Abstract: A resin tube fitting has a body with a sleeve allowing the longitudinal end of the tube to be put therein, an inner ring with a press-in portion configured to be pressed in the longitudinal end of the tube, and a union nut with a connector configured to be screwed to an outer periphery of the body to allow the longitudinal end of the tube to be put radially between the connector and the press-in portion. The inner ring and the union nut are made of resin, which has a property of contracting in response to change in ambient temperature. The radial contraction rate of the connector is higher by 0.05% or more than that of the press-in portion of the inner ring.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).

Abstract: Methods selectively and efficiently produce 3,7-dimethyl-7-octenol and a carboxylic acid ester thereof. More specifically, a method produces 3,7-dimethyl-7-octenol, including steps of: subjecting a 3-methyl-3-butenyl nucleophilic reagent (2) and a 1,3-dihalo-2-methylpropane compound (3) to a coupling reaction to obtain a 2,6-dimethyl-6-heptenyl halide compound (4); converting the compound (4) into a 2,6-dimethyl-6-heptenyl nucleophilic reagent (5); and subjecting the nucleophilic reagent (5) to an addition reaction with at least one electrophilic reagent selected from the group made of formaldehyde, paraformaldehyde and 1,3,5-trioxane, followed by a hydrolysis reaction to obtain 3,7-dimethyl-7-octenol (6); and the other method.

Abstract: A composition containing a substance having sex pheromone activity on San Jose scale (SJS) after finding the substance. More specifically, there are provided a composition having sex pheromone activity on SJS, the composition containing 3,7-dimethyl-7-octenyl propionate as a substance having sex pheromone activity on SJS; an attractant for SJS, the attractant containing the composition and a support for supporting the composition in such a manner as to allow the substance to be released; a mating disruptant for SJS, the disruptant containing the composition and a container for storing the composition in such a manner as to allow the substance to be released; and a method for attracting SJS or disrupting mating of SJS, the method including a step of installing the attractant or the mating disruptant for SJS in a field to release the substance from the attractant or the mating disruptant into the field.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.

Abstract: A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid, including a base material including a copolymer having a structural unit represented by general formula (a9-1) or a structural unit represented by general formula (a9-2), 30 mol % or more of a structural unit represented by general formula (a10-1) and 45 mol % or more of a structural unit having an acid-decomposable group which increases a polarity under the action of an acid. In each formula, Rs is a hydrogen atom or the like; Ya91 and YaX1 are a single bond or a divalent linking group; R91 is a hydrocarbon group having 1 to 20 carbon atoms or the like; R92 is an oxygen atom or the like; j and nax1 are integers of 1 to 3; Wax1 is a (nax1+1)-valent aromatic hydrocarbon group.

Abstract: A sheet processing device, a sheet manufacturing apparatus, and a sheet processing method enable effectively removing the color material of printed parts. A sheet processing device for processing a printed sheets has a detector configured to detect the printed parts of the sheet; and a refining prevention agent applicator configured to selectively apply a refining prevention agent that prevents refinement of the sheet to a printed area including the printed parts detected by the detector.

Abstract: A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va1 is a divalent hydrocarbon group. na1 represents an integer of 0 to 2. Ra?12 and Ra?13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra?14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), Rb1 represents a cyclic hydrocarbon group. Yb1 represents a divalent linking group containing an ester bond. Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and Mm+ is an m-valent organic cation.

Abstract: To provide cover glass for mobile terminals exhibiting high strength in a thin plate thickness state to enable reductions in thickness of apparatuses when inserted in the apparatuses, cover glass (1) for a mobile terminal of the invention is cover glass (1) that is obtained by forming a resist pattern on main surfaces of a plate-shaped glass substrate, then etching the glass substrate with an etchant using the resist pattern as a mask, and thereby cutting the glass substrate into a desired shape and that protects a display screen of the mobile terminal, where an edge face of the cover glass (1) is formed of a molten glass surface, and as surface roughness of the edge face, arithmetic mean roughness Ra is 10 nm or less.

Abstract: Provided are a 1-halo-6,9-pentadecadiene useful as an intermediate having a skipped diene skeleton and a method for producing (7Z,10Z)-7,10-hexadecadienal. More specifically, provided are a method for producing (7Z,10Z)-7,10-hexadecadienal including steps of subjecting a Grignard reagent formed from a (6Z,9Z)-1-halo-6,9-pentadecadiene to a nucleophilic substitution reaction with an orthoformate ester to obtain a (7Z,10Z)-1,1-dialkoxy-7,10-hexadecadiene; and hydrolyzing the (7Z,10Z)-1,1-dialkoxy-7,10-hexadecadiene in the absence of an oxidation reaction to obtain the (7Z,10Z)-7,10-hexadecadienal; and the like.

Abstract: Provided are a 1-halo-6,9-pentadecadiene useful as an intermediate having a skipped diene skeleton and a method for producing (7Z,10Z)-7,10-hexadecadienal. More specifically, provided are a method for producing (7Z,10Z)-7,10-hexadecadienal including steps of subjecting a Grignard reagent formed from a (6Z,9Z)-1-halo-6,9-pentadecadiene to a nucleophilic substitution reaction with an orthoformate ester to obtain a (7Z,10Z)-1,1-dialkoxy-7,10-hexadecadiene; and hydrolyzing the (7Z,10Z)-1,1-dialkoxy-7,10-hexadecadiene in the absence of an oxidation reaction to obtain the (7Z,10Z)-7,10-hexadecadienal; and the like.

Abstract: Provided is a modified xylanase. The polypeptide has xylanase activity and has an amino acid sequence with deletion of at least 12 consecutive amino acid residues at the C-terminus of the amino acid sequence of SEQ ID NO: 1 or an amino acid sequence having at least 90% identity with the amino acid sequence of SEQ ID NO: 1.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator (B) which generates acid upon exposure, the base component (A) including a resin component having a structural unit (a0) represented by general formula (a0-1) shown below, and the acid generator component (B) containing a compound having a cation moiety having an electron withdrawing group (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Ya represents a carbon atom; Xa represents an atomic group required to form an alicyclic hydrocarbon group with Ya; and Ra01 represents an aromatic hydrocarbon group optionally having a substituent).

Abstract: The disclosure provides a polypeptide with a mutation having cellobiohydrolase activity and improved thermal stability.

Abstract: This substrate processing method includes: a substrate rotating step of rotating a substrate around a predetermined vertical axis line at a first rotation speed; a liquid-tight step performed along with the substrate rotating step, and where a first opposed surface is opposed at a first distance to a rotated lower surface of the substrate, and at the same time, a processing liquid is discharged from a processing liquid dispense port of a lower surface nozzle opposed to the lower surface of the substrate to cause a space between the lower surface and the first opposed surface to be in a liquid-tight state by the processing liquid; and a liquid-tight state releasing step of releasing the liquid-tight state in the space between the lower surface and the first opposed surface by separating the lower surface and the first opposed surface after the liquid-tight step.

Abstract: Provided is a modified xylanase. The polypeptide has xylanase activity and has an amino acid sequence with deletion of at least 12 consecutive amino acid residues at the C-terminus of the amino acid sequence of SEQ ID NO: 1 or an amino acid sequence having at least 90% identity with the amino acid sequence of SEQ ID NO: 1.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and a fluorine additive component (F) which exhibits decomposability to an alkali developing solution, the fluorine additive component (F) including a fluorine resin component (F1) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a group represented by general formula (f2-r-1) shown below in which each Rf21 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a hydroxy group, a hydroxyalkyl group or a cyano group; n? represents an integer of 0 to 2; and * represents a valence bond.

Abstract: A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid, including a base material including a copolymer having a structural unit represented by general formula (a9-1) or a structural unit represented by general formula (a9-2), 30 mol % or more of a structural unit represented by general formula (a10-1) and 45 mol % or more of a structural unit having an acid-decomposable group which increases a polarity under the action of an acid. In each formula, Rs is a hydrogen atom or the like; Ya91 and YaX1 are a single bond or a divalent linking group; R91 is a hydrocarbon group having 1 to 20 carbon atoms or the like; R92 is an oxygen atom or the like; j and nax1 are integers of 1 to 3; Wax1 is a (nax1+1)-valent aromatic hydrocarbon group.

Abstract: A resist composition includes a base material component and a fluorine additive component. The fluorine additive component contains a fluororesin component having a structural unit containing a base dissociable group. The base material component contains a structural unit containing an acid-decomposable group in an amount of 30 mol % or more and an amount of 10 mol % or more of a resin component having a structural unit represented by formula (a10-1): where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Yax1 is a single bond or a divalent linking group, Wax1 is a (nax1+1) valent aromatic hydrocarbon group, and nax1 is an integer of 1 to 3.

Abstract: An ink composition includes a first component which is a hydrophilic solvent, a second component which is a hydrophobic solvent, a third component which is an amphiphilic solvent, and a fourth component which includes a solute or a dispersing element, and when the third component evaporates, the ink composition is separated into a phase which mainly includes the first component and a phase which mainly includes the second component.