Abstract: Supply system include a first vessel containing the precursor, a second vessel, a first gas conduit fluidically connecting the first vessel to the second vessel, wherein a pressure reduction device and a flow control device are fluidically mounted therein, a second gas conduit fluidically connecting the second vessel to a point of use, and a pressure gauge downstream the pressure reduction device for measuring a partial pressure of the precursor in the second vessel, wherein the partial pressure of the precursor in the second vessel is at a pressure lower than the saturated vapor pressure of the precursor at the temperature of the second vessel and higher than an inlet pressure requirement of the flow control device at the point of use. Methods for using the supply system are also disclosed.

Abstract: A cabinet for a solid material container comprises a main body having a top wall, a side wall, and a bottom wall; an entry/exit portion which is attached to a portion of the main body, for putting in and taking out the solid material container; an exhaust duct attached to a portion of the main body; a heating portion for heating the solid material container; a temperature measuring portion for measuring a temperature of the solid material container, or of the heating portion; and a cooling blower for blowing cooling air toward the solid material container.

Abstract: A cabinet for a solid material container comprises a main body having a top wall, a side wall, and a bottom wall; an entry/exit portion which is attached to a portion of the main body, for putting in and taking out the solid material container; an exhaust duct attached to a portion of the main body; a heating portion for heating the solid material container; a temperature measuring portion for measuring a temperature of the solid material container, or of the heating portion; and a cooling blower for blowing cooling air toward the solid material container.

Abstract: A neon recovering/purifying system including: a recovery vessel that is arranged on an exhaust gas route and stores exhaust gas, the exhaust gas route being branched and extending from a discharge line; a compressor that increases a pressure of the exhaust gas sent out from the recovery vessel, to a third pressure; an exhaust gas flow rate regulating unit that regulates a flow rate of the exhaust gas whose pressure has been increased by the compressor; a first impurity removing unit that removes a first impurity from the exhaust gas; a second impurity removing unit that removes a second impurity from the exhaust gas from which the first impurity has been removed; a pressure increasing vessel that stores purified gas that has been processed by the first impurity removing unit and the second impurity removing unit; a pressure reducing valve that reduces a pressure of the purified gas sent out from the pressure increasing vessel, to the first pressure; and a purified gas flow rate regulating unit that regulates

Abstract: Provided is a sublimated gas supply system capable of stabilizing the concentration of a sublimated gas of a solid material to be supplied and continuously supplying a sublimated gas with a stable concentration. The sublimated gas supply system includes a container; a heater for heating the container; a vacuum container configured so that a sublimated gas is introduced from the container in a vacuum state when a pressure measured with a container pressure gauge is the saturated vapor pressure of the sublimated gas; a flow amount control unit for controlling the flow amount of the dilution gas so that the concentration of the sublimated gas in the dilution gas inside the vacuum container is controlled to be a prescribed concentration based on the pressure inside the vacuum container when the sublimated gas is introduced into the vacuum container.

Abstract: It is an object to provide a removal function of removing impurities from exhaust gas including rare gas (for example, argon, xenon, krypton and the like) that is used in an excimer laser oscillation device, in a system of the excimer laser oscillation device. The excimer laser oscillation device including a gas recycle function includes an oscillation chamber in which laser gas having halogen gas, rare gas and buffer gas is filled inside, a first impurity removing device that removes impurities in exhaust gas that is discharged from the oscillation chamber, inside the system of the excimer laser oscillation device.

Abstract: An apparatus and method to remove water content in organic solvents characterized in that it comprises treatment tank 10 to which organic solvent is introduced, solvent inlet section 1 that introduces the organic solvent, solvent outlet section 2 from which the treated organic solvent is discharged, inert gas inlet section 3 from which inert gas is introduced, treatment gas outlet section 4 from which gas is discharged, cooling treatment tank 20 in which the treatment gas is cooled and the gas and liquid are separated, treatment gas inlet section 5 from which the treatment gas is introduced, recovered liquid outlet section 6 from which the separated liquid organic solvent is discharged, and waste gas outlet section 7 from which the separated gas is discharged, and that the water content in the organic solvent is removed by having the inert gas flow over the entire liquid surface of the organic solvent inside treatment tank 10.

Abstract: To provide a simple highly-pure Xe retrieval method and device with high retrieval efficiency by functionally removing such elements as water, CO2 and FCs from waste gases from semiconductor production processes, such as the plasma etching, that contain low-concentration Xe. For samples containing xenon and fluorocarbon, this invention is characterized by having at least first adsorption means (A1) filled with synthetic zeolite with pore size of 4A or smaller and aluminum oxide, arranged serially, gas separation means (A2) composed of silicone or polyethylene hollow fiber gas separation membrane modules 4, second adsorption means (A3) filled with either activated carbon, synthetic zeolite with pore size of 5A or larger, molecular sieving carbon with pore size of 5A or larger, or a combination of these, and reaction means (A4) filled with calcium compounds as reactant.

Abstract: An apparatus and method to remove water content in organic solvents characterized in that it comprises treatment tank 10 to which organic solvent is introduced, solvent inlet section 1 that introduces the organic solvent, solvent outlet section 2 from which the treated organic solvent is discharged, inert gas inlet section 3 from which inert gas is introduced, treatment gas outlet section 4 from which gas is discharged, cooling treatment tank 20 in which the treatment gas is cooled and the gas and liquid are separated, treatment gas inlet section 5 from which the treatment gas is introduced, recovered liquid outlet section 6 from which the separated liquid organic solvent is discharged, and waste gas outlet section 7 from which the separated gas is discharged, and that the water content in the organic solvent is removed by having the inert gas flow over the entire liquid surface of the organic solvent inside treatment tank 10.

Abstract: To provide a simple highly-pure Xe retrieval method and device with high retrieval efficiency by functionally removing such elements as water, CO2 and FCs from waste gases from semiconductor production processes, such as the plasma etching, that contain low-concentration Xe. For samples containing xenon and fluorocarbon, this invention is characterized by having at least first adsorption means (A1) filled with synthetic zeolite with pore size of 4A or smaller and aluminum oxide, arranged serially, gas separation means (A2) composed of silicone or polyethylene hollow fiber gas separation membrane modules 4, second adsorption means (A3) filled with either activated carbon, synthetic zeolite with pore size of 5A or larger, molecular sieving carbon with pore size of 5A or larger, or a combination of these, and reaction means (A4) filled with calcium compounds as reactant.