Patents by Inventor Tatsufumi Aoi
Tatsufumi Aoi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7683556Abstract: In an acceleration tube conditioning apparatus for performing a conditioning process on an acceleration tube when a high frequency power signal to be supplied to an acceleration tube is generated by a high frequency power supply, a power value collecting section collects a traveling wave power value and a reflection wave power value from a sensor which monitors the traveling wave power signal and the reflection wave power signal. A high frequency calculating section calculates a resonance frequency of the acceleration tube based on the traveling wave power value and the reflection wave power value. A high frequency adjusting section determines a high frequency value based on one of the traveling wave power value and the reflection wave power value as a selection power value, and a high frequency power supply control unit controls the high frequency power supply based on the high frequency value.Type: GrantFiled: September 28, 2007Date of Patent: March 23, 2010Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Tatsufumi Aoi, Kuniyuki Kajinishi, Ichiro Yamashita, Susumu Urano, Shinji Nomura
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Publication number: 20100065749Abstract: A transmission type dosimeter includes electrodes configured to collect charged particles ionized with radiation, a body, in a cavity of which, the electrodes are arranged, and a lid configured to seal the cavity in the body. The lid includes a fixing frame section fixed on the body, and a transmission section formed with the fixing frame section as a unit body. The transmission section is thinner than the fixing frame section.Type: ApplicationFiled: August 18, 2009Publication date: March 18, 2010Inventors: Shinji Nomura, Tatsufumi Aoi, Ichiro Yamashita, Yoshio Sugimoto, Yuichiro Kamino
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Publication number: 20100034352Abstract: A radiotherapy apparatus includes an acceleration unit configured to generate a charged particle beam. A target is configured to generate a radiation when the charged particle beam is irradiated to the target. A sensor is configured to measure an electric current flowing through the target. A dosimeter is configured to measure a dose of the radiation. A control unit is configured to control the acceleration unit based on the measured electric current and the measured dose.Type: ApplicationFiled: February 5, 2009Publication date: February 11, 2010Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Tatsufumi AOI, Ichiro YAMASHITA, Kazuhiro TSUKUDA, Etsuro HIRAI, Yuichiro Kamino
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Patent number: 7619374Abstract: A radiotherapy system includes: a waveguide, an adjustable waveguide, and a non-reciprocal circuit element. The waveguide transmits a high-frequency wave from a high-frequency power source to an acceleration tube. The adjustable waveguide is included in said waveguide and transforms a part of said waveguide. The non-reciprocal circuit element is provided between said acceleration tube and said adjustable waveguide in said waveguide. Said acceleration tube accelerates charged particles for generating therapeutic radiation by using said high-frequency wave.Type: GrantFiled: December 4, 2007Date of Patent: November 17, 2009Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Tatsufumi Aoi, Kuniyuki Kajinishi, Ichiro Yamashita, Shinji Nomura, Yoshio Sugimoto, Susumu Urano
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Publication number: 20090273879Abstract: An object is providing an electrostatic attraction apparatus and an attracting/releasing method capable of reliably attracting and quickly releasing a glass substrate. An attraction force for attracting a glass substrate is obtained according to the physical properties of the glass substrate. In addition to obtaining an attraction voltage (Vc(t)) required for obtaining the attraction force, a holding voltage (Vh(t)) for holding an attraction state and a release voltage (Vr(t)) for releasing the glass substrate are also obtained (S1 to S7) Attraction time period (tc) is actually measured and if this measured time is different from a preset attraction time (t1), the holding voltage (Vh(t)) and the release voltage (Vr(t)) are recalculated according to the actually measured attraction time period (tc) (S8 to S11).Type: ApplicationFiled: December 26, 2006Publication date: November 5, 2009Inventors: Mitsuo Kato, Shigenari Horie, Tatsufumi Aoi, Masaki Kawano, Yoshitaka Tsumoto, Hiroaki Ogasawara, Toshiro Kobayashi
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Publication number: 20090189092Abstract: A radiotherapy apparatus controller includes: a movement collection section; a sensor control section configured to change a first time interval in which a second sensor measures a position of an irradiation area in the subject, based on the movement information; and an irradiation control section. The movement collection section collects movement information indicating a movement of a subject from a first sensor. The sensor control section changes a first time interval in which a second sensor measures a position of an irradiation area in the subject, based on the movement information. The irradiation control section controls a radiotherapy apparatus such that therapeutic radiation irradiated to the irradiation area is changed based on the position.Type: ApplicationFiled: October 30, 2008Publication date: July 30, 2009Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Tatsufumi Aoi, Shuji Kaneko, Osamu Shibuya
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Publication number: 20080267352Abstract: A radiotherapy system includes: a waveguide, an adjustable waveguide, and a non-reciprocal circuit element. The waveguide transmits a high-frequency wave from a high-frequency power source to an acceleration tube. The adjustable waveguide is included in said waveguide and transforms a part of said waveguide. The non-reciprocal circuit element is provided between said acceleration tube and said adjustable waveguide in said waveguide. Said acceleration tube accelerates charged particles for generating therapeutic radiation by using said high-frequency wave.Type: ApplicationFiled: December 4, 2007Publication date: October 30, 2008Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.Inventors: Tatsufumi Aoi, Kuniyuki Kajinishi, Ichiro Yamashita, Shinji Nomura, Yoshio Sugimoto, Susumu Urano
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Publication number: 20080197303Abstract: An object is to provide a medical device which can rotate a radiation emitter or the like with high positional precision over an extended period of time. Provided are a support frame installed such that a central axis thereof is positioned substantially horizontally; circular tracks respectively disposed on both side faces of the support frame; a moving gantry configured to revolve relative to the support frame via sliding portions configured to slide on the circular tracks; and revolving driving means for revolving the moving gantry, wherein the moving gantry is constructed of a rigid-framed structure formed of a first side portion and a second side portion disposed so as to flank the support frame from both side faces thereof, and coupling portions for coupling the first side portion and the second side portion.Type: ApplicationFiled: July 19, 2007Publication date: August 21, 2008Inventors: Tatsufumi Aoi, Susumu Urano, Shuji Kaneko, Hiroyuki Shibata, Seinoshin Hamanaka
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Publication number: 20080191645Abstract: In an acceleration tube conditioning apparatus for performing a conditioning process on an acceleration tube when a high frequency power signal to be supplied to an acceleration tube is generated by a high frequency power supply, a power value collecting section collects a traveling wave power value and a reflection wave power value from a sensor which monitors the traveling wave power signal and the reflection wave power signal. A high frequency calculating section calculates a resonance frequency of the acceleration tube based on the traveling wave power value and the reflection wave power value. A high frequency adjusting section determines a high frequency value based on one of the traveling wave power value and the reflection wave power value as a selection power value, and a high frequency power supply control unit controls the high frequency power supply based on the high frequency value.Type: ApplicationFiled: September 28, 2007Publication date: August 14, 2008Applicant: Mitsubishi Heavy Industries, Ltd.Inventors: Tatsufumi Aoi, Kuniyuki Kajinishi, Ichiro Yamashita, Susumu Urano, Shinji Nomura
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Patent number: 7319295Abstract: A radio frequency power supply structure and a plasma CVD device comprising the same are provided in which reflection of radio frequency power at a connecting portion where an RF cable connects to an electrode is reduced so that incidence of the radio frequency power into the electrode increases. In the radio frequency power supply structure for use in a device generating plasma by charging a plate-like electrode with a radio frequency power, the radio frequency power supply structure supplying the electrode with the radio frequency power from an RF cable, the RF cable is positioned on an extended plane of a plane formed by the electrode to connect to the electrode at a connecting portion provided on an end peripheral portion of the electrode. The RF cable connects to the electrode substantially in the same plane as the plane formed by the electrode.Type: GrantFiled: March 13, 2003Date of Patent: January 15, 2008Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Hiroshi Mashima, Keisuke Kawamura, Akemi Takano, Yoshiaki Takeuchi, Tetsuro Shigemizu, Tatsufumi Aoi
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Publication number: 20050127844Abstract: A radio frequency power supply structure and a plasma CVD device comprising the same are provided in which reflection of radio frequency power at a connecting portion where an RF cable connects to an electrode is reduced so that incidence of the radio frequency power into the electrode increases. In the radio frequency power supply structure for use in a device generating plasma by charging a plate-like electrode with a radio frequency power, the radio frequency power supply structure supplying the electrode with the radio frequency power from an RF cable, the RF cable is positioned on an extended plane of a plane formed by the electrode to connect to the electrode at a connecting portion provided on an end peripheral portion of the electrode. The RF cable connects to the electrode substantially in the same plane as the plane formed by the electrode.Type: ApplicationFiled: March 13, 2003Publication date: June 16, 2005Applicant: MITSUBISHI HEAVY INDUSTRIES, LTDInventors: Hiroshi Mashima, Keisuke Kawamura, Akemi Takano, Yoshiaki Takeuchi, Tetsuro Shigemizu, Tatsufumi Aoi
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Patent number: 6498324Abstract: An induction heating device is disclosed for heating a rolling roller by induction heating so as to equalize the diameter of the rolling roller. The device includes an induction heater and a means for moving the induction heater to a portion of the roller surface to be heated, while the distance from the induction heater to the surface is maintained constant. An electric power supply means supplies electric power to the induction heater, and a means is provided for adjusting the quantity of heat to be produced by the induction heater according to the quantity of heat that is required by the portion of the roller to be heated. The heat quantity adjusting means includes a frequency control means for controlling the frequency of electric power supplied to the induction heater, wherein the frequency control means adjusts the frequency of electric power within a predetermined frequency range to a frequency which is suitable to produce the quantity of heat required by the portion of the rolling roller to be heated.Type: GrantFiled: October 15, 2001Date of Patent: December 24, 2002Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Mikio Yamamoto, Tatsufumi Aoi, Keiji Mizuta
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Patent number: 6456010Abstract: A discharge plasma generating method includes (a) opposing a discharge electrode having a substantially plane discharge portion to a substrate to be processed in a vacuum reaction vessel such that the discharge electrode and the substrate are substantially parallel to each other, (b) evacuating the vacuum reaction vessel and supplying a process gas to a space between the discharge electrode and the substrate, and (c) applying HF power to the discharge electrode such that an envelope representing the spatial distribution of a HF voltage &phgr; on the discharge electrode in a split second changes in accordance with a function including time as a parameter, thereby generating a discharge plasma of the process gas between the discharge electrode and the substrate, with substantially no standing wave of the HF voltage &phgr; generated on the discharge electrode.Type: GrantFiled: January 10, 2001Date of Patent: September 24, 2002Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Hideo Yamakoshi, Koji Satake, Yoshiaki Takeuchi, Hiroshi Mashima, Tatsufumi Aoi, Masayoshi Murata
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Publication number: 20020092846Abstract: An induction heating device for heating a rolling roller by induction heating so as to equalize the diameter of the rolling roller, comprises: an induction heater; an induction heater moving means for moving the induction heater to a heating portion while a distance from the induction heater to the surface of a portion to be heated is kept constant; an electric power supply means for supplying electric power to the induction heater; and a heat quantity adjusting means for adjusting the quantity of heat of the induction heater according to the quantity of heat required by the heating portion.Type: ApplicationFiled: October 15, 2001Publication date: July 18, 2002Inventors: Mikio Yamamoto, Tatsufumi Aoi, Keiji Mizuta
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Patent number: 6307146Abstract: An amorphous silicon solar cell includes a substrate, a transparent electrode formed on this substrate, a power-generating film formed on this transparent electrode, and a back-side electrode formed on this power-generating film. The power-generating film is formed by sequentially stacking p-type/i-type/n-type hydrogenated amorphous silicon layers. The defect density of the i-type hydrogenated amorphous silicon layer is less than 1015 defects/cc.Type: GrantFiled: September 23, 1999Date of Patent: October 23, 2001Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Yoshiaki Takeuchi, Masayoshi Murata, Akemi Takano, Tatsuyuki Nishimiya, Syouji Morita, Tatsufumi Aoi, Tatsuji Horioka
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Publication number: 20010021422Abstract: A discharge plasma generating method includes (a) opposing a discharge electrode having a substantially plane discharge portion to a substrate to be processed in a vacuum reaction vessel such that the discharge electrode and the substrate are substantially parallel to each other, (b) evacuating the vacuum reaction vessel and supplying a process gas to a space between the discharge electrode and the substrate, and (c) applying HF power to the discharge electrode such that an envelope representing the spatial distribution of a HF voltage &phgr; on the discharge electrode in a split second changes in accordance with a function including time as a parameter, thereby generating a discharge plasma of the process gas between the discharge electrode and the substrate, with substantially no standing wave of the HF voltage &phgr; generated on the discharge electrode.Type: ApplicationFiled: January 10, 2001Publication date: September 13, 2001Applicant: Mitsubishi Heavy Industries, Ltd.Inventors: Hideo Yamakoshi, Koji Satake, Yoshiaki Takeuchi, Hiroshi Mashima, Tatsufumi Aoi, Masayoshi Murata
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Patent number: 5848635Abstract: A continuous casting device includes a pair of cooling rolls (1, 2) that rotate in opposite directions to each other. A pair of side weirs (11) have inner surfaces (11a) that covers the end surfaces (1a, 2a) of the cooling rolls (1, 2) and circular surfaces (12b) that covers the peripheral surfaces (1b, 2b) of the cooling rolls (1, 2). At least one of the side weirs (11) is movable in an axial direction of the cooling rolls (1, 2). The continuous casting device also includes electromagnets for forming a magnetic flux in a direction parallel with a contact surface of the side weirs (11) with the molten metal (4) the contact surface extending along the peripheral surfaces (1b, 2b) of the cooling rolls (1, 2) at the portions opposite to the peripheral surfaces (1b, 2b) of the cooling rolls (1, 2) of the side weirs (11).Type: GrantFiled: July 25, 1996Date of Patent: December 15, 1998Assignee: Mitsubishi Jukogyo Kabushiki KaishaInventors: Tatsufumi Aoi, Noriyuki Kawada, Hiroshi Nakajima, Kenichi Unoki, Motomi Nakashima, Youichi Wakiyama
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Patent number: 5681527Abstract: In a molten metal holding apparatus in which an alternating magnetic flux is generated in the horizontal direction at a lower end portion of a molten metal and the molten metal 7 is held within an upper and lower opening container 6 by an electromagnetic force, solid conductors 8 which are not strong magnetic substances are attached to inner surfaces of both side plates 6x of a portion where the alternating magnetic flux passes through of the upper and lower opening container 6. Further, an apparatus including a circuit 3 to overlay a direct current on an exciting coil 2 or an exciting device 20 to let a direct current magnetic flux act is disclosed.Type: GrantFiled: January 11, 1996Date of Patent: October 28, 1997Assignee: Mitsubishi Jukogyo Kabushiki KaishaInventors: Tatsufumi Aoi, Noriyuki Kawada, Ritsuo Hashimoto, Kenichi Unoki, Motomi Nakashima, Kazumasa Mihara