Patents by Inventor Tamotsu Kodama
Tamotsu Kodama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10208206Abstract: The present invention relates to a curable resin composition comprising (A) an epoxy compound having three or more epoxy groups in one molecule and (B) an active hydrogen compound.Type: GrantFiled: May 1, 2014Date of Patent: February 19, 2019Assignee: Asahi Kasei Chemicals CorporationInventors: Satoru Kaji, Ryoko Watanabe, Tamotsu Kodama
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Publication number: 20160115318Abstract: The present invention relates to a curable resin composition comprising (A) an epoxy compound having three or more epoxy groups in one molecule and (B) an active hydrogen compound.Type: ApplicationFiled: May 1, 2014Publication date: April 28, 2016Applicant: Asahi Kasei Chemicals CorporationInventors: Satoru KAJI, Ryoko WATANABE, Tamotsu KODAMA
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Patent number: 8906176Abstract: An absorbent composite comprising: a base material and water-absorbent resin particles; wherein the following conditions (1) to (4) are fulfilled: (1) the weight ratio of water-absorbent resin relative to the total weight of the base material and water-absorbent resin is 65 to 99 wt %, (2) the water-absorbent resin particles adhering directly to the base material constitute 50 wt % or more of the total water-absorbent resin particles; (3) the average absorption capacity of the water-absorbent resin particles is 50 g/g or more; and (4) the amount of residual monomers in the water-absorbent resin is 200 ppm or less.Type: GrantFiled: October 25, 2011Date of Patent: December 9, 2014Assignee: Asahi Kasei Chemicals CorporationInventors: Tsutomu Akiyama, Tamotsu Kodama, Masataka Nishi, Hiroshige Okamoto
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Patent number: 8778490Abstract: An absorbent composite comprising: a base material and water-absorbent resin particles; wherein the following conditions (1) to (4) are fulfilled: (1) the weight ratio of water-absorbent resin relative to the total weight of the base material and water-absorbent resin is 65 to 99 wt %, (2) the water-absorbent resin particles adhering directly to the base material constitute 50 wt % or more of the total water-absorbent resin particles; (3) the average absorption capacity of the water-absorbent resin particles is 50 g/g or more; and (4) the amount of residual monomers in the water-absorbent resin is 200 ppm or less.Type: GrantFiled: May 12, 2006Date of Patent: July 15, 2014Assignee: Asahi Kasei Chemicals CorporationInventors: Tsutomu Akiyama, Tamotsu Kodama, Masataka Nishi, Hiroshige Okamoto
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Patent number: 8563127Abstract: An absorbent composite comprising: a base material and water-absorbent resin particles; wherein the following conditions (1) to (4) are fulfilled: (1) the weight ratio of water-absorbent resin relative to the total weight of the base material and water-absorbent resin is 65 to 99 wt %, (2) the water-absorbent resin particles adhering directly to the base material constitute 50 wt % or more of the total water-absorbent resin particles; (3) the average absorption capacity of the water-absorbent resin particles is 50 g/g or more; and (4) the amount of residual monomers in the water-absorbent resin is 200 ppm or less.Type: GrantFiled: October 25, 2011Date of Patent: October 22, 2013Assignee: Asahi Kasei Chemicals CorporationInventors: Tsutomu Akiyama, Tamotsu Kodama, Masataka Nishi, Hiroshige Okamoto
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Publication number: 20120108421Abstract: An absorbent composite comprising: a base material and water-absorbent resin particles; wherein the following conditions (1) to (4) are fulfilled: (1) the weight ratio of water-absorbent resin relative to the total weight of the base material and water-absorbent resin is 65 to 99 wt %, (2) the water-absorbent resin particles adhering directly to the base material constitute 50 wt % or more of the total water-absorbent resin particles; (3) the average absorption capacity of the water-absorbent resin particles is 50 g/g or more; and (4) the amount of residual monomers in the water-absorbent resin is 200 ppm or less.Type: ApplicationFiled: October 25, 2011Publication date: May 3, 2012Applicant: ASAHI KASEI CHEMICALS CORPORATIONInventors: Tsutomu Akiyama, Tamotsu Kodama, Masataka Nishi, Hiroshige Okamoto
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Publication number: 20120109091Abstract: An absorbent composite comprising: a base material and water-absorbent resin particles; wherein the following conditions (1) to (4) are fulfilled: (1) the weight ratio of water-absorbent resin relative to the total weight of the base material and water-absorbent resin is 65 to 99 wt %, (2) the water-absorbent resin particles adhering directly to the base material constitute 50 wt % or more of the total water-absorbent resin particles; (3) the average absorption capacity of the water-absorbent resin particles is 50 g/g or more; and (4) the amount of residual monomers in the water-absorbent resin is 200 ppm or less.Type: ApplicationFiled: October 25, 2011Publication date: May 3, 2012Applicant: ASAHI KASEI CHEMICALS CORPORATIONInventors: Tsutomu Akiyama, Tamotsu Kodama, Masataka Nishi, Hiroshige Okamoto
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Publication number: 20110204289Abstract: Provided are a manufacturing method of water absorbing resin particle agglomerates capable of producing water absorbing resin particles having a sufficiently high water retention property and a large particle size without using a special material, which process has steps of (1) a polymerization step for producing primary particles of a water absorbing resin comprising suspending an aqueous monomer solution containing an unsaturated carboxylate in an organic solvent containing a nonionic surfactant therein, and subjecting the resulting suspension to reverse-phase suspension polymerization; and (2) an agglomeration step of agglomerating the primary particles by using a water soluble solvent.Type: ApplicationFiled: May 6, 2011Publication date: August 25, 2011Inventors: Naonori Higashimoto, Tamotsu Kodama, Masataka Nishi
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Publication number: 20090177174Abstract: An absorbent composite comprising: a base material and water-absorbent resin particles; wherein the following conditions (1) to (4) are fulfilled: (1) the weight ratio of water-absorbent resin relative to the total weight of the base material and water-absorbent resin is 65 to 99 wt %, (2) the water-absorbent resin particles adhering directly to the base material constitute 50 wt % or more of the total water-absorbent resin particles; (3) the average absorption capacity of the water-absorbent resin particles is 50 g/g or more; and (4) the amount of residual monomers in the water-absorbent resin is 200 ppm or less.Type: ApplicationFiled: May 12, 2006Publication date: July 9, 2009Applicant: ASAHI KASEI CHEMICALSInventors: Tsutomu Akiyama, Tamotsu Kodama, Masataka Nishi, Hiroshige Okamoto
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Publication number: 20090169891Abstract: Provided are a manufacturing method of water absorbing resin particle agglomerates capable of producing water absorbing resin particles having a sufficiently high water retention property and a large particle size without using a special material, which process has steps of (1) a polymerization step for producing primary particles of a water absorbing resin comprising suspending an aqueous monomer solution containing an unsaturated carboxylate in an organic solvent containing a nonionic surfactant therein, and subjecting the resulting suspension to reverse-phase suspension polymerization, and (2) an agglomeration step of agglomerating the primary particles by using a water soluble solvent; and water absorbing resin particle agglomerates stably showing a high water retention property and satisfying the following requirements: (a) 50 mol % or greater of repeating units of the polymer molecular chain of the water absorbing resin constituting the primary particles are carboxyl group-containing units and at leastType: ApplicationFiled: November 1, 2006Publication date: July 2, 2009Applicant: ASAHI KASEI CHEMICALS CORPORATIONInventors: Naonori Higashimoto, Tamotsu Kodama, Masataka Nishi
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Patent number: 7485696Abstract: Disclosed is an oxytetramethylene glycol copolymer, which is obtained by copolymerizing tetrahydrofuran and neopentyl glycol and which has a specific number average molecular weight Mn, a specific molecular weight distribution Mw/Mn, a specific neopentyl glycol copolymerization whole ratio Nw and a specific neopentyl glycol copolymerization partial ratio Nh, and a method for producing the same. Also disclosed is a method for purifying an oxytetramethylene glycol copolymer, which comprises adding a fresh tetrahydrofuran to a reaction mixture comprising an oxytetramethylene glycol copolymer and an unreacted diol, wherein the amount of added tetrahydrofuran is not less than the weight of the unreacted diol contained in the reaction mixture, and distilling off the unreacted diol together with the added tetrahydrofuran.Type: GrantFiled: April 2, 2007Date of Patent: February 3, 2009Assignee: Asahi Kasei Kabushiki KaishaInventors: Tamotsu Kodama, Haruyuki Minoura, Yoshiyuki Tsunematsu, Toshihiko Fukuzono, Satoshi Furubeppu
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Publication number: 20070173631Abstract: Disclosed is an oxytetramethylene glycol copolymer, which is obtained by copolymerizing tetrahydrofuran and neopentyl glycol and which has a specific number average molecular weight. Mn, a specific molecular weight distribution Mn/Mw, a specific neopentyl glycol copolymerization whole ratio Nw and a specific neopentyl glycol copolymerization partial ratio Nh, and a method for producing the same. Also disclosed is a method for purifying an oxytetramethylene glycol copolymer, which comprises adding a fresh tetrahydrofuran to a reaction mixture comprising an oxytetramethylene glycol copolymer and an unreacted diol, wherein the amount of added tetrahydrofuran is not less than the weight of the unreacted diol contained in the reaction mixture, and distilling off the unreacted diol together with the added tetrahydrofuran.Type: ApplicationFiled: April 2, 2007Publication date: July 26, 2007Inventors: Tamotsu Kodama, Haruyuki Minoura, Yoshiyuki Tsunematsu, Toshihiko Fukuzono, Satoshi Furubeppu
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Patent number: 7217783Abstract: An oxytetramethylene glycol copolymer obtained by copolymerizing tetrahydrofuran and neopentyl glycol which has a specific number average molecular weight Mn, a specific molecular weight distribution Mw/Mn, a specific neopentyl glycol copolymerization whole ratio Nw and a specific neopentyl glycol copolymerization partial ratio Nh; a method for producing the same; and a method for purifying an oxytetramethylene glycol copolymer using fresh tetrahydrofuran.Type: GrantFiled: April 16, 2001Date of Patent: May 15, 2007Assignee: Asahi Kasei Kabushiki KaishaInventors: Tamotsu Kodama, Toshihiko Fukuzono, Satoshi Furubeppu
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Publication number: 20040049007Abstract: Disclosed is an oxytetramethylene glycol copolymer, which is obtained by copolymerizing tetrahydrofuran and neopentyl glycol and which has a specific number average molecular weight Mn, a specific molecular weight distribution Mn/Mw, a specific neopentyl glycol copolymerization whole ratio Nw and a specific neopentyl glycol copolymerization partial ratio Nh, and a method for producing the same. Also disclosed is a method for purifying an oxytetramethylene glycol copolymer, which comprises adding a fresh tetrahydrofuran to a reaction mixture comprising an oxytetramethylene glycol copolymer and an unreacted diol, wherein the amount of added tetrahydrofuran is not less than the weight of the unreacted diol contained in the reaction mixture, and distilling off the unreacted diol together with the added tetrahydrofuran.Type: ApplicationFiled: July 9, 2003Publication date: March 11, 2004Inventors: Tamotsu Kodama, Haruyuki Minoura, Yoshiyuki Tsunematsu, Toshihiko Fukuzono, Satoshi Furubeppu
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Patent number: 6570041Abstract: Disclosed is a high heat resistance and low viscosity polyoxytetramethylene glycol (PTMG) having the following characteristics (1) to (4): (1) a number average molecular weight of from 500 to 3000; (2) a molecular weight distribution of 1.8 or less in terms of the Mw/Mn ratio; (3) a content of high molecular weight PTMG molecules of from 2 to 5% by weight, wherein the high molecular weight PTMG molecules are PTMG molecules having molecular weights which are at least six times as large as the number average molecular weight of all PTMG molecules; and (4) a heteropolyacid content of from 10 to 900 ppb by weight.Type: GrantFiled: January 22, 2002Date of Patent: May 27, 2003Assignee: Asahi Kasei Kabushiki KaishaInventors: Tamotsu Kodama, Takeshi Mori, Takaharu Akedo
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Patent number: 6524009Abstract: A rolling bearing in which the attainment of excellent current-carrying capability is compatible with cost reduction. The rolling bearing comprises an inner ring, an outer ring, and a plurality of rolling elements arranged between the inner and outer rings, oil films being interposed between the rolling elements and raceway surfaces of the-rings. Here, the inner raceway surface and the outer raceway surface are made coarser to such a surface roughness (Ra=0.1 &mgr;m or so) that they come into metal contact wit the rolling elements for electric connection.Type: GrantFiled: October 24, 2000Date of Patent: February 25, 2003Assignee: NTN CorporationInventors: Tetsuya Kurimura, Tamotsu Kodama, Tsukasa Toyoda
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Patent number: 6472525Abstract: Disclosed is an acyl group-containing hexaazaisowurtzitane derivative represented by the following formula (I): W At Q(6−t), wherein t represents an integer of from 4 to 6, A independently represents an acyl group having 1 to 10 carbon atoms, each Q independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and W represents a hexavalent hexaazaisowurtzitane residue represented by the following formula (II): Also disclosed is a method for producing the above-mentioned acyl group-containing hexaazaisowurtzitane derivative. The acyl group-containing hexaazaisowurtzitane derivative of the present invention is useful as a precursor of a polynitrohexaazaisowurtzitane derivative which can be used not only as a material for explosives but also as an additive for propellants and explosives.Type: GrantFiled: May 16, 1997Date of Patent: October 29, 2002Assignee: Asahi Kasei Kabushiki KaishaInventors: Tamotsu Kodama, Masahiro Tojo, Masanori Ikeda
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Patent number: 6297373Abstract: A method for acylating a hexakis (arylmethyl) hexaazaisowurtzitane (WB6) by reductively removing the arylmethyl groups in the presence of an acylating agent, characterized by contacting a WB6 (a) with a heterogeneous system reduction catalyst (b) in the presence of an acylating agent (c) and a reducing agent (d) in a solvent (e) for the WB6 (a) to reductively remove the arylmethyl groups from the WB6 (a) and acylate the same, and by preventing the WB6 (a) and the catalyst (b) from being contacted with each other when at least either of the acylating agent (c) and the reducing agent (d) is not present. In this method, the decomposition of the WB6 skeleton, which readily occurs in the beginning of the acylation of the WB6 as a starting material, can be highly effectively inhibited. This method can hence stably produce a tetraacylhexaazaisowurtzitane derivative in a high yield and is industrially advantageous.Type: GrantFiled: March 14, 2000Date of Patent: October 2, 2001Assignee: Asahi Kasei Kabushiki KaishaInventors: Tamotsu Kodama, Naoko Ishihara, Haruyuki Minoura, Nobuhisa Miyake, Setsuo Yamamatsu
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Patent number: 6297372Abstract: A nitro group-containing hexaazaisowurtzitane derivative represented by the following general formula (I): W An N(6−n) (I) wherein n is an integer of 4 or 5, A is an acyl group having 1-10 carbon atoms with each acyl group being the same as or different from one or more of the others, N is a nitro group and W is a hexavalent hexaazaisowurtzitane residue represented by the following formula (II): a nitroso group-containing hexaazaisowurtzitane derivative represented by the following general formula (III): W An NS(6−n) (III) wherein n is an integer of 4 or 5, A is an acyl group having 1-10 carbon atoms with each acyl group being the same as or different from one or more of the others, NS is a nitroso group and W is a hexavalent hexaazaisowurtzitane residue of formula (II) above, and an acyl group-containing hexaazaisowurtzitane derivative represented by the following general formula (IV): W Am H(6−m) (IV) wherein N is an integer of 4-6,Type: GrantFiled: September 30, 1999Date of Patent: October 2, 2001Assignee: Asahi Kasei Kabushiki KaishaInventors: Shuji Kawabe, Hiroshi Miya, Tamotsu Kodama, Nobuhisa Miyake
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Patent number: 6153749Abstract: Disclosed is a method for producing an acyl group-containing hexaazaisowurtzitane derivative represented by the following formula (1),WA.sub.n H.sub.(6-n) (1)wherein n represents an integer of 4 or 6, each A independently represents an acyl group having 1 to 10 carbon atoms, H represents a hydrogen atom, and W represents a hexavalent hexaazaisowurtzitane residue represented by the following formula (2): ##STR1## which comprises: providing a composition system comprising a mixed solvent of a first solvent and a second solvent respectively having high and low dissolving abilities for the desired compound, wherein the mixed solvent has the desired compound dissolved therein; and removing the first solvent having a high dissolving ability from the composition system to thereby deposit crystals of the desired compound. The desired compound, which is useful as a precursor of high performance explosive additive, i.e.Type: GrantFiled: January 11, 1999Date of Patent: November 28, 2000Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Tamotsu Kodama, Haruyuki Minoura, Nobuhisa Miyake, Setsuo Yamamatsu, Tsutomu Katsumata