Patents by Inventor Tatsuya Ariga
Tatsuya Ariga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140369373Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: April 4, 2014Publication date: December 18, 2014Applicants: GIGAPHOTON INC., KOMATSU LTD.Inventors: Osamu WAKABAYASHI, Tatsuya ARIGA, Takahito KUMAZAKI, Kotaro SASANO
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Patent number: 8817839Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: GrantFiled: May 10, 2012Date of Patent: August 26, 2014Assignees: Komatsu Ltd., Gigaphoton Inc.Inventors: Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano
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Patent number: 8476609Abstract: An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.Type: GrantFiled: November 29, 2011Date of Patent: July 2, 2013Assignee: Gigaphoton Inc.Inventors: Akira Endo, Krzysztof Nowak, Hideo Hoshino, Tatsuya Ariga, Masato Moriya, Osamu Wakabayashi
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Publication number: 20120224600Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: May 10, 2012Publication date: September 6, 2012Applicants: GIGAPHOTON INC., KOMATSU LTD.Inventors: Osamu WAKABAYASHI, Tatsuya ARIGA, Takahito KUMAZAKI, Kotaro SASANO
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Publication number: 20120068091Abstract: An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.Type: ApplicationFiled: November 29, 2011Publication date: March 22, 2012Applicant: Gigaphoton Inc.Inventors: Akira ENDO, Krzysztof NOWAK, Hideo HOSHINO, Tatsuya ARIGA, Masato MORIYA, Osamu WAKABAYASHI
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Patent number: 8116347Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: GrantFiled: April 16, 2004Date of Patent: February 14, 2012Assignee: Komatsu Ltd.Inventors: Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano
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Patent number: 8093571Abstract: An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.Type: GrantFiled: September 25, 2009Date of Patent: January 10, 2012Assignee: Gigaphoton Inc.Inventors: Akira Endo, Krzysztof Nowak, Hideo Hoshino, Tatsuya Ariga, Masato Moriya, Osamu Wakabayashi
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Publication number: 20110216800Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: May 13, 2011Publication date: September 8, 2011Applicant: KOMATSU, LTD.Inventors: Osamu WAKABAYASHI, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano
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Publication number: 20110211601Abstract: A driver laser for an extreme ultra violet light source device capable of suppressing self-oscillation light, amplifying a laser beam efficiently, and reducing a device size. The driver laser has an oscillator for generating a laser beam to output the generated laser beam, and at least one amplifier for amplifying the laser beam output from the oscillator to output the amplified laser beam. The amplifier includes a discharge unit which amplifies the laser beam by using energy of a laser medium excited by discharge, a feedback mirror which leads the laser beam output from the discharge unit to the discharge unit, a polarizer which leads the laser beam output from the oscillator into the discharge unit and also reflects the laser beam output from the discharge unit to a predetermined direction, and a self-oscillation light filter which attenuates self-oscillation light output from the discharge unit.Type: ApplicationFiled: March 16, 2011Publication date: September 1, 2011Inventors: Tatsuya ARIGA, Hideo HOSHINO, Taisuke MIURA, Akira ENDO
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Patent number: 7957449Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: GrantFiled: December 3, 2006Date of Patent: June 7, 2011Assignee: Komatsu Ltd.Inventors: Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano
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Publication number: 20100078580Abstract: An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.Type: ApplicationFiled: September 25, 2009Publication date: April 1, 2010Applicant: Gigaphoton Inc.Inventors: Akira Endo, Krzysztof Nowak, Hideo Hoshino, Tatsuya Ariga, Masato Moriya, Osamu Wakabayashi
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Patent number: 7680158Abstract: A driver laser for EUV light source apparatus which driver laser simultaneously achieves short-pulsing and multi-line oscillation. The driver laser includes: a short-pulse multi-line oscillated CO2 laser oscillator having a device that shortens width of pulses included in a laser beam to be output and a device that suppresses amplitude of an oscillation spectrum exhibiting an energy peak value; and at least one amplifier that inputs the laser beam output from the short-pulse multi-line oscillated CO2 laser oscillator and amplifies the input laser beam to output the amplified laser beam.Type: GrantFiled: October 4, 2005Date of Patent: March 16, 2010Assignees: Komatsu Ltd., Gigaphoton Inc.Inventors: Akira Endo, Tatsuya Ariga, Takashi Suganuma, Taisuke Miura
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Patent number: 7649188Abstract: A driver laser for EUV light source apparatus which driver laser simultaneously achieves short-pulsing and multi-line oscillation. The driver laser includes: a short-pulse multi-line oscillated CO2 laser oscillator having a device that shortens width of pulses included in a laser beam to be output and a device that suppresses amplitude of an oscillation spectrum exhibiting an energy peak value; and at least one amplifier that inputs the laser beam output from the short-pulse multi-line oscillated CO2 laser oscillator and amplifies the input laser beam to output the amplified laser beam.Type: GrantFiled: April 9, 2007Date of Patent: January 19, 2010Assignees: Komatsu Ltd., Gigaphoton Inc.Inventors: Akira Endo, Tatsuya Ariga, Takashi Suganuma, Taisuke Miura
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Patent number: 7382816Abstract: A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.Type: GrantFiled: August 9, 2004Date of Patent: June 3, 2008Assignee: Gigaphoton Inc.Inventors: Tatsuya Ariga, Osamu Wakabayashi, Kouji Kakizaki
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Publication number: 20080069157Abstract: A driver laser for an extreme ultra violet light source device capable of suppressing self-oscillation light, amplifying a laser beam efficiently, and reducing a device size. The driver laser has an oscillator for generating a laser beam to output the generated laser beam, and at least one amplifier for amplifying the laser beam output from the oscillator to output the amplified laser beam. The amplifier includes a discharge unit which amplifies the laser beam by using energy of a laser medium excited by discharge, a feedback mirror which leads the laser beam output from the discharge unit to the discharge unit, a polarizer which leads the laser beam output from the oscillator into the discharge unit and also reflects the laser beam output from the discharge unit to a predetermined direction, and a self-oscillation light filter which attenuates self-oscillation light output from the discharge unit.Type: ApplicationFiled: August 27, 2007Publication date: March 20, 2008Inventors: Tatsuya Ariga, Hideo Hoshino, Taisuke Miura, Akira Endo
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Publication number: 20070297483Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: December 3, 2006Publication date: December 27, 2007Applicants: KOMATSU LTD., GIGAPHOTON INC.Inventors: Osamu WAKABAYASHI, Tatsuya ARIGA, Takahito KUMAZAKI, Kotaro SASANO
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Publication number: 20070187628Abstract: A driver laser for EUV light source apparatus which driver laser simultaneously achieves short-pulsing and multi-line oscillation. The driver laser includes: a short-pulse multi-line oscillated CO2 laser oscillator having a device that shortens width of pulses included in a laser beam to be output and a device that suppresses amplitude of an oscillation spectrum exhibiting an energy peak value; and at least one amplifier that inputs the laser beam output from the short-pulse multi-line oscillated CO2 laser oscillator and amplifies the input laser beam to output the amplified laser beam.Type: ApplicationFiled: April 9, 2007Publication date: August 16, 2007Inventors: Akira Endo, Tatsuya Ariga, Takashi Suganuma, Taisuke Miura
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Publication number: 20070091968Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: April 16, 2004Publication date: April 26, 2007Applicant: KOMATSU LTD.Inventors: Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano
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Publication number: 20060239309Abstract: A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 becomes a lower limit energy Es0 or more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor C0 disposed in an amplifying high-voltage pulse generator 32 of an amplifying laser 300 is controlled, and pulse energy Pamp of the amplifying laser 300 is determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.Type: ApplicationFiled: August 9, 2004Publication date: October 26, 2006Applicant: Gigaphoton Inc.Inventors: Tatsuya Ariga, Osamu Wakabayashi, Kouji Kakizaki
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Patent number: 7072375Abstract: In a line-narrowed gas laser system such as a line-narrowed molecular fluorine laser system, ASE is cut off to obtain a spectral linewidth of 0.2 pm or lower and a spectral purity of 0.5 pm or lower. The laser system comprises a laser chamber filled with an F2-containing laser gas, discharge electrodes located in the laser chamber, a laser resonator and a line-narrowing module located in the laser resonator with a wavelength selection element, so that a line-narrowed laser beam emerges from the laser resonator. To cut off ASE from the laser beam emerging from the laser resonator, the duration from laser emission by discharge to generation of a laser beam is preset. Rise of the sidelight is made so gentle that the starting point of a laser pulse can exist after the time of the first sidelight peak.Type: GrantFiled: February 20, 2003Date of Patent: July 4, 2006Assignees: Gigaphoton Inc., Ushio Denki Kabushiki KaisyaInventors: Tatsuya Ariga, Kyohei Seki, Osamu Wakabayashi