Abstract: An exhaust purifying device includes a throttle valve, a DOC device, an SCR device, a fuel injector, an inlet temperature sensor, an outlet temperature sensor, and a controller. The controller includes a heatup-control execution control unit configured to perform a regeneration treatment for removing a urea deposit when a predetermined heatup control execution condition is met, and a condition judgment unit configured to judge whether or not the first condition is met during the regeneration treatment by the heatup control.

Abstract: An exhaust purifying device (10) includes a throttle valve (20), a DOC device (30), an SCR device (50), a fuel injector (7), an inlet temperature sensor (31), an outlet temperature sensor (45), and a controller (8). The controller (8) includes a heatup-control execution control unit (82) configured to perform a regeneration treatment for removing a urea deposit when a predetermined heatup control execution condition is met, and a condition judgment unit (83) configured to judge whether or not the first condition is met during the regeneration treatment by the heatup control.

Abstract: A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

Abstract: A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.

Abstract: A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

Abstract: A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light.

Abstract: A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

Abstract: A surface inspection apparatus and a surface inspection method aim to securely deal with finer repetition pitch without shortening the wavelength of illumination light. To this end, the apparatus includes a unit illuminating repetitive pattern(s) formed on the substrate surface to be inspected with linearly polarized light, a unit setting to an oblique angle an angle between the direction of an intersecting line of a vibration plane of the linearly polarized light on the substrate surface and the repetition direction of repetitive pattern(s), a unit extracting a polarized light component perpendicular to the vibration plane of the linearly polarized light, from light having been emitted from the repetitive pattern(s) in a specular direction, and a unit detecting a defect of the repetitive pattern(s) according to the light intensity of the polarized light component.

Abstract: A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light.

Abstract: A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.

Abstract: A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light.

Abstract: A surface inspecting apparatus is provided with an illuminating means for illuminating a repeated pattern formed on the surface of an object to be inspected by linear polarization; a setting means for setting an angle formed by a direction on the surface of an incidence plane of the linear polarization and a repeating direction of the repeated pattern at a prescribed value other than 0; an extracting means for extracting polarization components vertical to an oscillation surface of the linear polarization, from light generated in a specular direction from the repeated pattern; a light receiving means for receiving the light extracted by the extracting means, and outputting light intensity of the specular reflection light; and a detecting means for detecting defects of the repeated pattern, based on the light intensity of the specular reflection light outputted from the light receiving means.

Abstract: A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.

Abstract: An apparatus and a method for defect inspection enables a reduction in the amount of noise light from an underlying layer and a good defect inspection reliably. The apparatus includes an illumination device that irradiates, with illumination light, a substrate to be inspected including a resist layer having cyclic patterns formed on the upper layer, and an optical image forming system that forms an image of the substrate to be inspected according to light that emerges from the substrate to be inspected by the irradiation with illumination light. The wavelength of the illumination light is set so that intensity of the light from the surface of the resist layer, among the light emerged from the substrate to be inspected, is greater than that of light that has passed through the surface of the cyclic pattern layer formed below the resist layer.

Abstract: A surface inspecting apparatus is provided with an illuminating means for illuminating a repeated pattern formed on the surface of an object to be inspected by linear polarization; a setting means for setting an angle formed by a direction on the surface of an incidence plane of the linear polarization and a repeating direction of the repeated pattern at a prescribed value other than 0; an extracting means for extracting polarization components vertical to an oscillation surface of the linear polarization, from light generated in a specular direction from the repeated pattern; a light receiving means for receiving the light extracted by the extracting means, and outputting light intensity of the specular reflection light; and a detecting means for detecting defects of the repeated pattern, based on the light intensity of the specular reflection light outputted from the light receiving means.

Abstract: A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light.

Abstract: An apparatus and a method for defect inspection enables a reduction in the amount of noise light from an underlying layer and a good defect inspection reliably. The apparatus includes an illumination device that irradiates, with illumination light, a substrate to be inspected including a resist layer having cyclic patterns formed on the upper layer, and an optical image forming system that forms an image of the substrate to be inspected according to light that emerges from the substrate to be inspected by the irradiation with illumination light. The wavelength of the illumination light is set so that intensity of the light from the surface of the resist layer, among the light emerged from the substrate to be inspected, is greater than that of light that has passed through the surface of the cyclic pattern layer formed below the resist layer.

Abstract: Defect inspection of repeated pattern on a surface is executed by reducing influence of a base layer. Thus, surface-inspecting apparatus and method include unit irradiating repeated pattern on specimen's surface with illuminating light, units setting an angle formed by direction on an incidence plane's surface including irradiating direction of illuminating light and a normal to the surface and repeated direction of repeated pattern to predetermined value except zero, a light detecting unit detecting regular reflected light from repeated pattern when illuminating light is irradiated and outputs information about light intensity of regular reflected light, and a detecting unit detecting the repeated pattern's defect on information, from light detecting unit.

Abstract: The present invention aims to provide a surface defect inspection apparatus and a surface defect inspection method for properly inspecting for a concave-shaped flaw (or a part thereof) substantially in parallel with a plane of incidence. The apparatus includes an illumination unit 10 illuminating a front surface (surface under inspection 5a) of an object to be inspected 5 with illumination light for inspection, a changing unit 1, 33 which relatively rotating the object to be inspected and the illumination unit around an axis AX1 perpendicular to the surface under inspection 5a and changing illumination conditions of the illumination light, a light reception unit 20 receiving scattered light emitted from the surface under inspection when illuminated with illumination light in each illumination condition, to capture images thereof, and a combining unit 32 combining images captured by the light reception unit to generate a combined image.

Abstract: A surface inspection apparatus includes an illumination means for illuminating a pattern formed through a predetermined pattern forming process containing a process of exposure of a resist layer formed on a substrate having a periodicity with a linearly polarized light, a setting means for setting a direction of the substrate such that a plane of vibration of the linear polarization and a direction of repetition of the pattern are obliquely to each other, an extraction means for extracting a polarization component having a plane of vibration perpendicular to that of the linear polarization out of specularly reflected light from the pattern, and an image forming means for forming an image of the surface of the substrate based on the extracted light. A pattern forming condition in the pattern forming process is specified based on the light intensity of the image of the surface of the substrate formed by the image forming means.