Patents by Inventor Takeshi Mitsuishi
Takeshi Mitsuishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150259509Abstract: A transparent molded article is comprised of a polymer of an isocyanate terminal prepolymer and one or more aromatic diamines, and the polymer further includes one or more phosphorous peroxide decomposing agents. The isocyanate terminal prepolymer is in the form of a reaction product of an aliphatic diisocyanate having an intramolecular cyclic structure and one of a polyether diol and a polyester diol, and the isocyanate group content of the prepolymer ranges from 10 to 20 weight percent.Type: ApplicationFiled: May 15, 2015Publication date: September 17, 2015Applicant: HOYA CORPORATIONInventors: Yoshitaka KITAHARA, Hiroshi OHTA, Masanori KADOTA, Takeshi MITSUISHI, Ken-ichi SHINDE, Hitoshi KAMURA
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Patent number: 7981471Abstract: A process for producing a thin film and an optical member which are free from discoloration of a lens and exhibit a good antistatic property and a good water repellency. The thin film is formed by a vacuum deposition of a water repellent solution which contains (a) a water repellent having a perfluoroalkyl group, (b) a mixture of a silane coupling agent, a modified silicone oil introduced with an organic group into its side chain and/or both terminal ends, and a perfluoroether compound, and (c) at least one conductive substance selected from the group consisting of fullerenes, carbon nanotubes and graphite compounds.Type: GrantFiled: May 18, 2007Date of Patent: July 19, 2011Assignee: Hoya CorporationInventors: Takeshi Mitsuishi, Terufumi Hamamoto, Ken-ichi Shinde
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Publication number: 20100040801Abstract: A material for vapor deposition which is obtained by mixing a specific organosilicon compound having an alkyl group substituted with fluorine, a specific silane compound and a specific modified silicone oil, a process for producing an optical member which comprises a step of solidifying the material for vapor deposition described above by heating and a step of vapor depositing the solidified material for vapor deposition on a substrate made of a plastics by heating by a heating means to form a thin film exhibiting a water-repelling property, a process for producing a plastic lens for spectacles which is the above process applied to producing the plastic lens for spectacles, and a plastic lens for spectacles which is produced in accordance with the process.Type: ApplicationFiled: September 28, 2007Publication date: February 18, 2010Inventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Yukihiro Takahashi
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Publication number: 20080286457Abstract: A process for producing a thin film and an optical member which are free from discoloration of a lens and exhibit a good antistatic property and a good water repellency. The thin film is formed by a vacuum deposition of a water repellent solution which contains (a) a water repellent having a perfluoroalkyl group, (b) a mixture of a silane coupling agent, a modified silicone oil introduced with an organic group into its side chain and/or both terminal ends, and a perfluoroether compound, and (c) at least one conductive substance selected from the group consisting of fullerenes, carbon nanotubes and graphite compounds.Type: ApplicationFiled: May 18, 2007Publication date: November 20, 2008Inventors: TAKESHI MITSUISHI, TERUFUMI HAMAMOTO, KEN-ICHI SHINDE
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Patent number: 7318959Abstract: The present invention provides an optical member having a plastic substrate and a multilayered antireflection film formed by vapor deposition, wherein at least one layer in the antireflection film is a hybrid layer formed of at least one inorganic substance selected from silicon dioxide, aluminum oxide, titanium oxide, zirconium oxide, tantalum oxide, yttrium oxide, and niobium oxide and an organosilicon compound that is a liquid at normal temperature and at atmospheric pressure and/or an organic compound not containing silicon that is a liquid at normal temperature and at atmospheric pressure as vapor deposition raw materials.Type: GrantFiled: December 24, 2003Date of Patent: January 15, 2008Assignee: Hoya CorporationInventors: Takeshi Mitsuishi, Takeshi Imizu, Hiroshi Kojima, Hitoshi Kamura, Ken-ichi Shinde
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Patent number: 7182976Abstract: A process for forming a thin film is described that enables automatic formation of thin films having constant optical properties reliably and in large quantities with excellent reproducibility suitable for mass production. An apparatus for performing the process is also described. Generally, a material for vapor deposition is vaporized by an electron gun and an antireflection film forms by vapor deposition on lenses held by a coat dome. The electric power applied to the electron gun is controlled so that the amount of transmitted or reflected light continuously measured by an optical film thickness meter during thin film formation is compared to a reference amount of measured light stored in a means for storing data until the measured and reference amounts of measured light are close to, or the same as, one another.Type: GrantFiled: December 30, 2002Date of Patent: February 27, 2007Assignee: Hoya CorporationInventors: Yukihiro Takahashi, Takeshi Mitsuishi, Kenichi Shinde
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Patent number: 7153584Abstract: Hybrid films, such as those having good abrasion-resistance and defogging properties, antireflection films including it, optical products, and methods for restoring the defogging property of the hybrid films are disclosed. The hybrid films having a defogging property may be obtained through vapor deposition of an organic compound having a hydrophilic group and a reactive group along with silicon dioxide or with silicon dioxide and aluminum oxide. The antireflection film may be formed on a substrate having the hybrid film as the outermost layer opposite to the substrate. The optical product may comprise a plastic substrate and the antireflection film having the hybrid film. A method for restoring the defogging property of the hybrid film of the optical product may include washing the hybrid film.Type: GrantFiled: November 5, 2004Date of Patent: December 26, 2006Assignee: Hoya CorporationInventors: Hiroshi Shirakawa, Takeshi Mitsuishi, Kenichi Shinde
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Patent number: 7106515Abstract: A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.Type: GrantFiled: November 13, 2001Date of Patent: September 12, 2006Assignee: Hoya CorporationInventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe
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Publication number: 20060013949Abstract: A vapor deposition crucible includes a crucible main body which is open to upper and lower sides and has a cavity in which a sintered pellet as a vapor deposition material is stored. The cavity of the crucible main body has two cavity portions. A first cavity portion connected to an opening open to the lower side is formed to make the sintered pellet to be stored fit in the first cavity portion. A second cavity portion connected to an opening open to the upper side is formed to form a gap between the second cavity portion and the sintered pellet to be stored. A step like portion is at least partially formed at a connection portion between the first cavity portion and the second cavity portion.Type: ApplicationFiled: September 8, 2005Publication date: January 19, 2006Inventors: Ken-ichi Shinde, Makoto Adachi, Takeshi Imizu, Takeshi Mitsuishi
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Patent number: 6958172Abstract: Hybrid films, such as those having good abrasion-resistance and defogging properties, antireflection films including it, optical products, and methods for restoring the defogging property of the hybrid films are disclosed. The hybrid films having a defogging property may be obtained through vapor deposition of an organic compound having a hydrophilic group and a reactive group along with silicon dioxide or with silicon dioxide and aluminum oxide. The antireflection film may be formed on a substrate having the hybrid film as the outermost layer opposite to the substrate. The optical product may comprise a plastic substrate and the antireflection film having the hybrid film. A method for restoring the defogging property of the hybrid film of the optical product may include washing the hybrid film.Type: GrantFiled: December 23, 2002Date of Patent: October 25, 2005Assignee: Hoya CorporationInventors: Hiroshi Shirakawa, Takeshi Mitsuishi, Kenichi Shinde
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Publication number: 20050221079Abstract: Hybrid films, such as those having good abrasion-resistance and defogging properties, antireflection films including it, optical products, and methods for restoring the defogging property of the hybrid films are disclosed. The hybrid films having a defogging property may be obtained through vapor deposition of an organic compound having a hydrophilic group and a reactive group along with silicon dioxide or with silicon dioxide and aluminum oxide. The antireflection film may be formed on a substrate having the hybrid film as the outermost layer opposite to the substrate. The optical product may comprise a plastic substrate and the antireflection film having the hybrid film. A method for restoring the defogging property of the hybrid film of the optical product may include washing the hybrid film.Type: ApplicationFiled: November 5, 2004Publication date: October 6, 2005Inventors: Hiroshi Shirakawa, Takeshi Mitsuishi, Kenichi Shinde
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Patent number: 6919134Abstract: The present invention is directed to an optical element having an antireflection film formed on a plastic substrate, wherein the reflectance of the antireflection film is low while the transmittance thereof is high. The impact resistance, the adhesiveness, the heat resistance, the abrasion resistance and the alkali resistance of the antireflection film on the plastic substrate are superior. The optical element having an antireflection film has at least one layer of the antireflection film that is a hybrid layer made of an inorganic substance and an organic substance.Type: GrantFiled: October 25, 2002Date of Patent: July 19, 2005Assignee: HOYA CorporationInventors: Takeshi Mitsuishi, Hiroshi Shirakawa, Kenichi Shinde
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Publication number: 20040151915Abstract: A transparent molded article comprised of a polymer of the following components (A) and (B), characterized in that said polymer further comprises the following components (C) and (D). A transparent molded article comprised of a polymer of the following components (A) and (B), characterized in that said polymer further comprises the following component (G). An optical member comprising an antireflective layer directly or indirectly on a polyurethane urea polymer substrate, characterized in that said antireflective layer is a multilayer antireflective layer comprising a ½ &lgr; layer, and said ½ &lgr; layer comprises a plural high refractive index layers comprising niobium oxide or niobium oxide, zirconium oxide and yttrium oxide, and a layer comprised of silicon dioxide positioned between the high refractive index layers.Type: ApplicationFiled: March 5, 2004Publication date: August 5, 2004Inventors: Yoshitaka Kitahara, Hiroshi Ohta, Masanori Kadota, Takeshi Mitsuishi, Ken-ichi Shinde, Hitoshi Kamura
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Publication number: 20040151918Abstract: The present invention is directed to an optical element having an antireflection film formed on a plastic substrate, wherein the reflectance of the antireflection film is low while the transmittance thereof is high. The impact resistance, the adhesiveness, the heat resistance, the abrasion resistance and the alkali resistance of the antireflection film on the plastic substrate are superior.Type: ApplicationFiled: October 25, 2002Publication date: August 5, 2004Applicant: Hoya CorporationInventors: Takeshi Mitsuishi, Hiroshi Shirakawa, Kenichi Shinde
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Publication number: 20040146723Abstract: The present invention provides an optical member having a plastic substrate and a multilayered antireflection film formed by vapor deposition, wherein at least one layer in the antireflection film is a hybrid layer formed of at least one inorganic substance selected from silicon dioxide, aluminum oxide, titanium oxide, zirconium oxide, tantalum oxide, yttrium oxide, and niobium oxide and an organosilicon compound that is a liquid at normal temperature and at atmospheric pressure and/or an organic compound not containing silicon that is a liquid at normal temperature and at atmospheric pressure as vapor deposition raw materials.Type: ApplicationFiled: December 24, 2003Publication date: July 29, 2004Inventors: Takeshi Mitsuishi, Takeshi Imizu, Hiroshi Kojima, Hitoshi Kamura, Ken-ichi Shinde
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Patent number: 6693747Abstract: An optical element having a plastic substrate and an antireflection film provided on the plastic substrate, characterized in that the optical element has a basic layer comprising Nb between the plastic substrate and the antireflection film. The optical element has high adhesiveness between the plastic substrate and the antireflection film and is characterized by excellent resistance to heat, impact, alkali, and abrasion.Type: GrantFiled: February 21, 2003Date of Patent: February 17, 2004Assignee: Hoya CorporationInventors: Takeshi Mitsuishi, Kenichi Shinde
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Publication number: 20030198818Abstract: The present invention is directed to an optical element having an antireflection film formed on a plastic substrate, wherein the reflectance of the antireflection film is low while the transmittance thereof is high. The impact resistance, the adhesiveness, the heat resistance, the abrasion resistance and the alkali resistance of the antireflection film on the plastic substrate are superior.Type: ApplicationFiled: October 25, 2002Publication date: October 23, 2003Applicant: Hoya CorporationInventors: Takeshi Mitsuishi, Hiroshi Shirakawa, Kenichi Shinde
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Publication number: 20030193719Abstract: An optical element having a plastic substrate and an antireflection film provided on the plastic substrate, characterized in that the optical element has a basic layer comprising Nb between the plastic substrate and the antireflection film. The optical element has high adhesiveness between the plastic substrate and the antireflection film and is characterized by excellent resistance to heat, impact, alkali, and abrasion.Type: ApplicationFiled: February 21, 2003Publication date: October 16, 2003Applicant: Hoya CorporationInventors: Takeshi Mitsuishi, Kenichi Shinde
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Patent number: 6627320Abstract: A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate. An antireflection film is formed having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance decreases little with time, that is useful in a variety of optical elements.Type: GrantFiled: November 29, 2001Date of Patent: September 30, 2003Assignee: Hoya CorporationInventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe
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Patent number: 6606196Abstract: An optical element having a plastic substrate and an antireflection film of a &lgr;/4-&lgr;/2-&lgr;/4 or &lgr;/4-&lgr;/4-&lgr;/2-&lgr;/4 type (&lgr;=500 nm) provided in that order on the plastic substrate, wherein the layer of &lgr;/2 is a high-refraction equivalent film containing at least three layers and having a refractive index of from 1.80 to 2.40, and the even-numbered layer(s) of the equivalent film is an SiO2 layer or a layer in which SiO2 is a main component.Type: GrantFiled: August 28, 2001Date of Patent: August 12, 2003Assignee: Hoya CorporationInventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde