Patents by Inventor Takuya ISONO

Takuya ISONO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240182701
    Abstract: A resin composition for forming a phase-separated structure contains a block copolymer that is formed of a first block, a second block, and a third block, which are bonded to one another. The structure of a constituent unit of a polymer constituting the first block is identical to the structure of a constituent unit of a polymer constituting the third block. The number-average molecular weight (Mn3) of the polymer constituting the third block is smaller than the number-average molecular weight (Mn1) of the polymer constituting the first block.
    Type: Application
    Filed: November 17, 2023
    Publication date: June 6, 2024
    Inventors: Toshifumi Satoh, Takuya Isono, Kazushige Suzuki, Toi Iizuka, Ken Miyagi, Takahiro Dazai
  • Publication number: 20240182623
    Abstract: A method of producing a triblock copolymer, the method including reacting a diblock copolymer that contains a first block formed from a repeating structure including a constituent unit containing an aromatic hydrocarbon group, and a second block formed from a repeating structure including a constituent unit derived from an ?-substituted acrylic acid ester with a homopolymer that contains a third block formed from a repeating structure including a constituent unit containing an aromatic hydrocarbon group and containing a hydroxy group bonded to a terminal of a main chain in the third block to obtain a triblock copolymer, in which the reaction is transesterification of the constituent unit derived from an (?-substituted) acrylic acid ester at a terminal of a main chain of the diblock copolymer with the homopolymer.
    Type: Application
    Filed: November 17, 2023
    Publication date: June 6, 2024
    Inventors: Toshifumi Satoh, Takuya Isono, Kazushige Suzuki, Toi Iizuka, Ken Miyagi, Takahiro Dazai
  • Patent number: 11780948
    Abstract: A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) formed of a repeating structure of styrene units, the block (b1) being partially substituted with a constituent unit represented by the following General Formula (c1) and a block (b2) having a repeating structure of methyl methacrylate units.
    Type: Grant
    Filed: January 19, 2021
    Date of Patent: October 10, 2023
    Assignees: Tokyo Ohka Kogyo Co., Ltd., National University Corporation Hokkaido University
    Inventors: Ken Miyagi, Takahiro Dazai, Toshifumi Satoh, Takuya Isono, Shunma Tanaka
  • Patent number: 11466114
    Abstract: A composition for forming a phase-separated structure contains a block copolymer having a block (b1) consisting of a repeating structure of a styrene unit and a block (b2) consisting of a repeating structure of a methyl methacrylate unit, in which the block (b2) is disposed at least at one terminal portion of the block copolymer, the block copolymer has a structure (e1) represented by General Formula (e1) at least at one main chain terminal, and the structure (e1) is bonded to the main chain terminal of the block (b2) disposed at a terminal portion of the block copolymer. Ree0 represents a hydrocarbon group containing a hetero atom, and Re1 represents a hydrogen atom or a halogen atom.
    Type: Grant
    Filed: May 19, 2020
    Date of Patent: October 11, 2022
    Assignees: TOKYO OHKA KOGYO CO., LTD., NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY
    Inventors: Ken Miyagi, Takahiro Dazai, Toshifumi Satoh, Takuya Isono
  • Publication number: 20210230340
    Abstract: A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) formed of a repeating structure of styrene units, the block (b1) being partially substituted with a constituent unit represented by the following General Formula (c1) and a block (b2) having a repeating structure of methyl methacrylate units.
    Type: Application
    Filed: January 19, 2021
    Publication date: July 29, 2021
    Inventors: Ken MIYAGI, Takahiro DAZAI, Toshifumi SATOH, Takuya ISONO, Shunma TANAKA
  • Publication number: 20200369819
    Abstract: A composition for forming a phase-separated structure contains a block copolymer having a block (b1) consisting of a repeating structure of a styrene unit and a block (b2) consisting of a repeating structure of a methyl methacrylate unit, in which the block (b2) is disposed at least at one terminal portion of the block copolymer, the block copolymer has a structure (e1) represented by General Formula (e1) at least at one main chain terminal, and the structure (e1) is bonded to the main chain terminal of the block (b2) disposed at a terminal portion of the block copolymer. Ree0 represents a hydrocarbon group containing a hetero atom, and Re1 represents a hydrogen atom or a halogen atom.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Inventors: Ken Miyagi, Takahiro Dazai, Toshifumi Satoh, Takuya Isono
  • Publication number: 20180072564
    Abstract: A resin composition for forming a phase-separated structure includes a block copolymer having a block (b1) having a repeating structure of styrene units; a block (b2) having a repeating structure of methyl methacrylate units partially substituted with a constituent unit represented by general formula (h1); and a number average molecular weight of less than 28,000. In general formula (h1), Rh0 is a hydrophilic functional group.
    Type: Application
    Filed: July 18, 2017
    Publication date: March 15, 2018
    Inventors: Ken MIYAGI, Takehiro SESHIMO, Takaya MAEHASHI, Takahiro DAZAI, Hitoshi YAMANO, Toshifumi SATOH, Takuya ISONO