Abstract: A substrate processing system includes a first chamber, a second chamber, a gas control part for controlling a gas flow in at least one of the chambers, a gate which can be set in an open state to connect the first chamber and the second chamber, and which can be set in a shutoff state to shut off the first chamber and the second chamber, a first selecting device which permits setting of the gate in the open state on the basis of a recipe, and a second selecting device which permits setting of the gate in the open state only when control with the gas control part satisfies a safety condition, wherein the gate is set in the open state only when setting of the gate in the open state is permitted both by the first selecting device and by the second selecting device.

Abstract: A substrate processing system includes a first chamber, a second chamber, a gas control part for controlling a gas flow in at least one of the chambers, a gate which can be set in an open state to connect the first chamber and the second chamber, and which can be set in a shutoff state to shut off the first chamber and the second chamber, a first selecting device which permits setting of the gate in the open state on the basis of a recipe, and a second selecting device which permits setting of the gate in the open state only when control with the gas control part satisfies a safety condition, wherein the gate is set in the open state only when setting of the gate in the open state is permitted both by the first selecting device and by the second selecting device

Abstract: An integrated transport device for a wafer carrier includes: an evacuatable chamber for accommodating therein a wafer carrier having a front opening with a cover; a rotatable platform for placing the wafer carrier thereon in the chamber; and an opening/closing device for opening and closing the cover of the wafer carrier placed on the platform at a first position, wherein the platform rotates to set the wafer carrier at the first position and a second position for transporting a wafer to a wafer-handling chamber.

Abstract: An integrated transport device for a wafer carrier includes: an evacuatable chamber for accommodating therein a wafer carrier having a front opening with a cover; a rotatable platform for placing the wafer carrier thereon in the chamber; and an opening/closing device for opening and closing the cover of the wafer carrier placed on the platform at a first position, wherein the platform rotates to set the wafer carrier at the first position and a second position for transporting a wafer to a wafer-handling chamber.