatus is disclosed. The apparatus comprises a chamber; an exhaust unit configured to reduce the pressure in the chamber to a predetermined vacuum level; a holder disposed in the chamber and configured to hold a film forming target member on which a film is to be formed; a supply unit configured to supply a film forming material containing silicon to a surface of the film forming target member; and a heat source configured to perform heating at the predetermined vacuum level to melt the supplied film forming material.

Abstract: A stage includes a first member made of a material having a density of 5.0 g/cm3 or less, and a second member joined to the first member. The second member is made of a material having a linear expansion coefficient of 5.0×10?6/K or less and a thermal conductivity of 100 W/mK or more. A flow passage for a temperature control medium is formed in at least one of the first member and the second member.

Abstract: A substrate processing method of processing a substrate includes: forming a modification layer at least on a surface layer of a rear surface of the substrate or within the substrate by radiating a laser beam; and processing a front surface of the substrate in a state that the rear surface of the substrate is held. A modification device includes a laser irradiation unit configured to form a modification layer at least on a surface layer of the rear surface of the substrate or within the substrate by radiating a laser beam.

Abstract: A member to be used in a substrate processing apparatus is provided. The member is formed of aluminum containing silicon, and the silicon has a particle diameter of 1 ?m or less.

Abstract: A gear housing for an electric power steering device has a front-side housing and a rear-side housing. The front-side housing has a worm wheel housing portion, a worm housing portion, and reinforcing ribs. The worm wheel housing portion has a worm wheel cylindrical portion and a ring shaped worm wheel bottom portion bent inward in a radial direction from a front end portion of the worm wheel cylindrical portion. The worm housing portion is provided on a part in a circumferential direction of an outer-diameter side portion of the worm wheel housing portion. The reinforcing ribs are provided on a front side surface of the front-side housing, extend in a direction in which an engagement reaction force acts between the worm wheel and a worm of the worm shaft, and span between the worm housing portion and the worm wheel bottom portion.

Abstract: An etching method is provided. In the method, a substrate including an etching target film, a hard mask containing silicon and a patterned resist is provided. A protective film is formed on a surface of the substrate by generating a first plasma from one of a first gas containing carbon, fluorine and a dilute gas, and a second gas containing carbon, hydrogen and the dilute gas. The hard mask is etched by generating a second plasma from a third gas after performing the step of forming the protective film.

Abstract: Disclosed is a liquid coating method. The method executes processes of: coating a coating liquid in a spiral form on a surface of a substrate by ejecting the coating liquid from the ejection nozzle while moving the ejection nozzle in a predetermined direction between the rotary axis and a peripheral edge of the substrate during rotation of the substrate; making a linear velocity at an ejection position of the coating liquid from the ejection nozzle substantially constant by reducing a number of rotations of the substrate as the ejection position is positioned closer to the peripheral edge of the substrate; and making an ejection flow rate of the coating liquid ejected from the ejection nozzle substantially constant by changing a gap between the ejection port of the ejection nozzle and the surface of the substrate based on a flow rate of the coating liquid before ejection from the ejection nozzle.

Abstract: At least one of the vehicle body side through holes and the column side through hole is an adjusting long hole which is long in a direction in which a position of the steering wheel can be adjusted. A base end portion of the adjusting lever includes a lever side through hole penetrating through the base end portion in the width direction. The adjusting rod is press-fitted into the lever side through hole.

Abstract: Disclosed is a coating apparatus capable of enhancing the film thickness uniformity. The coating apparatus includes a nozzle and a moving mechanism. The nozzle includes a storage chamber that stores a coating liquid and a slit-like flow path that is in communication with the storage chamber, and discharges the coating liquid through a discharge port formed at a front end of the flow path. The moving mechanism moves the nozzle and the substrate relatively to each other along a surface of the substrate. Also, in the flow path provided in the nozzle, flow resistance at the central portion in the longitudinal direction is larger than that at both end portions in the longitudinal direction.

Abstract: At least one of the vehicle body side through holes and the column side through hole is an adjusting long hole which is long in a direction in which a position of the steering wheel can be adjusted. A base end portion of the adjusting lever includes a lever side through hole penetrating through the base end portion in the width direction. The adjusting rod is press-fitted into the lever side through hole.

Abstract: A control apparatus includes a first focus detection unit that performs focus detection by a phase difference method based on an image signal obtained from an image pickup element, a second focus detection unit that performs focus detection by a contrast method, and a control unit that performs focusing, the control unit performs the focusing, in a first mode, by using a detection result of the first focus detection unit, and performs the focusing, in a second mode, by selectively using one of the detection result of the first focus detection unit and a detection result of the second focus detection unit according to lens information, and the first mode is a mode in which the focusing is repeated, and the second mode is a mode in which a lens is stopped after the focusing.

Abstract: A plasma etching method includes a plasma process of plasma-processing a surface of a photoresist, which has a predetermined pattern with plasma generated from a hydrogen-containing gas. Further, the plasma etching method includes an etching process of etching a silicon-containing film with plasma generated from a CF-based gas and a gas containing a CHF-based gas by using the plasma-processed photoresist as a mask. Furthermore, in the plasma etching method, the plasma process and the etching process are repeated at least two or more times.

Abstract: A groove shape can be improved. A plasma etching method includes plasma-processing a photoresist film that is formed on a mask film and has a preset pattern; exposing an organic film formed under the mask film by etching the mask film with the pattern of the plasma-processed photoresist film; and etching the organic film by plasma of a mixture gas containing O2 (oxygen), COS (carbonyl sulfate) and Cl2 (chlorine).

Abstract: A coating apparatus includes a nozzle, a moving mechanism, a pressure adjusting unit and a pressure control unit. The nozzle is provided with a storage chamber and a slit-like flow path, and configured to discharge the coating liquid from a discharge port formed at a front end of the flow path. The moving mechanism moves the nozzle and a substrate relatively to each other along the surface of the substrate. The pressure adjusting unit adjusts the pressure inside the storage chamber. The pressure control unit controls the pressure adjusting unit so as to adjust pressure inside the storage chamber. The pressure control unit controls the pressure adjusting unit such that the inside of the storage chamber becomes a negative pressure, and fills the coating liquid inside the storage chamber while slowly decreasing the negative pressure inside the storage chamber.

Abstract: Disclosed is a liquid coating method. The method executes processes of: coating a coating liquid in a spiral form on a surface of a substrate by ejecting the coating liquid from the ejection nozzle while moving the ejection nozzle in a predetermined direction between the rotary axis and a peripheral edge of the substrate during rotation of the substrate; making a linear velocity at an ejection position of the coating liquid from the ejection nozzle substantially constant by reducing a number of rotations of the substrate as the ejection position is positioned closer to the peripheral edge of the substrate; and making an ejection flow rate of the coating liquid ejected from the ejection nozzle substantially constant by changing a gap between the ejection port of the ejection nozzle and the surface of the substrate based on a flow rate of the coating liquid before ejection from the ejection nozzle.