Patents by Inventor Tatsuya Kitamoto

Tatsuya Kitamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pollutant removal method and apparatus, and exposure method and apparatus
    Patent number: 8920569
    Abstract: A method for quickly removing pollutants adhered to a predetermined optical member in an optical system. To remove the pollutants adhered to a lens (32A) disposed at the upper end of a projection optical system (PL), a cylindrical protecting member (53) is disposed through the openings in a reticle stage (22) and a reticle base (23). The bottom surface of a support section (56) at the tip section of a rod section (58) is brought into contact with the surface of the lens (32A) through the inner surface of the protecting member (53). A wiping cloth soaked with a washing solution containing hydrofluoric acid is attached to the bottom surface of the support section (56). The support section (56) is reciprocated via the rod section (58) to remove the pollutants on the lens (32A) with the wiping cloth.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: December 30, 2014
    Assignee: Nikon Corporation
    Inventors: Shunji Watanabe, Masato Hamatani, Tatsuya Kitamoto
  • Pollutant removal method and apparatus, and exposure method and apparatus
    Publication number: 20050274898
    Abstract: A method for quickly removing pollutants adhered to a predetermined optical member in an optical system. To remove the pollutants adhered to a lens (32A) disposed at the upper end of a projection optical system (PL), a cylindrical protecting member (53) is disposed through the openings in a reticle stage (22) and a reticle base (23). The bottom surface of a support section (56) at the tip section of a rod section (58) is brought into contact with the surface of the lens (32A) through the inner surface of the protecting member (53). A wiping cloth soaked with a washing solution containing hydrofluoric acid is attached to the bottom surface of the support section (56). The support section (56) is reciprocated via the rod section (58) to remove the pollutants on the lens (32A) with the wiping cloth.
    Type: Application
    Filed: June 1, 2005
    Publication date: December 15, 2005
    Applicant: NIKON CORPORATION
    Inventors: Shunji Watanabe, Masato Hamatani, Tatsuya Kitamoto