Patents by Inventor Taku Kawaguchi

Taku Kawaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board
    Patent number: 7078151
    Abstract: A photosensitive element comprising a support film and a photosensitive resin layer formed on the support film is provided, wherein the support film is a multilayer support film comprising at least three layers; and wherein the photosensitive resin layer comprises a photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group within a molecule, and (C) a photopolymerization initiator.
    Type: Grant
    Filed: September 20, 2001
    Date of Patent: July 18, 2006
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Tomoaki Aoki, Taku Kawaguchi, Tatsuya Ichikawa
  • Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board
    Publication number: 20040018446
    Abstract: A photosensitive element comprising a support film and a photosensitive resin layer formed on the support film is provided, wherein the support film is a multilayer support film comprising at least three layers; and wherein the photosensitive resin layer comprises a photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group within a molecule, and (C) a photopolymerization initiator.
    Type: Application
    Filed: August 25, 2003
    Publication date: January 29, 2004
    Inventors: Tomoaki Aoki, Taku Kawaguchi, Tatsuya Ichikawa
  • Photosensitive resin composition
    Patent number: 4980266
    Abstract: A photosensitive resin composition comprising (A) a carboxyl group-containing film-forming property imparting polymer, (B) a copolymerizable vinyl compound, (C) a photopolymerization initiator, and (D) a 1,2,3-benzotriazole derivative is useful for forming a photosensitive film excellent in resistance to plating and stability.
    Type: Grant
    Filed: May 15, 1990
    Date of Patent: December 25, 1990
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Taku Kawaguchi, Yoshitaka Minami, Tatsuya Ichikawa