Patents by Inventor Taketo Ikeno

Taketo Ikeno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10975191
    Abstract: Provided is a urethane (meth)acrylate capable of achieving high strength and high elongation, as well as a method for manufacturing a urethane (meth)acrylate, a curable composition, a cured article, and a method for manufacturing a cured article. The urethane (meth)acrylate contains a structural unit derived from polycarbonate diol, a structural unit derived from polyisocyanate, and a hydroxy group-containing (meth)acrylate-derived group, the polycarbonate diol containing one or more types of structural unit represented by formula (1) wherein each of R1, R2, R3 and R4 independently represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: April 13, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Taketo Ikeno, Umi Yokobori, Hideyuki Sato, Ryuji Hasemi
  • Patent number: 10633391
    Abstract: Provided is a diol that excels in thermal stability; and, a method for manufacturing a diol, a di(meth)acrylate, and a method for manufacturing a di(meth)acrylate. The diol represented by the formula (1) below; wherein each of R1 and R2 independently represents a hydrocarbon group; and each R3 independently represents a hydrogen atom, hetero atom-containing group, halogen atom, straight chain alkyl group having 1 to 6 carbon atoms, branched alkyl group having 3 to 6 carbon atoms or, aryl group-containing group having 6 to 12 carbon atoms.
    Type: Grant
    Filed: October 11, 2017
    Date of Patent: April 28, 2020
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hideyuki Sato, Atsushi Okamoto, Taketo Ikeno, Tetsuya Shimo
  • Publication number: 20200123303
    Abstract: Provided is a urethane (meth)acrylate capable of achieving high strength and high elongation, as well as a method for manufacturing a urethane (meth)acrylate, a curable composition, a cured article, and a method for manufacturing a cured article. The urethane (meth)acrylate contains a structural unit derived from polycarbonate diol, a structural unit derived from polyisocyanate, and a hydroxy group-containing (meth)acrylate-derived group, the polycarbonate diol containing one or more types of structural unit represented by formula (1) wherein each of R1, R2, R3 and R4 independently represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms.
    Type: Application
    Filed: May 25, 2017
    Publication date: April 23, 2020
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Taketo IKENO, Umi YOKOBORI, Hideyuki SATO, Ryuji HASEMI
  • Patent number: 10457762
    Abstract: The present invention relates to a diacrylate compound represented by general formula (1), a composition thereof, and a cured product of the compound/composition. In the formula, R denotes a hydrogen atom or a methyl group; R1, R2, R3, and R4 each independently denote a C1-6 linear or branched alkyl group, with the proviso that R1, R2, R3, and R4 are not all methyl groups. The present invention provides: a novel diacrylate compound which can provide a cured product having an excellent balance of physical properties such as low curing shrinkage, flexibility, resistance to bending, and low curling properties, and which can be used as a photo- or thermal-radical polymerizable monomer; a composition of the compound; and a cured product of the compound/composition.
    Type: Grant
    Filed: July 2, 2015
    Date of Patent: October 29, 2019
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Umi Yokobori, Taketo Ikeno, Hideyuki Sato, Tomoo Tsujimoto
  • Publication number: 20190256524
    Abstract: Provided is a diol that excels in thermal stability; and, a method for manufacturing a diol, a di(meth)acrylate, and a method for manufacturing a di(meth)acrylate. The diol represented by the formula (1) below; wherein each of R1 and R2 independently represents a hydrocarbon group; and each R3 independently represents a hydrogen atom, hetero atom-containing group, halogen atom, straight chain alkyl group having 1 to 6 carbon atoms, branched alkyl group having 3 to 6 carbon atoms or, aryl group-containing group having 6 to 12 carbon atoms.
    Type: Application
    Filed: October 11, 2017
    Publication date: August 22, 2019
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hideyuki SATO, Atsushi OKAMOTO, Taketo IKENO, Tetsuya SHIMO
  • Patent number: 10294319
    Abstract: The invention provides a triacrylate compound represented by the following formula (1). In the formula, each R is independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a halogen atom, R1 and R2 are each independently a linear or branched alkyl group having 1 to 6 carbon atoms, and R3 is a linear or branched alkyl group having 1 to 6 carbon atoms or a hydroxymethyl group.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: May 21, 2019
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Umi Yokobori, Taketo Ikeno, Hideyuki Sato, Ryuji Hasemi
  • Patent number: 10125259
    Abstract: The present invention relates to a limited composition containing a diacrylate compound represented by general formula (1). In the formula, R denotes a hydrogen atom or a methyl group. The present invention provides a diacrylate-compound-containing composition which provides a cured product having excellent physical properties such as low curing shrinkage, flexibility, resistance to bending, and low curling properties, and which can be used as a photo- or thermal-radical polymerizable composition and a cured product of the composition.
    Type: Grant
    Filed: July 2, 2015
    Date of Patent: November 13, 2018
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Umi Yokobori, Taketo Ikeno, Hideyuki Sato, Tomoo Tsujimoto
  • Publication number: 20170335043
    Abstract: The invention provides a triacrylate compound represented by the following formula (1). In the formula, each R is independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a halogen atom, R1 and R2 are each independently a linear or branched alkyl group having 1 to 6 carbon atoms, and R3 is a linear or branched alkyl group having 1 to 6 carbon atoms or a hydroxymethyl group.
    Type: Application
    Filed: October 21, 2015
    Publication date: November 23, 2017
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Umi YOKOBORI, Taketo IKENO, Hideyuki SATO, Ryuji HASEMI
  • Publication number: 20170158855
    Abstract: The present invention relates to a limited composition containing a diacrylate compound represented by general formula (1). In the formula, R denotes a hydrogen atom or a methyl group. The present invention provides a diacrylate-compound-containing composition which provides a cured product having excellent physical properties such as low curing shrinkage, flexibility, resistance to bending, and low curling properties, and which can be used as a photo- or thermal-radical polymerizable composition and a cured product of the composition.
    Type: Application
    Filed: July 2, 2015
    Publication date: June 8, 2017
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Umi YOKOBORI, Taketo IKENO, Hideyuki SATO, Tomoo TSUJIMOTO
  • Patent number: 9657173
    Abstract: A curable resin composition which can achieve a cured product in which the generation of cracks upon curing is suppressed and which has both a low thermal expansion rate and a low water absorbability is provided. The curable resin composition comprises: at least a cyanate ester compound (A) represented by the following formula (I); a metal complex catalyst (B); and an additive (C), wherein the additive (C) contains any one or more selected from the group consisting of a compound represented by the following general formula (II), a compound represented by the following general formula (III), and a tertiary amine.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: May 23, 2017
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Makoto Tsubuku, Taketo Ikeno, Masayuki Katagiri, Tomoo Tsujimoto
  • Publication number: 20170129980
    Abstract: The present invention relates to a diacrylate compound represented by general formula (1), a composition thereof, and a cured product of the compound/composition. In the formula, R denotes a hydrogen atom or a methyl group; R1, R2, R3, and R4 each independently denote a C1-6 linear or branched alkyl group, with the proviso that R1, R2, R3, and R4 are not all methyl groups. The present invention provides: a novel diacrylate compound which can provide a cured product having an excellent balance of physical properties such as low curing shrinkage, flexibility, resistance to bending, and low curling properties, and which can be used as a photo- or thermal-radical polymerizable monomer; a composition of the compound; and a cured product of the compound/composition.
    Type: Application
    Filed: July 2, 2015
    Publication date: May 11, 2017
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Umi YOKOBORI, Taketo IKENO, Hideyuki SATO, Tomoo TSUJIMOTO
  • Patent number: 9475761
    Abstract: A method for efficiently producing a cyanogen halide with suppressed side effects, and a method for producing a high-purity cyanate ester compound at a high yield includes contacting a halogen molecule with an aqueous solution containing hydrogen cyanide and/or a metal cyanide, so that the hydrogen cyanide and/or the metal cyanide is allowed to react with the halogen molecule in the reaction solution to obtain the cyanogen halide, wherein more than 1 mole of the hydrogen cyanide or the metal cyanide is used based on 1 mole of the halogen molecule, and when an amount of substance of an unreacted hydrogen cyanide or an unreacted metal cyanide is defined as mole (A) and an amount of substance of the generated cyanogen halide is defined as mole (B), the reaction is terminated in a state in which (A):(A)+(B) is between 0.00009:1 and 0.2:1.
    Type: Grant
    Filed: October 25, 2013
    Date of Patent: October 25, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masayuki Katagiri, Yuuichi Sugano, Taketo Ikeno, Makoto Tsubuku, Keita Tokuzumi, Kenj Arii, Takashi Kobayashi, Masanobu Sogame, Yoshinori Mabuchi, Yoshihiro Kato
  • Patent number: 9453126
    Abstract: There is provided a novel dicyanatophenyl-based difunctional cyanate ester which is in a liquid form at ordinary temperature and can obtain a cured product having an excellent low thermal expansion rate. There is disclosed a cyanate ester compound represented by the following formula (I): (wherein R1 represents a hydrocarbon group having 2 to 20 carbon atoms).
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: September 27, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Makoto Tsubuku, Taketo Ikeno, Masayuki Katagiri, Tomoo Tsujimoto
  • Publication number: 20150299110
    Abstract: A method for efficiently producing a cyanogen halide with suppressed side effects, and a method for producing a high-purity cyanate ester compound at a high yield includes contacting a halogen molecule with an aqueous solution containing hydrogen cyanide and/or a metal cyanide, so that the hydrogen cyanide and/or the metal cyanide is allowed to react with the halogen molecule in the reaction solution to obtain the cyanogen halide, wherein more than 1 mole of the hydrogen cyanide or the metal cyanide is used based on 1 mole of the halogen molecule, and when an amount of substance of an unreacted hydrogen cyanide or an unreacted metal cyanide is defined as mole (A) and an amount of substance of the generated cyanogen halide is defined as mole (B), the reaction is terminated in a state in which (A):(A)+(B) is between 0.00009:1 and 0.2:1.
    Type: Application
    Filed: October 25, 2013
    Publication date: October 22, 2015
    Inventors: Masayuki KATAGIRI, Yuuichi SUGANO, Taketo IKENO, Makoto TSUBUKU, Keita TOKUZUMI, Kenj ARII, Takashi KOBAYASHI, Masanobu SOGAME, Yoshinori MABUCHI, Yoshihiro KATO
  • Publication number: 20140242394
    Abstract: A curable resin composition which is in a liquid form at ordinary temperature and provides a cured product having excellent heat resistance and a low thermal expansion rate is provided. The curable resin composition according to the present invention comprises: a cyanate ester compound (A) represented by the following formula (I); and a curing accelerator (B): wherein R1 represents a hydrocarbon group having 2 to 20 carbon atoms.
    Type: Application
    Filed: July 2, 2012
    Publication date: August 28, 2014
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Makoto Tsubuku, Taketo Ikeno, Masayuki Katagiri, Yuuichi Sugano
  • Patent number: 8779162
    Abstract: There is provided a novel cyanate ester compound that can provide a cured product possessing excellent heat resistance. The cyanate ester compound is represented by general formula (1): wherein R1 represents an aromatic substituent having 6 to 10 carbon atoms or an alkyl group having 1 to 20 carbon atoms; Rx1's each independently represent a hydrogen atom, an alkyl or alkoxy group having 1 to 20 carbon atoms, or a halogen; Ry1's each independently represent a hydrogen atom, an alkyl or alkoxy group having 1 to 20 carbon atoms, or a halogen; m is an integer of 0 to 4; and n is an integer of 0 to 4.
    Type: Grant
    Filed: January 18, 2011
    Date of Patent: July 15, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Taketo Ikeno, Makoto Tsubuku, Masayuki Katagiri, Tomoo Tsujimoto
  • Publication number: 20130281640
    Abstract: There is provided a novel dicyanatophenyl-based difunctional cyanate ester which is in a liquid form at ordinary temperature and can obtain a cured product having an excellent low thermal expansion rate. There is disclosed a cyanate ester compound represented by the following formula (I): (wherein R1 represents a hydrocarbon group having 2 to 20 carbon atoms).
    Type: Application
    Filed: October 25, 2011
    Publication date: October 24, 2013
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Makoto Tsubuku, Taketo Ikeno, Masayuki Katagiri, Tomoo Tsujimoto
  • Patent number: 8507504
    Abstract: The present invention relates to a process for producing a hydrate of 3-(2,6-dichlorophenyl)-4-imino-7-[(2?-methyl-2?,3?-dihydro-1?H-spiro[cyclopropane-1,4?-isoquinolin]-7?-yl)amino]-3,4-dihydropyrimido[4,5-d]pyrimidin-2(1H)-one (Compound A) or of a pharmaceutically acceptable salt of Compound A and a crystalline form of Compound A or of a pharmaceutically acceptable salt of Compound A, which are useful in the field of treatment of various cancers as a kinase inhibitor, especially as a Weel kinase inhibitor.
    Type: Grant
    Filed: June 2, 2009
    Date of Patent: August 13, 2013
    Assignee: Merck Sharp & Dohme Corp.
    Inventors: Shuntaro Furukawa, Taketo Ikeno, Shinji Kato, Masashi Kawasaki, Hisaki Kojima, Wataru Minagawa, Naotaka Sawada, Fuyuki Yamamoto, Sachin Lohani, Yaling Wang
  • Publication number: 20130023640
    Abstract: There is provided a novel cyanate ester compound that can provide a cured product possessing excellent heat resistance. The cyanate ester compound is represented by general formula (1): wherein R1 represents an aromatic substituent having 6 to 10 carbon atoms or an alkyl group having 1 to 20 carbon atoms; Rx1's each independently represent a hydrogen atom, an alkyl or alkoxy group having 1 to 20 carbon atoms, or a halogen; Ry1's each independently represent a hydrogen atom, an alkyl or alkoxy group having 1 to 20 carbon atoms, or a halogen; m is an integer of 0 to 4; and n is an integer of 0 to 4.
    Type: Application
    Filed: January 18, 2011
    Publication date: January 24, 2013
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Taketo Ikeno, Makoto Tsubuku, Masayuki Katagiri, Tomoo Tsujimoto
  • Publication number: 20110092520
    Abstract: The present invention relates to a process for producing a hydrate of 3-(2,6-dichlorophenyl)-4-imino-7-[(2?-methyl-2?,3?-dihydro-1?H-spiro[cyclopropane-1,4?-isoquinolin]-7?-yl)amino]-3,4-dihydropyrimido[4,5-d]pyrimidin-2(1H)-one (Compound A) or of a pharmaceutically acceptable salt of Compound A and a crystalline form of Compound A or of a pharmaceutically acceptable salt of Compound A, which are useful in the field of treatment of various cancers as a kinase inhibitor, especially as a Weel kinase inhibitor.
    Type: Application
    Filed: June 2, 2009
    Publication date: April 21, 2011
    Inventors: Shuntaro Furukawa, Taketo Ikeno, Shinji Kato, Masashi Kawasaki, Hisaki Kojima, Wataru Minagawa, Naotaka Sawada, Fuyuki Yamamoto, Sachin Lohani, Yaling Wang