Patents by Inventor Tatsuya Tochihara

Tatsuya Tochihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220064377
    Abstract: Provided are a novel polyamide resin having a high melting point, and a composition and a molded article, for which the novel polyamide resin is used. A polyamide resin including a constituent unit derived from a diamine and a constituent unit derived from a dicarboxylic acid, where 70 mol % or more of the constituent unit derived from the diamine is derived from a xylylenediamine; and 70 mol % or more of the constituent unit derived from the dicarboxylic acid is derived from a phenylenediacetic acid; and where X+(Y/3) is 68 or more, when X mol % is defined as a proportion of a constituent unit derived from 1,4-phenylenediacetic acid in the constituent unit derived from the dicarboxylic acid, and Y mol % is defined as a proportion of a constituent unit derived from p-xylylenediamine in the constituent unit derived from the diamine.
    Type: Application
    Filed: November 26, 2019
    Publication date: March 3, 2022
    Inventors: Tatsuya TOCHIHARA, Nobuhiko MATSUMOTO
  • Patent number: 10786928
    Abstract: The polyamide pellet of the present invention includes a polyamide including diamine units and dicarboxylic acid units, 50% by mole or more of the diamine units being derived from m-xylylenediamine, wherein a spherulite density of a skin portion of the pellet is 40,000 to 250,000/mm2.
    Type: Grant
    Filed: July 23, 2015
    Date of Patent: September 29, 2020
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya Tochihara, Katsumi Shinohara, Kaname Sato, Tomonori Kato, Jun Mitadera
  • Patent number: 10696789
    Abstract: Provided is a method for producing a polyamide resin including reacting a dicarboxylic acid component containing sebacic acid in an amount of 50 mol % or more and a diamine component containing xylylenediamine in an amount of 70 mol % or more, wherein the total content of the specific compounds in the sebacic acid is 100 ppm by mass or less.
    Type: Grant
    Filed: September 8, 2015
    Date of Patent: June 30, 2020
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya Tochihara, Katsumi Shinohara, Jun Mitadera
  • Patent number: 10227451
    Abstract: A method for producing a polyamide, comprising performing melt polycondensation of a diamine component comprising xylylenediamine in an amount of 70 mol % or more and a dicarboxylic acid component comprising a linear aliphatic dicarboxylic acid having 6 to 18 carbon atoms in an amount of 70 mol % or more in the presence of a phosphorus atom-containing compound (A), wherein the decomposition temperature of the phosphorus atom-containing compound (A) is not lower than the melting point of the polyamide, and an aqueous solution of the phosphorus atom-containing compound (A) and the diamine component are added to the dicarboxylic acid component being in a molten state to perform the melt polycondensation.
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: March 12, 2019
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya Tochihara, Katsumi Shinohara, Kuniaki Muneyasu
  • Patent number: 9951182
    Abstract: Provided are [1] a xylylenediamine composition containing xylylenediamine and a 5-membered or 6-membered heterocyclic compound (A) having at least one nitrogen-containing substituent and having two nitrogen atoms as atoms constituting a ring, wherein the content of the heterocyclic compound (A) is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a 5-membered or 6-membered heterocyclic compound (A) having at least one nitrogen-containing substituent and having two nitrogen atoms as atoms constituting a ring, a diamine including xylylenediamine (but excluding a diamine corresponding to the above-mentioned heterocyclic compound (A)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the heterocyclic compound (A) to be introduced is 0.001 to 0.02 parts by mass based on 100 parts by mass of xylylenediamine.
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: April 24, 2018
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takashi Nakamura, Hajime Yamada, Tatsuya Tochihara, Katsumi Shinohara, Jun Mitadera, Takashi Yamamoto
  • Publication number: 20170306091
    Abstract: Provided is a method for producing a polyamide resin including reacting a dicarboxylic acid component containing sebacic acid in an amount of 50 mol % or more and a diamine component containing xylylenediamine in an amount of 70 mol % or more, wherein the total content of the specific compounds in the sebacic acid is 100 ppm by mass or less.
    Type: Application
    Filed: September 8, 2015
    Publication date: October 26, 2017
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya TOCHIHARA, Katsumi SHINOHARA, Jun MITADERA
  • Patent number: 9783638
    Abstract: Provided are [1] a xylylenediamine composition containing xylylenediamine and 1,2-ditolylethane wherein the content of 1,2-ditolylethane is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and 1,2-ditolylethane into a reaction system and performing polycondensation reaction, wherein the amount of the 1,2-ditolylethane to be introduced is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine.
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: October 10, 2017
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya Tochihara, Katsumi Shinohara, Takashi Nakamura, Hajime Yamada, Jun Mitadera, Takashi Yamamoto
  • Patent number: 9777115
    Abstract: Provided are [1] a xylylenediamine composition containing xylylenediamine and a pyridine compound (A) having at least one substituent including an amino group, wherein the content of the pyridine compound (A) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a pyridine compound (A) having at least one substituent including an amino group, a diamine including xylylenediamine (but excluding a diamine corresponding to the above-mentioned pyridine compound (A)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the pyridine compound (A) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of xylylenediamine.
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: October 3, 2017
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takashi Nakamura, Hajime Yamada, Tatsuya Tochihara, Katsumi Shinohara, Jun Mitadera, Takashi Yamamoto
  • Publication number: 20170210031
    Abstract: The polyamide pellet of the present invention includes a polyamide including diamine units and dicarboxylic acid units, 50% by mole or more of the diamine units being derived from m-xylylenediamine, wherein a spherulite density of a skin portion of the pellet is 40,000 to 250,000/mm2.
    Type: Application
    Filed: July 23, 2015
    Publication date: July 27, 2017
    Inventors: Tatsuya TOCHIHARA, Katsumi SHINOHARA, Kaname SATO, Tomonori KATO, Jun MITADERA
  • Patent number: 9637594
    Abstract: Provided are [1] a xylylenediamine composition containing xylylenediamine and a compound represented by the following general formula (1), wherein the content of the compound represented by the general formula (1) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a compound represented by the following general formula (1), a diamine including xylylenediamine (but excluding the compound represented by the general formula (1)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the compound represented by the general formula (1) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine, where, in the general formula (1), n and m each independently represent an integer of 0 to 6, excluding the case where n and m are both 1.
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: May 2, 2017
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya Tochihara, Katsumi Shinohara, Takashi Nakamura, Hajime Yamada, Jun Mitadera, Takashi Yamamoto
  • Publication number: 20170073469
    Abstract: A method for producing a polyamide, comprising performing melt polycondensation of a diamine component comprising xylylenediamine in an amount of 70 mol % or more and a dicarboxylic acid component comprising a linear aliphatic dicarboxylic acid having 6 to 18 carbon atoms in an amount of 70 mol % or more in the presence of a phosphorus atom-containing compound (A), wherein the decomposition temperature of the phosphorus atom-containing compound (A) is not lower than the melting point of the polyamide, and an aqueous solution of the phosphorus atom-containing compound (A) and the diamine component are added to the dicarboxylic acid component being in a molten state to perform the melt polycondensation.
    Type: Application
    Filed: May 8, 2015
    Publication date: March 16, 2017
    Inventors: Tatsuya TOCHIHARA, Katsumi SHINOHARA, Kuniaki MUNEYASU
  • Patent number: 9562144
    Abstract: Provided are a xylylenediamine composition containing xylylenediamine and bis(methylbenzyl)amine, a content of the bis(methylbenzyl)amine being 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and bis(methylbenzyl)amine in an amount of 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine into a reaction system and performing a polycondensation reaction.
    Type: Grant
    Filed: April 9, 2014
    Date of Patent: February 7, 2017
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya Tochihara, Katsumi Shinohara, Takashi Nakamura, Hajime Yamada, Jun Mitadera
  • Publication number: 20160304670
    Abstract: Provided are [1] a xylylenediamine composition containing xylylenediamine and a pyridine compound (A) having at least one substituent including an amino group, wherein the content of the pyridine compound (A) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a pyridine compound (A) having at least one substituent including an amino group, a diamine including xylylenediamine (but excluding a diamine corresponding to the above-mentioned pyridine compound (A)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the pyridine compound (A) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of xylylenediamine.
    Type: Application
    Filed: October 29, 2014
    Publication date: October 20, 2016
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takashi Nakamura, Hajime Yamada, Tatsuya Tochihara, Katsumi Shinohara, Jun Mitadera, Takashi Yamamoto
  • Publication number: 20160304672
    Abstract: Provided are [1] a xylylenediamine composition containing xylylenediamine and a 5-membered or 6-membered heterocyclic compound (A) having at least one nitrogen-containing substituent and having two nitrogen atoms as atoms constituting a ring, wherein the content of the heterocyclic compound (A) is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a 5-membered or 6-membered heterocyclic compound (A) having at least one nitrogen-containing substituent and having two nitrogen atoms as atoms constituting a ring, a diamine including xylylenediamine (but excluding a diamine corresponding to the above-mentioned heterocyclic compound (A)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the heterocyclic compound (A) to be introduced is 0.001 to 0.02 parts by mass based on 100 parts by mass of xylylenediamine.
    Type: Application
    Filed: October 29, 2014
    Publication date: October 20, 2016
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takashi NAKAMURA, Hajime YAMADA, Tatsuya TOCHIHARA, Katsumi SHINOHARA, Jun MITADERA, Takashi Yamamoto
  • Publication number: 20160304671
    Abstract: Provided are [1] a xylylenediamine composition containing xylylenediamine and a compound represented by the following general formula (1), wherein the content of the compound represented by the general formula (1) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a compound represented by the following general formula (1), a diamine including xylylenediamine (but excluding the compound represented by the general formula (1)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the compound represented by the general formula (1) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine, where, in the general formula (1), n and m each independently represent an integer of 0 to 6, excluding the case where n and m are both 1.
    Type: Application
    Filed: October 29, 2014
    Publication date: October 20, 2016
    Inventors: Tatsuya Tochihara, Katsumi Shinohara, Takashi Nakamura, Hajime Yamada, Jun Mitadera, Takashi Yamamoto
  • Publication number: 20160257784
    Abstract: Provided are [1] a xylylenediamine composition containing xylylenediamine and 1,2-ditolylethane wherein the content of 1,2-ditolylethane is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and 1,2-ditolylethane into a reaction system and performing polycondensation reaction, wherein the amount of the 1,2-ditolylethane to be introduced is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine.
    Type: Application
    Filed: October 29, 2014
    Publication date: September 8, 2016
    Inventors: Tatsuya TOCHIHARA, Katsumi SHINOHARA, Takashi NAKAMURA, Hajime YAMADA, Jun MITADERA, Takashi YAMAMOTO
  • Patent number: 9359477
    Abstract: The present invention is directed to a process for producing a polyamide, which process includes directly melt-polymerizing a diamine component including 70 mol % or more of p-xylylenediamine and a dicarboxylic acid component including 70 mol % or more of a C6 to C18 aliphatic dicarboxylic acid, in the absence of solvent in a batch-type reactor equipped with a stirring blade, the process including: (1) reacting the diamine component with the dicarboxylic acid component under a pressure condition of 0.2 to 0.5 MPa (Abs); (2) maintaining a vapor phase section of a reaction tank of the reactor at 200° C. or higher during reaction; (3) stirring the contents of the reaction tank, from the start of adding the diamine component until after completion of the addition and before the start of pressure falling, such that the stirring-related Froude number represented by a specific formula is adjusted to 0.0002 to 0.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: June 7, 2016
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya Tochihara, Katsumi Shinohara
  • Publication number: 20160039993
    Abstract: Provided are a xylylenediamine composition containing xylylenediamine and bis(methylbenzyl)amine, a content of the bis(methylbenzyl)amine being 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and bis(methylbenzyl)amine in an amount of 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine into a reaction system and performing a polycondensation reaction.
    Type: Application
    Filed: April 9, 2014
    Publication date: February 11, 2016
    Inventors: Tatsuya Tochihara, Katsumi Shinohara, Takashi Nakamura, Hajime Yamada, Jun Mitadera
  • Publication number: 20150291736
    Abstract: The invention is a method for producing a polyamide having a melting point of 255° C. or higher through polycondensation of a mixed xylylenediamine containing paraxylylenediamine as a diamine component and a dicarboxylic acid component in a batch reactor, wherein when the diamine component is dropwise added to the dicarboxylic acid component kept in a melt state by heating it to a temperature not lower than a melting point thereof under a pressure of 0.1 MPaG or more with keeping the melt state of a reaction mixture, a temperature of the reaction mixture is maintained at 255° C. or lower until a molar ratio (diamine component/dicarboxylic acid component) of the reaction mixture reaches 0.8, and the temperature of the reaction mixture at the end of the dropwise addition is controlled to be not lower than the melting point of the polyamide. The method enables production of a polyamide having an improved hue and being advantageous with respect to quality.
    Type: Application
    Filed: October 22, 2013
    Publication date: October 15, 2015
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kuniaki Muneyasu, Yuya Kimura, Katsumi Shinohara, Tatsuya Tochihara, Hideyuki Kurose
  • Publication number: 20150073120
    Abstract: The present invention is directed to a process for producing a polyamide, which process includes directly melt-polymerizing a diamine component including 70 mol % or more of p-xylylenediamine and a dicarboxylic acid component including 70 mol % or more of a C6 to C18 aliphatic dicarboxylic acid, in the absence of solvent in a batch-type reactor equipped with a stirring blade, the process including: (1) reacting the diamine component with the dicarboxylic acid component under a pressure condition of 0.2 to 0.5 MPa (Abs); (2) maintaining a vapor phase section of a reaction tank of the reactor at 200° C. or higher during reaction; (3) stirring the contents of the reaction tank, from the start of adding the diamine component until after completion of the addition and before the start of pressure falling, such that the stirring-related Froude number represented by a specific formula is adjusted to 0.0002 to 0.
    Type: Application
    Filed: February 25, 2013
    Publication date: March 12, 2015
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya Tochihara, Katsumi Shinohara