Abstract: A process flow device includes a self-averaging pitot tube type of primary flow element for measuring, by a differential pressure process, the volumetric rate of fluid flow at a point in a fluid carrying conduit where the velocity profile of the fluid is asymmetric with respect to the longitudinal axis of the conduit. The improved flow element comprises an annulus having a central opening and a pitot tube type flow-impeding device disposed transversely across the central opening and perpendicular to the longitudinal axis of the conduit. The pitot tube type flow-impeding device includes a plurality of total pressure ports in an upstream facing surface, a plurality of static pressure ports in a downstream facing surface, and total and static pressure plenums connected in fluid communication respectively to the total and static pressure ports.

Abstract: A process fluid measurement system provides a first measurement relative to process fluid flowing in a pipe. An additional measurement of process fluid flow velocity in the pipe is combined with the first measurement to provide a simplified indication of mass fluid flow and/or density or other fluid parameter. In some embodiments, the first measurement is a differential pressure measurement. Additionally, one embodiment provides a vortex flowmeter having configurable terminations for coupling to a variety of pressure or differential pressure sensors or transmitters for advanced process fluid measurements or calculations.

Abstract: A pressure sensor of a process device, is characterized by applying a plurality of pressures to the process sensor. Outputs of the plurality of pressures are received. A compensation relationship is determined based upon the pressure sensor output. The characterization data is collected in a distribution which is non-uniform across the pressure range.