Patents by Inventor Tatsuo Harada
Tatsuo Harada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20070267663Abstract: An n-type first base layer is formed on a semiconductor substrate 1 having a first major surface and a second major surface, and a p-type second base layer is formed thereon. Between the first base layer and the second base layer, a carrier stored layer is formed. The carrier stored layer has a high-concentration impurity layer and a low concentration impurity layer, and the high-concentration impurity layer has a thickness of 1.5 ?m or more and an impurity concentration therethrough is made to be 1.0×1016 cm?3 or more throughout the layer.Type: ApplicationFiled: September 5, 2006Publication date: November 22, 2007Applicant: MITSUBISHI ELECTRIC CORPORATIONInventor: Tatsuo Harada
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Patent number: 6858043Abstract: A finish for synthetic filament to be processed in friction-texturing, which is applicable to various yarns and in a wide range of texturing speed, having been considered as difficult finish application field, such as low-speed friction texturing (with contact heaters), high-speed friction texturing (with non-contact heaters), coarse denier yarns and fine denier yarns, with satisfactory POY package buildup and POY release from packages, minimum fluffs and loops of POY, and with minimum fluffs of DTY and minimum fume and stain on heaters in texturing; and which contains 50 to 85 weight percent of Component A and 10 to 30 weight percent of Component B, having the following structures and a total ranging from 60 to 95 weight percent: Component A having a structure of R1[O(C2H4O)x.Type: GrantFiled: May 20, 2002Date of Patent: February 22, 2005Assignee: Matsumoto Yushi-Seiyaku Co., Ltd.Inventors: Yo Shingai, Ikuya Ujino, Hirohumi Ishida, Tatsuo Harada
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Patent number: 6765239Abstract: A semiconductor device includes an active region with a main semiconductor device section, and a junction-termination region therearound. A first diffusion layer of a second conductivity type is formed in a surface of a first semiconductor layer of a first conductivity type, and extends from the active region into the junction-termination region. A second diffusion layer of the second conductivity type is formed in contact with the first diffusion layer, and extends in the junction-termination region. A first contact electrode is disposed in the active region and in contact with the first diffusion layer, and electrically connected to a first main electrode of the main semiconductor device section. A second contact electrode is disposed in the junction-termination region and in contact with the first diffusion layer, and surrounds the active region. A connection electrode electrically connects the first and second contact electrodes to each other.Type: GrantFiled: July 2, 2002Date of Patent: July 20, 2004Assignee: Kabushiki Kaisha ToshibaInventors: Michiaki Hiyoshi, Shigeru Hasegawa, Naoyuki Inoue, Tatsuo Harada
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Publication number: 20030213068Abstract: A finish for synthetic filament to be processed in friction-texturing, which is applicable to various yarns and in a wide range of texturing speed, having been considered as difficult finish application field, such as low-speed friction texturing (with contact heaters), high-speed friction texturing (with non-contact heaters), coarse denier yarns and fine denier yarns, with satisfactory POY package buildup and POY release from packages, minimum fluffs and loops of POY, and with minimum fluffs of DTY and minimum fume and stain on heaters in texturing; and which contains 50 to 85 weight percent of Component A and 10 to 30 weight percent of Component B, having the following structures and a total ranging from 60 to 95 weight percent:Type: ApplicationFiled: May 20, 2002Publication date: November 20, 2003Applicant: Matsumoto Yushi-Seiyaku Co., Ltd.Inventors: Yo Shingai, Ikuya Ujino, Hirohumi Ishida, Tatsuo Harada
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Publication number: 20030006497Abstract: A semiconductor device includes an active region with a main semiconductor device section, and a junction-termination region therearound. A first diffusion layer of a second conductivity type is formed in a surface of a first semiconductor layer of a first conductivity type, and extends from the active region into the junction-termination region. A second diffusion layer of the second conductivity type is formed in contact with the first diffusion layer, and extends in the junction-termination region. A first contact electrode is disposed in the active region and in contact with the first diffusion layer, and electrically connected to a first main electrode of the main semiconductor device section. A second contact electrode is disposed in the junction-termination region and in contact with the first diffusion layer, and surrounds the active region. A connection electrode electrically connects the first and second contact electrodes to each other.Type: ApplicationFiled: July 2, 2002Publication date: January 9, 2003Inventors: Michiaki Hiyoshi, Shigeru Hasegawa, Naoyuki Inoue, Tatsuo Harada
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Patent number: 6435589Abstract: The vehicular seat support mechanism includes a vehicular seat having a seat cushion that forms a sitting portion, the seat cushion having a pivot axis, which is horizontal with respect to the width direction of a vehicle, provided toward the rear thereof, which enables the seat cushion to pivot in a fore-and-aft direction of a vehicle, and a link mechanism that moves the pivot axis of the seat cushion to rear and downward. This support mechanism reduces the height of the pivoting locus of the seat drawn when the seat is placed into storage, thus allowing the seat to be pivoted into storage without requiring a large space.Type: GrantFiled: February 26, 2001Date of Patent: August 20, 2002Assignee: Araco Kabushiki KaishaInventors: Hirotsugu Shimizu, Tatsuo Harada
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Publication number: 20010026075Abstract: The vehicular seat support mechanism includes a vehicular seat having a seat cushion that forms a sitting portion, the seat cushion having a pivot axis, which is horizontal with respect to the width direction of a vehicle, provided toward the rear thereof, which enables the seat cushion to pivot in a fore-and-aft direction of a vehicle, and a link mechanism that moves the pivot axis of the seat cushion to rear and downward. This support mechanism reduces the height of the pivoting locus of the seat drawn when the seat is placed into storage, thus allowing the seat to be pivoted into storage without requiring a large space.Type: ApplicationFiled: February 26, 2001Publication date: October 4, 2001Applicant: ARACO KABUSHIKI KAISHAInventors: Hirotsugu Shimizu, Tatsuo Harada
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Patent number: 5340637Abstract: A method of fabricating diffraction gratings wherein a photomask is arranged on a substrate which is coated with a photoresist, light is to be incident thereupon at an acute angle relative to the normal direction of the photomask, and a bright/dark pattern is formed on said photoresist by the interference of the transmission light that has passed through the photomask and the diffraction light. The invention further deals with a photomask used for the above method.Type: GrantFiled: June 5, 1992Date of Patent: August 23, 1994Assignee: Hitachi, Ltd.Inventors: Makoto Okai, Shinji Tsuji, Akio Ohishi, Motohisa Hirao, Hiroyoshi Matsumura, Tatsuo Harada, Toshiaki Kita, Hideki Taira
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Patent number: 5078495Abstract: A plane grating, particularly for a monochronomator, is provided with varied-spaced straight and parallel grooves in a light beam path to compensate for other light affecting components, for example a spherical mirror used for collimating or focusing the light beam. The angle of incidence with respect to the light for each of the grooves may vary and the angle of diffraction with respect to the light for each groove may be required to vary with the imperfection of collimation and focusing of the beam. The grooves are varied in their spacing to compensate for the variation of both incidence and diffraction direction.Type: GrantFiled: February 12, 1990Date of Patent: January 7, 1992Assignee: Hitachi, Ltd.Inventors: Tatsuo Harada, Toshiei Kurosaki, Tsuneo Terasawa, Toshiaki Kita
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Patent number: 5047650Abstract: The invention relates to a monochromator which disperses the light containing many wavelengths emitted from a source of light, and which takes out a given wavelength component only. The invention realizes a monochromator which can take out the light of a single wavelength maintaining a very high wavelength purity by using a plane grating C which can be easily manufactured maintaining a high precision and by employing a very simply constructed wavelength sweeping mechanism in which the distance between the incident slit A and the diffraction grating C as well as the distance between the exit slit B and the diffraction grating C are maintained constant, instead of using a concave grating that had been indispensable in the conventional monochromator adapted to the wavelength regions of from soft X-rays to vacuum ultraviolet rays.Type: GrantFiled: December 31, 1990Date of Patent: September 10, 1991Assignee: Hitachi, Ltd.Inventors: Tatsuo Harada, Masaaki Ito, Toshiaki Kita
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Patent number: 4983039Abstract: A spectrometer is disclosed, in which plural entrance slits are mounted, and a reference light passing through one entrance slit and the light to be measured passing through the other entrance slit are simultaneously focused on a photo-sensitive surface of a detector through a diffraction grating and a focusing optical system, to measure the wavelength of the light to be measured precisely by using the reference light as a standard.Type: GrantFiled: June 22, 1989Date of Patent: January 8, 1991Assignee: Hitachi, Ltd.Inventors: Tatsuo Harada, Toshiei Kurosaki, Toshiaki Kita, Tsuneo Terasawa
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Patent number: 4690506Abstract: In a method of producing diffraction gratings by feeding either one of a blank or a groove-ruling tool by an amount consisting of the amount of constant transference and the amount of variable transference that is added thereto, or subtracted therefrom, while reciprocally moving the other one of said blank or said groove-ruling tool, in order to rule grooves of irregular intervals on said blank, a method of producing varied line-space diffraction gratings wherein the region of ruling is divided into a plurality of small regions so that the difference between a maximum value and a minimum value of distance between grooves becomes smaller than a predetermined value, and the amount of constant transference is set to the nearly equal to an average distance between grooves in each of said small regions.Type: GrantFiled: October 3, 1985Date of Patent: September 1, 1987Assignee: Hitachi, Ltd.Inventors: Toshiaki Kita, Tatsuo Harada
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Patent number: 4568187Abstract: In a concave grating spectrometer for creating a spectral image by dispersing a light to be measured according to the wavelength, an arrangement comprising a concave grating with varied spacing and/or curved grooves formed on a concave spherical surface, and an entrance slit located at such a position on a vertical focal line passing through the center of curvature of the spherical surface, that the sum of the square of the difference between horizontal and vertical focal lengths at each wavelength in the wavelength range takes a minimum value. The light to be measured projected through the entrance slit is dispersed by the concave grating according to the wavelength and an image is focused on the vertical focal line passing through the center of curvature of the spherical grating.Type: GrantFiled: June 15, 1983Date of Patent: February 4, 1986Assignee: Hitachi, Ltd.Inventors: Toshiaki Kita, Tatsuo Harada
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Patent number: 4480910Abstract: There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).Type: GrantFiled: March 15, 1982Date of Patent: November 6, 1984Assignee: Hitachi, Ltd.Inventors: Akihiro Takanashi, Tatsuo Harada, Masamoto Akeyama, Yataro Kondo, Toshiei Kurosaki, Shinji Kuniyoshi, Sumio Hosaka, Yoshio Kawamura
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Patent number: 4455485Abstract: A laser beam scanning system for focusing a laser beam to a fine spot and for scanning precisely a large field includes an acousto-optical deflector enabled to deflect a laser beam in the direction of one axis or in the directions of two axes, while maintaining the fine spot diameter, to scan a small field, a relay lens for projecting said deflection point to the center of an objective lens, to effect the focusing of the beam to a fine spot, a high speed carriage enabled to move with high accuracy in biaxial directions, a precise position detector enabled to detect the position of the carriage, and a controller for organically controlling the aforementioned respective functions thereby to make it possible to precisely deflect the laser beam over a large field, whereby a scanning operation of a large field at a high speed and with a high accuracy is performed by the laser beam.Type: GrantFiled: November 25, 1981Date of Patent: June 19, 1984Assignee: Hitachi, Ltd.Inventors: Sumio Hosaka, Tatsuo Harada, Akihiro Takanashi
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Patent number: 4409860Abstract: In an apparatus for precisely moving a table, rectilinear drive systems for both X- and Y-axes are fixed to a support frame, a movable stage is constructed so as to have its motion in the direction of one of these axes constrained by the motion of the rectilinear drive system for the one axis and to have its motion in the direction of the other axis constrained by the rectilinear motion of the rectilinear drive system for the other axis, and means for coupling the rectilinear drive system for at least one of the axes and the movable stage so as to have a backlash.Type: GrantFiled: April 7, 1980Date of Patent: October 18, 1983Assignee: Hitachi, Ltd.Inventors: Shigeo Moriyama, Masaaki Ito, Tatsuo Harada
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Patent number: 4358198Abstract: An apparatus for moving a table or a stage having movable parts adapted to be guided by guide rail means slidingly and rectilinearly. At least the movable parts are made of a non-iron light metal material. The sliding surfaces of the movable parts making sliding contact with the guide rail means are made of a self-lubricating material, while the sliding surfaces of the guide rail means making sliding contact with the movable parts are made of a material having a higher hardness and wear resistance than the non-iron light metal material, so that the weight of at least the movable parts is reduced to decrease the weight of the apparatus as a whole.Type: GrantFiled: September 18, 1980Date of Patent: November 9, 1982Assignee: Hitachi, Ltd.Inventors: Shigeo Moriyama, Tatsuo Harada, Masaaki Ito
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Patent number: 4334915Abstract: A phenoxyphthalate of the formula ##STR1## wherein X represents chlorine atom or trifluoromethyl group and R and R' represent methyl or ethyl group, is novel and has a strong herbicidal activity.Type: GrantFiled: February 22, 1980Date of Patent: June 15, 1982Assignee: Nihon Nohyaku Co. Ltd.Inventors: Kunikazu Hiraga, Masakazu Shibayama, Katsumasa Ohkawa, Tatsuo Harada
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Patent number: 4318731Abstract: A novel .DELTA..sup.2 -1,2,4-triazolin-5-one derivative having a herbicidal activity, which is represented by the formula ##STR1## wherein, R.sup.1 is a C.sub.1 -C.sub.4 alkyl; R.sup.2 is a hydrogen atom, a C.sub.1 -C.sub.6 alkyl group, or a C.sub.2 -C.sub.4 alkenyl group; and X is a hydroxy group, a C.sub.1 -C.sub.4 alkyl group, a C.sub.1 -C.sub.6 alkyloxy group, an alkyloxyalkyloxy group of which two alkyls may be same as or different from each other and each alkyl is of C.sub.1 -C.sub.4, a C.sub.2 -C.sub.4 alkenyloxy, or an alkyloxycarbonylalkyloxy group of which two alkyls may be same as or different from each other and each alkyl is of C.sub.1 -C.sub.4.Type: GrantFiled: June 24, 1980Date of Patent: March 9, 1982Assignee: Nihon Nohyaku Co., Ltd.Inventors: Mitsuru Kajioka, Hitoshi Kurono, Katsumasa Okawa, Tatsuo Harada
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Patent number: 4312569Abstract: A concave grating having grooves formed in a concave blank surface in which the grooves are so formed as to have a non-uniform, spacing in accordance with the following relationship: ##EQU1## whereinb.sub.1, b.sub.2 and b.sub.3 represent constants;.sigma..sub.o represents groove spacings at the center of the gratings when the grooves are projected onto a plane which is in contact with a concave surface at the center of the gratings;.sigma. represents groove spacings at positions w at right angles with the lines from the center of the gratings to the grooves; andR represents a radius of curvature of the concave surface.Type: GrantFiled: April 11, 1980Date of Patent: January 26, 1982Assignee: Hitachi, Ltd.Inventors: Tatsuo Harada, Toshiaki Kita