Patents by Inventor Takeo Tamaki

Takeo Tamaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Rotary cleaning method with chemical solutions and rotary cleaning apparatus with chemical solutions
    Patent number: 5487398
    Abstract: To provide a cleaning method and a cleaning apparatus for decreasing the total cost by producing high-performance semiconductor using silicon wafers with cleaner surface, decreasing the semiconductor production cost, decreasing the consumption of chemical solutions and the cleaning time by using a new cleaning method and apparatus, simplifying the recovery of waste liquids, and decreasing equipment investment.A cleaning method having a plurality of chemical-solution-cleaning processes characterized by performing a chemical-solution-cleaning process for continuously feeding a chemical solution to the surface of an object to be cleaned from an upper part of the object surface by horizontally setting the object in a cleaning bath, closing the bath, and then rotating the object and an ultrapure-water-cleaning process for feeding ultrapure water in order for each chemical solution in the same cleaning bath; and thereafter drying the object after cleaning it.
    Type: Grant
    Filed: June 20, 1994
    Date of Patent: January 30, 1996
    Assignees: Tadahiro Ohmi, Nisso Engineering Co., Ltd., MTC Co., Ltd.
    Inventors: Tadahiro Ohmi, Naomichi Yonekawa, Hiroyuki Horiki, Toshimitsu Kaji, Fumitomo Kunimoto, Takeo Tamaki