Abstract: An imaging display device includes an imaging unit, a processing unit, a display unit, and a pupil detection unit. The imaging unit includes a plurality of photoelectric conversion elements and is configured to acquire first image information. The processing unit is configured to process a signal from the imaging unit and generate second image information. The display unit is configured to display an image that is based on the signal from the processing unit. The pupil detection unit is configured to detect vector information of a pupil. The processing unit generates the second image information by processing the first image information based on the vector information on the pupil.

Abstract: An image capturing and display apparatus comprises a plurality of photoelectric conversion elements for converting incident light from the outside of the image capturing and display apparatus to electrical charge signals, and a plurality of light-emitting elements for emitting light of an intensity corresponding to the electrical charge signals acquired by the plurality of photoelectric conversion elements. A pixel region is defined as a region in which the plurality of photoelectric conversion elements are arranged in an array. Signal paths for transmitting signals from the plurality of photoelectric conversion elements to the plurality of light-emitting elements lie within the pixel region.

Abstract: A method of manufacturing a semiconductor device through use of an organic polymeric material, the material having a superior embedding characteristic which enables uniform embedding without regard to density of hole patterns and realizing a high etch rate, an embedding material for use with the method and a semiconductor device. An organic polymeric material can be embedded into the hole patterns to a uniform height regardless of their density, by means of coating the material several times. Further, there is formed the organic polymeric material film 30 which is to be used for embedding hole patterns and from which a pigment component is eliminated so that the etch rate of the organic polymeric film 30 is increased. By means of applying the organic anti-reflective material film 32 over the organic polymeric material film 30, a film of uniform height can be formed through multiple stages. The interconnection trenches which do not require consideration for embedding hole patterns are formed first.