Patents by Inventor Takehiro SHINDOU

Takehiro SHINDOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8506718
    Abstract: A polymer removing apparatus for use in removing polymer annularly adhered to a peripheral portion of a target substrate includes a processing chamber for accommodating the target substrate having the polymer annularly adhered to the peripheral portion thereof; a mounting table for mounting the target substrate thereon; and a laser irradiation unit for irradiating ring-shaped laser light at once to the whole polymer annularly adhered to the target substrate. The polymer removing apparatus further includes an ozone gas supply unit for supplying an ozone gas to the polymer annularly adhered to the target substrate and a gas exhaust unit for exhausting the ozone gas.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: August 13, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Takehiro Shindou, Masaki Kondo
  • Patent number: 8497132
    Abstract: An ozone gas concentration measurement method that can easily measure the concentration of ozone gas. A process gas containing ozone gas is produced from a raw gas containing oxygen gas. The number of moles of gas molecules contained in the process gas is measured. The concentration of the ozone gas contained in the process gas is calculated based on the number of moles of gas molecules contained in the process gas.
    Type: Grant
    Filed: November 5, 2009
    Date of Patent: July 30, 2013
    Assignee: Tokyo Electron Limited
    Inventor: Takehiro Shindou
  • Patent number: 8454752
    Abstract: A foreign substance removing apparatus includes a mounting table for mounting and rotating a substrate; and a laser beam irradiation unit for removing foreign substances attached to a surface of the substrate by irradiating foreign substance cleaning laser beam onto the substrate mounted and rotated on the mounting table. In the foreign substance removing apparatus, the laser beam irradiation unit irradiates laser beam having an elongate shaped irradiation cross section onto the surface of the substrate.
    Type: Grant
    Filed: December 10, 2009
    Date of Patent: June 4, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Masaki Kondo, Takehiro Shindou
  • Publication number: 20110041874
    Abstract: A polymer removing apparatus for use in removing polymer annularly adhered to a peripheral portion of a target substrate includes a processing chamber for accommodating the target substrate having the polymer annularly adhered to the peripheral portion thereof; a mounting table for mounting the target substrate thereon; and a laser irradiation unit for irradiating ring-shaped laser light at once to the whole polymer annularly adhered to the target substrate. The polymer removing apparatus further includes an ozone gas supply unit for supplying an ozone gas to the polymer annularly adhered to the target substrate and a gas exhaust unit for exhausting the ozone gas.
    Type: Application
    Filed: August 17, 2010
    Publication date: February 24, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takehiro Shindou, Masaki Kondo
  • Publication number: 20100147327
    Abstract: A foreign substance removing apparatus includes a mounting table for mounting and rotating a substrate; and a laser beam irradiation unit for removing foreign substances attached to a surface of the substrate by irradiating foreign substance cleaning laser beam onto the substrate mounted and rotated on the mounting table. In the foreign substance removing apparatus, the laser beam irradiation unit irradiates laser beam having an elongate shaped irradiation cross section onto the surface of the substrate.
    Type: Application
    Filed: December 10, 2009
    Publication date: June 17, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masaki KONDO, Takehiro SHINDOU
  • Publication number: 20100147328
    Abstract: A foreign matter removal method that removes foreign matter attached to a surface of a substrate having been subjected to predetermined processing. An edge of a rotating substrate mounted on a mounting stage is irradiated with misalignment measurement laser light. The misalignment measurement laser light other than the laser light blocked by the edge of the substrate is received, and power thereof is detected. The amount of misalignment of the substrate is calculated based on the detected power of the misalignment measurement laser light and a detected rotation angle of the rotating substrate. The misalignment of the substrate is corrected for based on the calculated amount of misalignment. After that, foreign matter removal laser light is irradiated, and a process gas that is to react with the foreign matter is jetted to the edge of the substrate. Consequently, the foreign matter attached to the substrate is decomposed and removed.
    Type: Application
    Filed: December 14, 2009
    Publication date: June 17, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Takehiro SHINDOU
  • Publication number: 20100119439
    Abstract: An ozone gas concentration measurement method that can easily measure the concentration of ozone gas. A process gas containing ozone gas is produced from a raw gas containing oxygen gas. The number of moles of gas molecules contained in the process gas is measured. The concentration of the ozone gas contained in the process gas is calculated based on the number of moles of gas molecules contained in the process gas.
    Type: Application
    Filed: November 5, 2009
    Publication date: May 13, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Takehiro SHINDOU