Patents by Inventor Takuma Tanimoto

Takuma Tanimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020123317
    Abstract: A radio frequency module packaging system and method characterized by compact package size, reduced packaging loss and variation, and reduced heat generation. The radio frequency module is provided with via holes, electrodes for signals, and grounding electrodes on the surface of a substrate. Under the electrodes for signals, via holes are made, and on both sides of the electrodes for signals, grounding via holes are made so that these via holes form microstrip lines. Both input and output ends of a high frequency circuit including an active device, formed as the module's functional circuit on the substrate, are routed through the via holes and connected to another circuit.
    Type: Application
    Filed: June 19, 2001
    Publication date: September 5, 2002
    Inventors: Takuma Tanimoto, Shinichiro Takatani, Hiroshi Kondoh
  • Patent number: 5548138
    Abstract: In a semiconductor device using tunnel current and a barrier layer, arrangements are provided to lower the resistance of the semiconductor device. In particular, arrangements are provided to lower the parasitic resistance of a device such as a field effect transistor or an HBT, as well as to provide high-performance low noise amplifiers, mixers and the like using such reduced resistance semiconductor devices. To achieve this reduced resistance, carrier concentration or effective mass is designed not to be uniform in at least one of the semiconductor layers holding a barrier layer therebetween. For example, in an area near the barrier layer, the carrier concentration distribution can be large or the effective mass distribution can be small.
    Type: Grant
    Filed: September 15, 1993
    Date of Patent: August 20, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Takuma Tanimoto, Makoto Kudo, Tomoyoshi Mishima, Akishige Nakajima, Mitsuhiro Mori, Masao Yamane
  • Patent number: 5495115
    Abstract: A semiconductor crystalline laminate structure wherein between a first semiconductor layer consisting of a first alloyed semiconductor and a second semiconductor layer which has an energy gap wider than that of the first alloyed semiconductor and a lattice constant smaller than that of the first alloyed semiconductor and consists of one semiconductor selected from a group of single-element semiconductor, compound semiconductor, and alloyed semiconductor which contain no semiconductor having a largest lattice constant among the semiconductor constituting the first alloyed semiconductor, a third semiconductor layer which consists of a second alloyed semiconductor having an energy gap wider than that of the first alloyed semiconductor and contains the semiconductor having a largest lattice constant among the semiconductors constituting the first alloyed semiconductor is formed in contact with these layers, a forming method for the semiconductor crystalline laminate structure, and a semiconductor device using the
    Type: Grant
    Filed: August 8, 1994
    Date of Patent: February 27, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Kudo, Tomoyoshi Mishima, Takuma Tanimoto, Misuzu Sagawa
  • Patent number: 5401357
    Abstract: A method may be used to dry etch a sample including a plurality of regions different from each other in the photo-absorption of a light having a specified wavelength using an etching gas plasma. The method is capable of selectively etching the desired material from a plurality of materials having different types of band gap energies or from a plurality of materials having different band gap energies. The method includes a step of irradiating a light having the specified wavelength on the sample for reducing an etching rate of a region having a large photo-absorption coefficient to the light, thereby selectively etching a region having a small photo-absorption coefficient to the light.
    Type: Grant
    Filed: September 1, 1992
    Date of Patent: March 28, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Hidekazu Okuhira, Tetsuo Ono, Susumu Hiraoka, Keizo Suzuki, Junji Shigeta, Hiroshi Masuda, Mitsuhiro Mori, Takuma Tanimoto, Shinichi Nakatsuka, Katsuhiko Mitani