Abstract: The present invention provides a means capable of further improving stability and washability under acidic conditions. The present invention is sulfonic acid-modified colloidal silica having an amount of sulfonic acid groups per 1 g of particles of 1.5 ?mol/g or more and 13.0 ?mol/g or less.

Abstract: In an axial gap motor, a rotor includes a plurality of rotor cores fixed in a circumferential direction of a rotor base, and a stator includes a plurality of stator cores fixed in a circumferential direction of a stator base, and coils wound around the stator cores. End faces of each of the rotor cores and end faces of the corresponding stator core are opposed to each other while being exposed to each other.

Abstract: In an axial gap motor, a rotor includes a plurality of rotor cores fixed in a circumferential direction of a rotor base, and a stator includes a plurality of stator cores fixed in a circumferential direction of a stator base, and coils wound around the stator cores. End faces of each of the rotor cores and end faces of the corresponding stator core are opposed to each other while being exposed to each other.

Abstract: A rotating electrical machine capable of obtaining a higher torque while minimizing the amount of permanent magnets used. A rotor core includes a plurality of first insertion holes each having an auxiliary magnet embedded therein, the auxiliary magnet being embedded so as to surround a rotation axis of a rotor in a cross-section orthogonal to the rotation axis. The rotor core includes a plurality of second insertion holes each having a main magnet embedded therein, the main magnet being embedded so as to extend from the auxiliary magnet toward an outer circumferential direction of the rotor. The rotor includes a plurality of magnetic poles formed around the rotation axis, the magnetic poles each having the auxiliary magnet and the plurality of main magnets. The auxiliary magnet is arranged disproportionately on one side of the first insertion hole in the circumferential direction of the rotor so as to form a clearance on the other side of the first insertion hole.

Abstract: A plurality of auxiliary magnets is embedded in a rotor core so as to surround the rotation axis of the rotating electrical machine in the cross-section orthogonal to the rotation axis. A plurality of main magnets is embedded in the rotor core so as to extend from the auxiliary magnet in the outer circumferential direction of the rotor. A plurality of magnetic poles of the rotor is formed around the rotation axis, the magnetic poles each having the auxiliary magnet and the plurality of main magnets arranged at a distance from each other in the circumferential direction of the rotor, and the plurality of main magnets of each magnetic pole is arranged asymmetrically about a virtual line passing the rotation axis and axisymmetrically dividing the auxiliary magnet of each magnetic pole.

Abstract: Provided is a rotating electrical machine capable of obtaining a higher torque while minimizing the amount of permanent magnets used. A rotor core includes a plurality of first insertion holes each having an auxiliary magnet embedded therein, the auxiliary magnet being embedded so as to surround a rotation axis of a rotor in a cross-section orthogonal to the rotation axis. The rotor core includes a plurality of second insertion holes each having a main magnet embedded therein, the main magnet being embedded so as to extend from the auxiliary magnet toward an outer circumferential direction of the rotor. The rotor includes a plurality of magnetic poles formed around the rotation axis, the magnetic poles each having the auxiliary magnet and the plurality of main magnets. The auxiliary magnet is arranged disproportionately on one side of the first insertion hole in the circumferential direction of the rotor so as to form a clearance on the other side of the first insertion hole.

Abstract: In an axial gap motor, a rotor includes a plurality of rotor cores fixed in a circumferential direction of a rotor base, and a stator includes a plurality of stator cores fixed in a circumferential direction of a stator base, and coils wound around the stator cores. End faces of each of the rotor cores and end faces of the corresponding stator core are opposed to each other while being exposed to each other.

Abstract: A plurality of auxiliary magnets is embedded in a rotor core so as to surround the rotation axis of the rotating electrical machine in the cross-section orthogonal to the rotation axis. A plurality of main magnets is embedded in the rotor core so as to extend from the auxiliary magnet in the outer circumferential direction of the rotor. A plurality of magnetic poles of the rotor is formed around the rotation axis, the magnetic poles each having the auxiliary magnet and the plurality of main magnets arranged at a distance from each other in the circumferential direction of the rotor, and the plurality of main magnets of each magnetic pole is arranged asymmetrically about a virtual line passing the rotation axis and axisymmetrically dividing the auxiliary magnet of each magnetic pole.

Abstract: The production method of a rare earth magnet of the present disclosure includes a coated magnetic powder preparation step, a mixed powder preparation step, and a pressure sintering step. In the coated magnetic preparation step, a zinc-containing coating 12 is formed on the particle surface of a samarium-iron-nitrogen-based magnetic powder to obtain a coated magnetic powder 14. In the mixed powder preparation step, a binder powder 20 having a melting point not higher than the melting point of the coating 12 and the coated magnetic powder 14 are mixed to obtain a mixed powder. In the pressure sintering step, denoting as T1° C. the temperature at which the peak disappears in an X-ray diffraction pattern of the binder powder 20 and as T2° C. the temperature at which the magnetic phase in the samarium-iron-nitrogen-based magnetic powder 10 decomposes, the mixed powder is pressure-sintered at T1° C. or more and (T2?50)° C. or less.

Abstract: To provide a rare earth magnet in which particles of SmFeN powder are bound using a Zn alloy powder, wherein generation of a knick at a magnetic field of around 0 is prevented, and a production method thereof. A rare earth magnet including a main phase containing Sm, Fe, and N, at least a part of the main phase having a Th2Zn17-type or Th2Ni17-type crystal structure, a sub-phase containing at least either Si or Sm, and Zn and Fe and being present around the main phase, and an intermediate phase containing Sm, Fe and N as well as Zn and being present between the main phase and the sub-phase, wherein the average Fe content in the sub-phase is 33 at % or less relative to the whole sub-phase, and the average total content of Si and Sm in the sub-phase is from 1.4 to 4.5 at % relative to the whole subs-phase.

Abstract: [Problem] Provided is a polishing composition which is suitable for polishing a polishing object having a metal wiring layer and capable of diminishing the step defect while maintaining a high polishing rate. [Solution] Provided is a polishing composition used in polishing a polishing object having a metal wiring layer, which contains a metal corrosion inhibitor, a complexing agent, a surfactant, and water and in which the solid surface energy of the polishing object surface after polishing the polishing object using the polishing composition is 30 mN/m or less, and the surfactant is preferably an anionic surfactant.

Abstract: A polishing composition contains a polishing accelerator, a water-soluble polymer including a constitutional unit originating from a polymerizable compound having a guanidine structure such as dicyandiamide, and an oxidant. The water-soluble polymer may be a water-soluble polymer including a constitutional unit originating from dicyandiamide and a constitutional unit originating from formaldehyde, a diamine or a polyamine.

Abstract: [Problem] Provided is a polishing composition which is suitable for polishing a polishing object having a metal wiring layer and capable of diminishing the step defect while maintaining a high polishing rate. [Solution] Provided is a polishing composition used in polishing a polishing object having a metal wiring layer, which contains a metal corrosion inhibitor, a complexing agent, a surfactant, and water and in which the solid surface energy of the polishing object surface after polishing the polishing object using the polishing composition is 30 mN/m or less, and the surfactant is preferably an anionic surfactant.

Abstract: A polishing composition contains a water-soluble polymer, a polishing accelerator, and an oxidizing agent. The water-soluble polymer is a polyamide-polyamine polymer having an amine value of 150 mg KOH/1 g·solid or greater.

Abstract: To provide a polishing composition which can satisfy both suppression of the surface topography and a high stock removal rate, in a polishing step in the production of a wiring structure. A polishing composition comprising abrasive grains, a processing accelerator, a nonionic surfactant represented by R-POE (I) (wherein R is a C10-16 alkyl group having a branched structure, and POE is a polyoxyethylene chain) and having an HLB of from 7 to 12, an anionic surfactant, a protective film-forming agent, an oxidizing agent, and water.

Abstract: Disclosed is a polishing composition containing a pH-lowering substance and a pH-buffering agent. The difference in absolute value between the pH of the polishing composition immediately after adding a 31% by weight hydrogen peroxide solution thereto at 5.16 g per 100 g of the polishing composition and the pH of the polishing composition after leaving to stand for eight days therefrom is 0.5 or less. Also disclosed is another polishing composition containing a pH-lowering substance and a pH-controlling agent. In comparison to the amount of a basic substance in the polishing composition immediately after adding a 31% by weight hydrogen peroxide solution thereto at 5.16 g per 100 ml of the polishing composition, the amount of a basic substance in the polishing composition after leaving to stand for eight days therefrom is increased by no less than 0.1 mM.

Abstract: A polishing composition contains a water-soluble polymer, a polishing accelerator, and an oxidizing agent. The water-soluble polymer is a polyamide-polyamine polymer having an amine value of 150 mg KOH/1 g·solid or greater.

Abstract: To provide a polishing composition which can satisfy both suppression of the surface topography and a high stock removal rate, in a polishing step in the production of a wiring structure. A polishing composition comprising abrasive grains, a processing accelerator, a dishing inhibitor and water. Here, the abrasive grains comprise at least first abrasive grains and second abrasive grains; the ratio of an average primary particle size DL1 of the second abrasive grains to an average primary particle size DS1 of the first abrasive grains, DL1/DS1, is 5>DL1/DS1>1; the degree of association of the first abrasive grains is from 1.8 to 5; and the degree of association of the second abrasive grains is at most 2.5.

Abstract: A polishing composition contains a polishing accelerator, a water-soluble polymer including a constitutional unit originating from a polymerizable compound having a guanidine structure such as dicyandiamide, and an oxidant. The water-soluble polymer may be a water-soluble polymer including a constitutional unit originating from dicyandiamide and a constitutional unit originating from formaldehyde, a diamine or a polyamine.

Abstract: To provide a polishing composition which can satisfy both suppression of the surface topography and a high stock removal rate, in a polishing step in the production of a wiring structure. A polishing composition comprising abrasive grains, a processing accelerator, a dishing inhibitor and water. Here, the abrasive grains comprise at least first abrasive grains and second abrasive grains; the ratio of an average primary particle size DL1 of the second abrasive grains to an average primary particle size DS1 of the first abrasive grains, DL1/DS1, is 5>DL1/DS1>1; the degree of association of the first abrasive grains is from 1.8 to 5; and the degree of association of the second abrasive grains is at most 2.5.