Abstract: Cu-based interconnections are fabricated in a semiconductor device by depositing a thin film of Cu or Cu alloy on a dielectric film by sputtering, the dielectric film having trenches and/or via holes at least one groove and being arranged on or above a substrate, and carrying out high temperature and high pressure treatment to thereby embed the Cu or Cu alloy into the trenches and/or via holes, in which the sputtering is carried out at a substrate temperature of ?20° C. to 0° C. using, as a sputtering gas, a gaseous mixture containing hydrogen gas and an inert gas in a ratio in percentage of 5:95 to 20:80.

Abstract: This invention provides a filamentous material for rubber reinforcement having excellent corrosion resistance, comprising: a steel filament and a coating layer containing Cu and Zn on a surface of the steel filament, wherein: a sum total in a length of a peripheral direction of the steel filament in a peripheral direction area in which the coating layer has a thickness of not less than 0.1 micrometers is not less than 50% in a full length in the peripheral direction of the steel filament when a cross section perpendicular to a longitudinal direction of the filamentous material is observed, and in the above peripheral direction area, (1) an average Cu content is 50% to 95% by mass in a depth direction area extending from an outermost surface of the coating layer to a position having a depth of 0.01 micrometers, and (2) an average Zn content is not less than 60% by mass in a depth direction area extending from a position having a depth of 0.

Abstract: Cu-based interconnections are fabricated in a semiconductor device by depositing a thin film of Cu or Cu alloy on a dielectric film by sputtering, the dielectric film having trenches and/or via holes at least one groove and being arranged on or above a substrate, and carrying out high temperature and high pressure treatment to thereby embed the Cu or Cu alloy into the trenches and/or via holes, in which the sputtering is carried out at a substrate temperature of ?20° C. to 0° C. using, as a sputtering gas, a gaseous mixture containing hydrogen gas and an inert gas in a ratio in percentage of 5:95 to 20:80.

Abstract: A rubber-bonded brass composite material prepared by bonding rubber to the surface of a brass-plated material obtained by plating the surface of a substrate with brass or to the surface of a brass material by vulcanization, wherein preheating is carried out before vulcanization to form needle-like Cu—S-based reaction products at the bonding interface between brass and rubber. Thereby, there is provided a rubber-bonded brass composite material having excellent long-term adhesion while excellent initial adhesion at the time of bonding by vulcanization is retained.

Abstract: The present invention provides a member coated with a hard coating and to attain excellent wear resistance. The hard coating includes: an adhesion reinforcing layer formed on a surface of the member; and a second layer formed on the adhesion reinforcing layer and having a composition represented by the following formula: (AlpTiqVr)(NuCv) where 0≦p≦0.75, 0.20≦q≦0.75, 0.10≦r≦0.75, p+q+r=1, 0.6≦u≦1, and u+v=1. In order to further enhance the adhesion of the hard coating to the member, an intermediate layer may be formed between the first and second layers.

Abstract: A metal material having a photocatalytic activity which comprises an anodized layer and a thin layer containing titanium oxide powder which are heat treated are sequentially laminated on the surface of a substrate comprising metal material including titanium. By anodically oxidizing the metal material including titanium, an anodized layer is formed on the surface thereof. A thin layer containing titanium oxide powder is further coated on this surface, and heat treatment is carried out before and/or after forming this thin layer containing titanium oxide powder.

Abstract: A machine part comprises: a base part formed of a titanium alloy or an aluminum alloy and having a roughened surface of Ra 0.5 .mu.m or above and PPI.sub.50 or above; and a Ni--P electrodeposit layer formed over the surface of the base part by an electroplating process using a Ni--P plating bath containing a stress relaxing agent, and having a stress of 20 kgf/mm.sup.2 or below. The machine part has a small specific gravity, excellent seizure resistance, wear resistance and fatigue strength.

Abstract: A corrosion resistant Ti based alloy comprising:Cr: 0.005-2.0 wt %, and further comprising one or more of elements selected from:Ni: 0.005-2.0 wt %, Pd: 0.005-2.0 wt %, Ru: 0.005-2.0 wt %, Pt: 0.005-2.0 wt %, Os: 0.005-2.0 wt %, Ir: 0.005-2.0 wt %, Rh: 0.005-2.0 wt %, andthe balance of Ti and inevitable impurities.Cr may be replaced with one or more of 0.005-1.5 wt % of Cu and 0.005-1.5 wt % of Si, or 0.005-2.0 wt % of Al. The corrosion resistant Ti based alloy has excellent corrosion resistance also in a non-oxidative atmosphere and also has an excellent crevice corrosion resistance.

Abstract: A corrosion resistant Ti based alloy comprising:Cr: 0.005-2.0 wt %, and furthercomprising one or more of elements selected from:______________________________________ Ni: 0.005-2.0 wt %, Pd: 0.005-2.0 wt %, Ru: 0.005-2.0 wt %, Pt: 0.005-2.0 wt %, Os: 0.005-2.0 wt %, Ir: 0.005-2.0 wt %, Rh: 0.005-2.0 wt %, and ______________________________________the balance of Ti and inevitable impurities.Cr may be replaced with one or more of 0.005-1.5 wt % of Cu and 0.005-1.5 wt % of Si, or 0.005-2.0 wt % of Al. The corrosion resistant Ti based alloy has excellent corrosion resistance also in a non-oxidative atmosphere and also has an excellent crevice corrosion resistance.