Patents by Inventor Takeo Moriyama

Takeo Moriyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for prepareing patterns used for manufacture of semiconductor device
    Patent number: 7062747
    Abstract: A method of preparing layout data of patterns formed in a scribe area. First, library data on which a plurality of patterns and arrangement limiting conditions of each pattern and arrangement importance of each pattern are registered is prepared. A pattern to be arranged in the scribe area is selected from the library data. Then, the selected pattern in the scribe area is arranged in accordance with the arrangement limiting conditions and arrangement importance of the selected pattern. In this method, it is not necessary to prepare many arrangement models, so that preparing time of layout data is shortened.
    Type: Grant
    Filed: December 30, 2002
    Date of Patent: June 13, 2006
    Assignee: Fujitsu Limited
    Inventors: Yukisada Horie, Takeo Moriyama, Takashi Kurihara, Ryo Shibata
  • Method and apparatus for prepareing patterns used for manufacture of semiconductor device
    Publication number: 20030163794
    Abstract: A method of preparing layout data of patterns formed in a scribe area. First, library data on which a plurality of patterns and arrangement limiting conditions of each pattern and arrangement importance of each pattern are registered is prepared. A pattern to be arranged in the scribe area is selected from the library data. Then, the selected pattern in the scribe area is arranged in accordance with the arrangement limiting conditions and arrangement importance of the selected pattern. In this method, it is not necessary to prepare many arrangement models, so that preparing time of layout data is shortened.
    Type: Application
    Filed: December 30, 2002
    Publication date: August 28, 2003
    Applicant: Fujitsu Limited
    Inventors: Yukisada Horie, Takeo Moriyama, Takashi Kurihara, Ryo Shibata
  • Process for producing dispersion of functional compound
    Patent number: 6136907
    Abstract: There are provided a finely dispersed material of a functional compound such as pigment or the like in the state of its inherent average particle diameter and a process for producing a finely dispersed material of a functional compound into a binder resin, in which the compound is dispersed in the state of its inherent average particle diameter not more than 3 microns, in spite of using the functional compound having an apparently large average particle diameter by agglomeration in comparison with the inherent average particle diameter of the compound, wherein when the above compound before dispersion is apparently in the dry state, de-ionized water is added thereto to form a hydrous paste of the compound and then this hydrous paste is contacted with a substance having an ion-exchange function selected depending upon the properties of the impurity ions contained in the above functional compound in a mixed solvent composed of de-ionized water and an organic solvent miscible with water to remove the impurity io
    Type: Grant
    Filed: August 26, 1998
    Date of Patent: October 24, 2000
    Assignee: Taisei Chemical Industries, Ltd.
    Inventors: Takashi Sunamori, Kyozo Yoshino, Kiyoshi Shingae, Kazuhisa Yamaguchi, Shigekazu Suzuki, Fujio Takiguchi, Takeo Moriyama