Patents by Inventor Tatsuo Nishibe

Tatsuo Nishibe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multivariable solver for optical proximity correction
    Patent number: 8938699
    Abstract: The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.
    Type: Grant
    Filed: May 17, 2013
    Date of Patent: January 20, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: William S. Wong, Been-Der Chen, Yen-Wen Lu, Jiangwei Li, Tatsuo Nishibe
  • MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION
    Publication number: 20130311959
    Abstract: The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.
    Type: Application
    Filed: May 17, 2013
    Publication date: November 21, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: William S. WONG, Been-Der CHEN, Yen-Wen LU, Jiangwei LI, Tatsuo NISHIBE
  • Multivariable solver for optical proximity correction
    Patent number: 8448099
    Abstract: The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.
    Type: Grant
    Filed: October 15, 2012
    Date of Patent: May 21, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: William S. Wong, Been-Der Chen, Yen-Wen Lu, Jiangwei Li, Tatsuo Nishibe
  • Multivariable solver for optical proximity correction
    Patent number: 8291352
    Abstract: The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: October 16, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: William S. Wong, Been-Der Chen, Yenwen Lu, Jiangwei Li, Tatsuo Nishibe
  • MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION
    Publication number: 20100161093
    Abstract: The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.
    Type: Application
    Filed: March 10, 2010
    Publication date: June 24, 2010
    Applicant: Brion Technology, Inc.
    Inventors: William S. Wong, Been-Der Chen, Yenwen Lu, Jiangwei Li, Tatsuo Nishibe
  • Multivariable solver for optical proximity correction
    Patent number: 7707538
    Abstract: The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: April 27, 2010
    Assignee: Brion Technologies, Inc.
    Inventors: William S. Wong, Been-Der Chen, Yenwen Lu, Jiangwei Li, Tatsuo Nishibe
  • MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION
    Publication number: 20080309897
    Abstract: The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.
    Type: Application
    Filed: June 15, 2007
    Publication date: December 18, 2008
    Applicant: BRION TECHNOLOGIES, INC.
    Inventors: William S. WONG, Been-Der CHEN, Yenwen LU, Jiangwei LI, Tatsuo NISHIBE