Patents by Inventor Takehiro Nakai
Takehiro Nakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11955372Abstract: A semiconductor storage device includes: a semiconductor substrate; a plurality of circuit regions; and an element isolation region having a trench shape formed between the circuit regions. In the element isolation region including a thermal oxide film and a silicon oxide film, a sub-trench is formed in a bottom corner portion, and the thermal oxide film covers at least an inner wall of the sub-trench.Type: GrantFiled: August 20, 2021Date of Patent: April 9, 2024Assignee: KIOXIA CORPORATIONInventors: Takehiro Nakai, Mizuki Tamura, Yumiko Yamashita
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Publication number: 20230403851Abstract: A semiconductor memory device includes: a semiconductor substrate having a surface extending in an X direction and a Y direction; a circuit region formed on the semiconductor substrate and having at least one side extending in the Y direction; a guard ring line extending along the Y direction and opposed to the one side of the circuit region in the X direction; an element isolation region extending along the Y direction and formed between the one side of the circuit region and the guard ring line; and a dummy transistor disposed on an upper surface of the element isolation region. The dummy transistor includes: a main interconnection extending in the Y direction; and a branch interconnection extending from the main interconnection in the X direction.Type: ApplicationFiled: March 1, 2023Publication date: December 14, 2023Applicant: Kioxia CorporationInventor: Takehiro NAKAI
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Patent number: 11828772Abstract: A sample for atomic force microscopy-based infrared spectroscopy includes a substrate, a measurement portion provided on the substrate and having a first light absorption intensity when a light of a first wavelength is irradiated thereon, and a first film provided on the measurement portion and having a higher coefficient of thermal expansion than the measurement portion and a second light absorption intensity, which is less than the first light absorption intensity, when the light of the first wavelength is irradiated thereon.Type: GrantFiled: August 5, 2022Date of Patent: November 28, 2023Assignee: Kioxia CorporationInventors: Machiko Ito, Yuji Yamada, Takehiro Nakai
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Publication number: 20230288351Abstract: An evaluation device includes an X-ray diffraction measuring device configured to acquire a first X-ray locking curve having a first main peak and a first sub-peak partially overlapping the first main peak by measuring an X-ray locking curve of a first portion of a sample having a crystalline material. The evaluation device includes an analysis device configured to separate the first sub-peak from the first main peak, perform first evaluation of a crystal defects or distortion of the sample based on a peak position, peak intensity, or a half width of the separated first sub-peak, and output the first evaluation.Type: ApplicationFiled: August 22, 2022Publication date: September 14, 2023Applicant: Kioxia CorporationInventors: Takehiro Nakai, Yumiko Yamashita, Ippei Kamiyama
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Publication number: 20230236221Abstract: A sample for atomic force microscopy-based infrared spectroscopy includes a substrate, a measurement portion provided on the substrate and having a first light absorption intensity when a light of a first wavelength is irradiated thereon, and a first film provided on the measurement portion and having a higher coefficient of thermal expansion than the measurement portion and a second light absorption intensity, which is less than the first light absorption intensity, when the light of the first wavelength is irradiated thereon.Type: ApplicationFiled: August 5, 2022Publication date: July 27, 2023Inventors: Machiko ITO, Yuji YAMADA, Takehiro NAKAI
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Patent number: 11521963Abstract: A semiconductor storage device includes a circuit region formed on a semiconductor substrate, and a guard ring region spaced from one side of the circuit region by a predetermined distance. The guard ring region extends in a first direction, the first direction being a direction in which the one side of the circuit region extends, includes a guard ring line, an element isolation region, a first defect trapping layer, a second defect trapping layer. The first defect trapping layer extends from a boundary location between the circuit region and the element isolation region to a location spaced from a boundary location between the element isolation region and the guard ring line by an offset distance toward the element isolation region in the second direction.Type: GrantFiled: July 24, 2020Date of Patent: December 6, 2022Assignee: KIOXIA CORPORATIONInventor: Takehiro Nakai
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Publication number: 20220148910Abstract: A semiconductor storage device includes: a semiconductor substrate; a plurality of circuit regions; and an element isolation region having a trench shape formed between the circuit regions. In the element isolation region including a thermal oxide film and a silicon oxide film, a sub-trench is formed in a bottom corner portion, and the thermal oxide film covers at least an inner wall of the sub-trench.Type: ApplicationFiled: August 20, 2021Publication date: May 12, 2022Applicant: Kioxia CorporationInventors: Takehiro NAKAI, Mizuki TAMURA, Yumiko YAMASHITA
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Publication number: 20210082908Abstract: A semiconductor storage device includes a circuit region formed on a semiconductor substrate, and a guard ring region spaced from one side of the circuit region by a predetermined distance. The guard ring region extends in a first direction, the first direction being a direction in which the one side of the circuit region extends, includes a guard ring line, an element isolation region, a first defect trapping layer, a second defect trapping layer. The first defect trapping layer extends from a boundary location between the circuit region and the element isolation region to a location spaced from a boundary location between the element isolation region and the guard ring line by an offset distance toward the element isolation region in the second direction.Type: ApplicationFiled: July 24, 2020Publication date: March 18, 2021Applicant: KIOXIA CORPORATIONInventor: Takehiro NAKAI
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Patent number: 10008426Abstract: An etching method for detecting crystal defects, the method includes providing a substrate with an etchant containing hydrogen fluoride, nitric acid, hydrogen chloride, and water. A concave portion on a part having a crystal defect of the substrate is formed by the etchant. The concave portion is examined by a microscope to locate a position of the crystal defect.Type: GrantFiled: September 1, 2016Date of Patent: June 26, 2018Assignee: TOSHIBA MEMORY CORPORATIONInventors: Takehiro Nakai, Norihiko Tsuchiya, Sakae Funo, Junichi Shimada, Youko Itabashi
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Publication number: 20170154829Abstract: An etching method for detecting crystal defects, the method includes providing a substrate with an etchant containing hydrogen fluoride, nitric acid, hydrogen chloride, and water. A concave portion on a part having a crystal defect of the substrate is formed by the etchant. The concave portion is examined by a microscope to locate a position of the crystal defect.Type: ApplicationFiled: September 1, 2016Publication date: June 1, 2017Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Takehiro NAKAI, Norihiko TSUCHIYA, Sakae FUNO, Junichi SHIMADA, Youko ITABASHI
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Patent number: 9645086Abstract: In accordance with an embodiment, a componential analysis method includes dividing a sample structure into at least a first layer to be analyzed and a second layer located closer to a surface layer of the sample than the first layer, applying, to the sample, laser lights of first and second wavelengths respectively corresponding to the depths of the first and second layers, detecting Raman scattered lights respectively obtained from the sample by the application of the laser lights and then outputting first and second Raman signals, spectrally processing the first and second Raman signals to acquire first and second Raman spectrums, acquiring a differential spectrum by subtracting the second Raman spectrum from the first Raman spectrum, and analyzing the differential spectrum.Type: GrantFiled: March 6, 2014Date of Patent: May 9, 2017Assignee: KABUSHIKI KAISHA TOSHIBAInventor: Takehiro Nakai
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Patent number: 9418285Abstract: An information processing apparatus includes an image capturing section to capture an image of a hand; an extracting section to extract a hand area from the captured image; a reference line determining section to determine a reference pushdown line in the image on the hand area; a determining section to determine a pushdown move if the bottom part of the hand area comes below the reference pushdown line; a first position determining section to determine a depth position based on an aspect ratio of the hand area if the pushdown move is determined; a second position determining section to determine a lateral position based on a position of the bottom part of the hand area if the pushdown move is determined; and an input key determining section to determine an input key from the determined depth position and lateral position.Type: GrantFiled: December 13, 2013Date of Patent: August 16, 2016Assignee: FUJITSU LIMITEDInventors: Taichi Murase, Katsuhito Fujimoto, Takehiro Nakai, Nobuyuki Hara, Noriaki Ozawa
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Patent number: 9305743Abstract: In accordance with an embodiment, a marking apparatus includes a charged particle beam device and a marking unit. The charged particle beam device generates a charged particle beam, irradiates a sample including a laminated body with the charged particle beam, detects secondary charged particles generated from the sample, and acquires a sample image. The marking unit bores a hole reaching at least a second layer from a surface layer in the laminated body in a viewing field of the charged particle beam device.Type: GrantFiled: September 10, 2014Date of Patent: April 5, 2016Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Takehiro Nakai, Hideki Shuto
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Patent number: 9213897Abstract: An image processing device that accesses a storage unit that stores a feature point of a recognition-target object, the device includes an obtaining unit mounted with a user and configured to obtain image data in a direction of a field of view of the user; a recognizing unit configured to recognize the recognition-target object included in the image data by extracting a feature point from the image data and associating the extracted feature point and the feature point of the recognition-target object stored in the storage unit with each other; a calculating unit configured to calculate a location change amount of the feature point corresponding to the recognition-target object recognized by the recognizing unit from a plurality of the image data obtained at different times and calculate a motion vector of the recognition-target object from the location change amount; and a determining unit configured to determine a movement.Type: GrantFiled: October 12, 2012Date of Patent: December 15, 2015Assignee: FUJITSU LIMITEDInventors: Takehiro Nakai, Atsunori Moteki, Katsuhito Fujimoto, Nobuyuki Hara, Noriaki Ozawa, Taichi Murase
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Publication number: 20150262786Abstract: In accordance with an embodiment, a marking apparatus includes a charged particle beam device and a marking unit. The charged particle beam device generates a charged particle beam, irradiates a sample including a laminated body with the charged particle beam, detects secondary charged particles generated from the sample, and acquires a sample image. The marking unit bores a hole reaching at least a second layer from a surface layer in the laminated body in a viewing field of the charged particle beam device.Type: ApplicationFiled: September 10, 2014Publication date: September 17, 2015Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Takehiro NAKAI, Hideki SHUTO
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Publication number: 20150062574Abstract: In accordance with an embodiment, a componential analysis method includes dividing a sample structure into at least a first layer to be analyzed and a second layer located closer to a surface layer of the sample than the first layer, applying, to the sample, laser lights of first and second wavelengths respectively corresponding to the depths of the first and second layers, detecting Raman scattered lights respectively obtained from the sample by the application of the laser lights and then outputting first and second Raman signals, spectrally processing the first and second Raman signals to acquire first and second Raman spectrums, acquiring a differential spectrum by subtracting the second Raman spectrum from the first Raman spectrum, and analyzing the differential spectrum.Type: ApplicationFiled: March 6, 2014Publication date: March 5, 2015Applicant: KABUSHIKI KAISHA TOSHIBAInventor: Takehiro NAKAI
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Patent number: 8773548Abstract: An image selection device includes: an image acquiring unit which acquires a plurality of shot images acquired by continuously shooting a subject; an area segmentation unit which segments an image area of the shot image into a motion area indicating different positions by a specified amount or more between two shot images and a non-motion area other than the motion area based on the two consecutive shot images in time series in the plurality of shot images; and a selection unit which selects at least one shot image from the plurality of shot images based on an amount of blur of an image in the non-motion area.Type: GrantFiled: June 11, 2012Date of Patent: July 8, 2014Assignee: Fujitsu LimitedInventors: Hiroyuki Kobayashi, Kimitaka Murashita, Masayoshi Shimizu, Takehiro Nakai
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Patent number: 8717445Abstract: An image pickup apparatus includes an imaging element for acquiring an image of a target object; a detector for detecting movement of the image pickup apparatus; and a controller for controlling focus of the imaging element on the target object while the movement of the image pickup apparatus detected by the detector is not more than a threshold degree.Type: GrantFiled: February 9, 2010Date of Patent: May 6, 2014Assignee: Fujitsu LimitedInventors: Takehiro Nakai, Akifumi Izumisawa
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Patent number: 8687105Abstract: An image capturing apparatus includes an image capturing unit having a function for adjusting a focal length, a stillness determination unit which determines whether or not a motion of the image capturing apparatus is within a predetermined range, a focal length adjustment processing unit which performs first focal length adjustment processing which adjusts the focal length in a direction for close-up photography when the motion of the image capturing apparatus is within the predetermined range, and a code recognition processing unit which recognizes a code from an image captured by the image capturing unit while the first focal length adjustment processing is being performed.Type: GrantFiled: March 10, 2011Date of Patent: April 1, 2014Assignee: Fujitsu LimitedInventors: Takehiro Nakai, Akifumi Izumisawa
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Publication number: 20120249826Abstract: An image selection device includes: an image acquiring unit which acquires a plurality of shot images acquired by continuously shooting a subject; an area segmentation unit which segments an image area of the shot image into a motion area indicating different positions by a specified amount or more between two shot images and a non-motion area other than the motion area based on the two consecutive shot images in time series in the plurality of shot images; and a selection unit which selects at least one shot image from the plurality of shot images based on an amount of blur of an image in the non-motion area.Type: ApplicationFiled: June 11, 2012Publication date: October 4, 2012Applicant: FUJITSU LIMITEDInventors: Hiroyuki KOBAYASHI, Kimitaka MURASHITA, Masayoshi SHIMIZU, Takehiro NAKAI