Patents by Inventor Tatsuya Ohtsuka

Tatsuya Ohtsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230250046
    Abstract: A method for producing a compound represented by formula (P1): (B1f)mp(A1)np, wherein B1f is RfCOO, Rf is a hydrocarbon having one or more fluorine atoms, A1 is a group excluding H, mp is (valence of A1)×np and is 1 or 2, np is mp/(valence of A1) and is 1, A1 has a valence of 1 or 2, the method comprising step A of reacting a compound represented by formula (S1): (B1f)(R1), wherein B1f is as defined above, and R1 is an organic group, and a compound represented by formula (S2): (A1)ms2(B2)ns2, wherein A1 is as defined above, B2 is OH, CO3, or HCO3, ms2 is (valence of B2)×ns2/(valence of A1) and is 1 or 2, and ns2 is (valence of A1)×ms2/(valence of B2) and 1 or 2, or a hydrate thereof. Such a method is a novel production method of a fluorinated carboxylic acid salt compound (preferably a fluorinated carboxylic acid salt compound having a low water content).
    Type: Application
    Filed: March 8, 2023
    Publication date: August 10, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Atsushi SHIRAI, Shigeaki YAMAZAKI, Yoshichika KUROKI, Tatsuya OHTSUKA
  • Patent number: 11718524
    Abstract: An object of this invention is to provide a simple method for producing sulfur tetrafluoride. The object is achieved by a method for producing sulfur tetrafluoride, comprising step A of reacting a fluorinated halogen compound with sulfur chloride, the fluorinated halogen compound being represented by formula: XFn, wherein X is chlorine, bromine, or iodine; and n is a natural number of 1 to 5.
    Type: Grant
    Filed: January 6, 2022
    Date of Patent: August 8, 2023
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Ohtsuka, Yoshichika Kuroki, Atsushi Shirai, Moe Hosokawa, Yosuke Kishikawa
  • Patent number: 11611106
    Abstract: The invention provides an electrolyte solution capable of providing an electrochemical device having low resistance and excellent high-temperature storage characteristics and cycle characteristics. The electrolyte solution contains lithium fluorosulfonate and a solvent containing a compound (1) represented by the following formula (1): CF2HCOOCH3.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: March 21, 2023
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yoshiko Kuwajima, Kenzou Takahashi, Shigeaki Yamazaki, Hiroyuki Arima, Tomoya Hidaka, Masakazu Kinoshita, Hisako Nakamura, Takaya Yamada, Toshiharu Shimooka, Yuuki Suzuki, Tatsuya Ohtsuka
  • Patent number: 11420877
    Abstract: A method for producing lithium fluorosulfonate which includes reacting XSO3H, wherein X is a leaving group other than fluorine, with a lithium source and a fluorine source. Also disclosed is a composition containing XSO3H.
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: August 23, 2022
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuuki Suzuki, Akiyoshi Yamauchi, Kotaro Hayashi, Yoshihiro Yamamoto, Yosuke Kishikawa, Tatsuya Ohtsuka, Atsushi Maruo, Hiroyuki Arima
  • Patent number: 11377407
    Abstract: The problem to be solved by the present invention is to provide a novel method for producing a difluoromethylene compound, in particular, a simple method for producing a difluoromethylene compound. This problem is solved by a method for producing a difluoromethylene compound (I) containing at least one —CF2— moiety, the method comprising step A of allowing IF5 and a disulfide compound (III) of the formula: RA—S—S—RA (wherein RA, in each occurrence, independently represents aryl optionally having at least one substituent or alkyl optionally having at least one substituent) to act on a carbonyl compound (II) containing at least one —C(O)— moiety.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: July 5, 2022
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Ohtsuka, Yoshichika Kuroki, Atsushi Shirai, Moe Hosokawa, Yosuke Kishikawa
  • Patent number: 11339052
    Abstract: An object of this invention is to provide a simple method for producing sulfur tetrafluoride. The object is achieved by a method for producing sulfur tetrafluoride, comprising step A of reacting a fluorinated halogen compound with sulfur chloride, the fluorinated halogen compound being represented by formula: XFn, wherein X is chlorine, bromine, or iodine; and n is a natural number of 1 to 5.
    Type: Grant
    Filed: November 13, 2017
    Date of Patent: May 24, 2022
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Ohtsuka, Yoshichika Kuroki, Atsushi Shirai, Moe Hosokawa, Yosuke Kishikawa
  • Publication number: 20220127144
    Abstract: An object of this invention is to provide a simple method for producing sulfur tetrafluoride. The object is achieved by a method for producing sulfur tetrafluoride, comprising step A of reacting a fluorinated halogen compound with sulfur chloride, the fluorinated halogen compound being represented by formula: XFn, wherein X is chlorine, bromine, or iodine; and n is a natural number of 1 to 5.
    Type: Application
    Filed: January 6, 2022
    Publication date: April 28, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya OHTSUKA, Yoshichika KUROKI, Atsushi SHIRAI, Moe HOSOKAWA, Yosuke KISHIKAWA
  • Publication number: 20210363077
    Abstract: The problem to be solved by the present invention is to provide a novel method for producing a difluoromethylene compound, in particular, a simple method for producing a difluoromethylene compound. This problem is solved by a method for producing a difluoromethylene compound (I) containing at least one —CF2— moiety, the method comprising step A of allowing IF5 and a disulfide compound (III) of the formula: RA—S—S—RA (wherein RA, in each occurrence, independently represents aryl optionally having at least one substituent or alkyl optionally having at least one substituent) to act on a carbonyl compound (II) containing at least one —C(O)— moiety.
    Type: Application
    Filed: April 25, 2019
    Publication date: November 25, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya OHTSUKA, Yoshichika KUROKI, Atsushi SHIRAI, Moe HOSOKAWA, Yosuke KISHIKAWA
  • Patent number: 10851031
    Abstract: The problem to be solved by the present invention is to provide a novel method for producing a difluoromethylene compound. This problem is solved by a method for producing a difluoromethylene compound containing a —CF2— moiety, the method comprising step A of mixing: a) a carbonyl compound containing a —C(O)— moiety; b) optionally an amine; c) a fluoride represented by the formula: MF, wherein M represents a Group 1 element of the periodic table; d) a halogenated fluorine compound represented by the formula: XFn, wherein X represents chlorine, bromine, or iodine, and n is a natural number of 1 to 5; and e) sulfur chloride.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: December 1, 2020
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Ohtsuka, Yoshichika Kuroki, Atsushi Shirai, Moe Hosokawa, Yosuke Kishikawa
  • Publication number: 20200262709
    Abstract: A method for producing lithium fluorosulfonate which includes reacting XSO3H, wherein X is a leaving group other than fluorine, with a lithium source and a fluorine source. Also disclosed is a composition containing XSO3H.
    Type: Application
    Filed: September 18, 2018
    Publication date: August 20, 2020
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuuki SUZUKI, Akiyoshi YAMAUCHI, Kotaro HAYASHI, Yoshihiro YAMAMOTO, Yosuke KISHIKAWA, Tatsuya OHTSUKA, Atsushi MARUO, Hiroyuki ARIMA
  • Publication number: 20200243911
    Abstract: The invention provides an electrolyte solution capable of providing an electrochemical device having low resistance and excellent high-temperature storage characteristics and cycle characteristics. The electrolyte solution contains lithium fluorosulfonate and a solvent containing a compound (1) represented by the following formula (1):CF2HCOOCH3.
    Type: Application
    Filed: July 31, 2018
    Publication date: July 30, 2020
    Applicant: DAIKIN INDUSTRIES, LTD
    Inventors: Yoshiko KUWAJIMA, Kenzou TAKAHASHI, Shigeaki YAMAZAKI, Hiroyuki ARIMA, Tomoya HIDAKA, Masakazu KINOSHITA, Hisako NAKAMURA, Takaya YAMADA, Toshiharu SHIMOOKA, Yuuki SUZUKI, Tatsuya OHTSUKA
  • Publication number: 20200087230
    Abstract: The problem to be solved by the present invention is to provide a novel method for producing a difluoromethylene compound. This problem is solved by a method for producing a difluoromethylene compound containing a —CF2— moiety, the method comprising step A of mixing: a) a carbonyl compound containing a —C(O)— moiety; b) optionally an amine; c) a fluoride represented by the formula: MF, wherein M represents a Group 1 element of the periodic table; d) a halogenated fluorine compound represented by the formula: XFn, wherein X represents chlorine, bromine, or iodine, and n is a natural number of 1 to 5; and e) sulfur chloride.
    Type: Application
    Filed: December 22, 2017
    Publication date: March 19, 2020
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya OHTSUKA, Yoshichika KUROKI, Atsushi SHIRAI, Moe HOSOKAWA, Yosuke KISHIKAWA
  • Publication number: 20190375636
    Abstract: An object of this invention is to provide a simple method for producing sulfur tetrafluoride. The object is achieved by a method for producing sulfur tetrafluoride, comprising step A of reacting a fluorinated halogen compound with sulfur chloride, the fluorinated halogen compound being represented by formula: XFn, wherein X is chlorine, bromine, or iodine; and n is a natural number of 1 to 5.
    Type: Application
    Filed: November 13, 2017
    Publication date: December 12, 2019
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya OHTSUKA, Yoshichika KUROKI, Atsushi SHIRAI, Moe HOSOKAWA, Yosuke KISHIKAWA
  • Patent number: 10011553
    Abstract: Provided is a method for producing fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride ((CF3)2CHCOF), which are useful as dry etching gases etc., safely and inexpensively with high purity. According to the method in which 1,1,3,3,3-pentafluoro-2-trifluoromethylpropyl methyl ether is pyrolyzed in a gas phase in the presence of a catalyst, the desired fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride can be obtained with high selectivity and high conversion of the starting material by a simple process in which a pyrolysis reaction is performed in a gas phase using the inexpensive starting material.
    Type: Grant
    Filed: November 12, 2013
    Date of Patent: July 3, 2018
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo Nakamura, Yuusuke Etou, Tatsuya Ohtsuka, Kanako Fukumoto, Masato Naitou
  • Patent number: 9950984
    Abstract: An object of the present invention is to provide a process for producing ?-fluoroacrylic acid esters at a high starting material conversion and a high yield. The present invention provides, as a means to achieve the object, a process for producing a compound represented by formula (1): wherein R1 and R2 are the same or different and each represent alkyl, fluoroalkyl, aryl optionally substituted with at least one substituent, halogen, or hydrogen; and R3 represents alkyl, fluoroalkyl, or aryl optionally substituted with at least one substituent, the process comprising step A of reacting a compound represented by formula (2): wherein the symbols are as defined above, with carbon monoxide and an alcohol represented by formula (3): R3—OH??(3) wherein the symbol is as defined above, in the presence of a transition metal complex catalyst containing at least one bidentate phosphine ligand and a base to thereby obtain the compound represented by formula (1).
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: April 24, 2018
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Akihiro Gotou, Manaho Miyazaki, Sumi Ishihara, Takashi Namikawa, Tatsuya Ohtsuka, Yosuke Kishikawa
  • Patent number: 9919990
    Abstract: An object of the present invention is to provide a method for producing methane fluoride that is useful, for example, as a dry etching gas, the method being more suitable for industrial production. To achieve this object, the present invention provides a method including reacting (A) dimethyl sulfate and (B) at least one fluorocompound in a liquid phase, the fluorocompound (B) being at least one compound selected from the group consisting of hydrogen fluoride and hydrofluoric acid salts, or a metal fluoride, wherein when the fluoride compound (B) includes hydrogen fluoride or a hydrofluoric acid salt, the reaction is carried out without a solvent or using a polar solvent as a solvent, and when the fluoride compound (B) is a metal fluoride, the reaction is carried out using water as a solvent.
    Type: Grant
    Filed: August 7, 2014
    Date of Patent: March 20, 2018
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo Nakamura, Kanako Fukumoto, Yuusuke Etou, Tatsuya Ohtsuka, Masahiro Higashi
  • Publication number: 20170267626
    Abstract: An object of the present invention is to provide a process for producing ?-fluoroacrylic acid esters at a high starting material conversion and a high yield. The present invention provides, as a means to achieve the object, a process for producing a compound represented by formula (1): wherein R2 and R2 are the same or different and each represent alkyl, fluoroalkyl, aryl optionally substituted with at least one substituent, halogen, or hydrogen; and R3 represents alkyl, fluoroalkyl, or aryl optionally substituted with at least one substituent, the process comprising step A of reacting a compound represented by formula (2): wherein the symbols are as defined above, with carbon monoxide and an alcohol represented by formula (3): R3—OH??(3) wherein the symbol is as defined above, in the presence of a transition metal complex catalyst containing at least one bidentate phosphine ligand and a base to thereby obtain the compound represented by formula (1).
    Type: Application
    Filed: June 6, 2017
    Publication date: September 21, 2017
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Akihiro GOTOU, Manaho MIYAZAKI, Sumi ISHIHARA, Takashi NAMIKAWA, Tatsuya OHTSUKA, Yosuke KISHIKAWA
  • Patent number: 9738589
    Abstract: The object of the present invention is to provide a process for producing ?-fluoroacrylic acid ester at a high starting material conversion, high selectivity, and high yield. The present invention provides a process for producing the compound represented by the formula (1) wherein R represents alkyl optionally substituted with one or more fluorine atoms, the process comprising step A of reacting a compound represented by the formula (2) wherein X represents a bromine atom or a chlorine atom with an alcohol represented by the formula (3) wherein the symbol is as defined above, and carbon monoxide in the presence of a transition metal catalyst and a base to thereby obtain the compound represented by the formula (1).
    Type: Grant
    Filed: June 15, 2016
    Date of Patent: August 22, 2017
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Ohtsuka, Akihiro Gotou, Sumi Ishihara, Yoshihiro Yamamoto, Akinori Yamamoto, Yoshichika Kuroki, Yuzo Komatsu, Yousuke Kishikawa
  • Patent number: 9732027
    Abstract: An object of the present invention is to provide a process for producing ?-fluoroacrylic acid esters at a high starting material conversion and a high yield. The present invention provides, as a means to achieve the object, a process for producing a compound represented by formula (1): wherein R1 and R2 are the same or different and each represent alkyl, fluoroalkyl, aryl optionally substituted with at least one substituent, halogen, or hydrogen; and R3 represents alkyl, fluoroalkyl, or aryl optionally substituted with at least one substituent, the process comprising step A of reacting a compound represented by formula (2): wherein the symbols are as defined above, with carbon monoxide and an alcohol represented by formula (3): R3—OH??(3) wherein the symbol is as defined above, in the presence of a transition metal complex catalyst containing at least one bidentate phosphine ligand and a base to thereby obtain the compound represented by formula (1).
    Type: Grant
    Filed: December 26, 2014
    Date of Patent: August 15, 2017
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Akihiro Gotou, Manaho Miyazaki, Sumi Ishihara, Takashi Namikawa, Tatsuya Ohtsuka, Yosuke Kishikawa
  • Patent number: 9701614
    Abstract: An object of the present invention is to provide a process for producing ?-fluoroacrylic acid esters at a high starting material conversion and a high yield. The present invention provides, as a means to achieve the object, a process for producing a compound represented by formula (1): wherein R1 and R2 are the same or different and each represent alkyl, fluoroalkyl, aryl optionally substituted with at least one substituent, halogen, or hydrogen; and R3 represents alkyl, fluoroalkyl, or aryl optionally substituted with at least one substituent, the process comprising step A of reacting a compound represented by formula (2): wherein the symbols are as defined above, with carbon monoxide and an alcohol represented by formula (3): R3—OH??(3) wherein the symbol is as defined above, in the presence of a transition metal complex catalyst containing at least one bidentate phosphine ligand and a base to thereby obtain the compound represented by formula (1).
    Type: Grant
    Filed: December 26, 2014
    Date of Patent: July 11, 2017
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Akihiro Gotou, Manaho Miyazaki, Sumi Ishihara, Takashi Namikawa, Tatsuya Ohtsuka, Yosuke Kishikawa