Abstract: To provide a liquid crystal device having a uniform vertical alignment, a method for fabricating it easily, and its fabricating apparatus in fabricating an ECB-type vertically aligned liquid crystal device, a liquid crystal device includes liquid crystal molecules 12 each having a negative dielectric anisotropy and polyimide films for homogeneous alignment, wherein a method for fabricating a liquid crystal device including a process of vertically orienting liquid crystal molecules is constructed by exposing the liquid crystal molecules to light from either or both sides of substrates 14 of the liquid crystal device whose liquid crystal molecules each having a negative dielectric anisotropy are homogeneously oriented using polyimide films for homogeneous alignment. In addition, an aligner used for exposure is equipped with a filer so as to cut light having wavelengths of 400 nm or less and 600 nm or more, so that light having a wavelength of 400 to 600 nm can be utilized.

Abstract: A TFT array substrate 10 of the present invention includes an insulating substrate 12, thin-film transistors formed on the insulating substrate 12 in a matrix, and wirings 46 electrically connected to the thin-film-transistors. A gate-insulating film 32 is formed on the wiring 46, a passivation film 38 is formed on the gate-insulating film 32, and moreover an interlayer insulating film 42 containing an organic polymer with an edge formed thereon is formed on the gate-insulating film 32. An etching stopper 50 is formed on at least either of the gate-insulating film 32 exposed from the edge 48 of the interlayer insulating film 42 or the passivation film 38.

Abstract: To provide a liquid crystal device having a uniform vertical alignment, a method for fabricating it easily, and its fabricating apparatus in fabricating an ECB-type vertically aligned liquid crystal device, a liquid crystal device includes liquid crystal molecules 12 each having a negative dielectric anisotropy and polyimide films for homogeneous alignment, wherein a method for fabricating a liquid crystal device including a process of vertically orienting liquid crystal molecules is constructed by exposing the liquid crystal molecules to light from either or both sides of substrates 14 of the liquid crystal device whose liquid crystal molecules each having a negative dielectric anisotropy are homogeneously oriented using polyimide films for homogeneous alignment. In addition, an aligner used for exposure is equipped with a filer so as to cut light having wavelengths of 400 nm or less and 600 nm or more, so that light having a wavelength of 400 to 600 nm can be utilized.

Abstract: An ECB-type vertically aligned liquid crystal device includes liquid crystal molecules each having a negative dielectric anisotropy and polyimide films for homogeneous alignment. In a process for manufacturing the liquid crystal device, the liquid crystal molecules are vertically oriented by exposing the liquid crystal molecules to light from either or both sides of substrates of the liquid crystal device. In addition, an aligner used for exposure is equipped with a filter so as to cut light having wavelengths of 400 nm or less and 600 nm or more, so that light having a wavelength of 400 to 600 nm can be utilized In this liquid crystal device, the response time becomes faster when a voltage is applied between electrodes.

Abstract: A TFT array substrate 10 of the present invention includes an insulating substrate 12, thin-film transistors formed on the insulating substrate 12 in a matrix, and wirings 46 electrically connected to the thin-film-transistors. A gate-insulating film 32 is formed on the wiring 46, a passivation film 38 is formed on the gate-insulating film 32, and moreover an interlayer insulating film 42 containing an organic polymer with an edge formed thereon is formed on the gate-insulating film 32. An etching stopper 50 is formed on at least either of the gate-insulating film 32 exposed from the edge 48 of the interlayer insulating film 42 or the passivation film 38.

Abstract: To provide a liquid crystal device having a uniform vertical alignment, a method for fabricating it easily, and its fabricating apparatus in fabricating an ECB-type vertically aligned liquid crystal device, a liquid crystal device includes liquid crystal molecules 12 each having a negative dielectric anisotropy and polyimide films for homogeneous alignment, wherein a method for fabricating a liquid crystal device including a process of vertically orienting liquid crystal molecules is constructed by exposing the liquid crystal molecules to light from either or both sides of substrates 14 of the liquid crystal device whose liquid crystal molecules each having a negative dielectric anisotropy are homogeneously oriented using polyimide films for homogeneous alignment. In addition, an aligner used for exposure is equipped with a filer so as to cut light having wavelengths of 400 nm or less and 600 nm or more, so that light having a wavelength of 400 to 600 nm can be utilized.

Abstract: A spatial light modulator designed to use a minimum area on the surface of a silicon substrate. This invention comprises a silicon substrate on a back plate with a glass cover that is used to seal liquid crystal between the glass cover and the silicon substrate. Most importantly, the glue seal formed to contain the liquid crystal material is between the cover glass plate and the Si substrate on only one side and the back plate on the remaining three sides. This structure allows a smaller semiconductor substrate to be used.

Abstract: An apparatus and method for spin coating a substrate with a liquid material which prevents the material from contacting the edge or backside of the substrate or forming an edge bead at the periphery of the substrate is disclosed. A spin chuck is equipped with a conformable elastomer which seals the edge of the substrate and forms a continuous surface with a planar surface of the substrate for the liquid material to flow off the substrate unimpeded during the spin coating process. As the elastomer is resilient, small variations in substrate size and shape are automatically compensated. None of the substrate area is lost to masking and/or removal processes as in the prior art, allowing the entire substrate area to be available for further processing.