Patents by Inventor Takehiro Sleshimo

Takehiro Sleshimo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10139724
    Abstract: The concepts described herein involve the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: November 27, 2018
    Assignee: Board of Regents The University of Texas System
    Inventors: C. Grant Willson, Christopher John Ellison, Takehiro Sleshimo, Julia Cushen, Christopher M. Bates, Leon Dean, Logan J. Santos, Erica L. Rausch
  • Publication number: 20150370159
    Abstract: The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.
    Type: Application
    Filed: August 28, 2015
    Publication date: December 24, 2015
    Inventors: Carlton Grant Willson, Christopher John Ellison, Takehiro Sleshimo, Julia Cushen, Christopher M. Bates, Leon Dean, Logan J. Santos, Erica L. Rausch