Abstract: To provide a scanning probe microscope capable of easily determining a measurement location even when a numerical aperture of an objective lens is relatively large. The scanning probe microscope comprises: a probe which scans a sample; a light source which irradiates the probe with excitation light via an objective lens; and a detector which detects fluorescence generated at the probe. The scanning probe microscope further includes: a reflective member arranged between the objective lens and the sample; and an imaging device which images a reflecting surface of the reflective member.

Abstract: A charged particle beam device which prevents an appearance of a shading contrast due to azimuth discrimination and obtains a clear magnetic domain contrast image with a high resolution and a high throughput. The charged particle beam device includes an electron beam source; a sample stage; an objective lens configured to focus electron beams on a sample; a detector that is mounted on a charged particle beam source side with respect to the objective lens and separately detects secondary electrons emitted in azimuth angle ranges of two or more different azimuths for the same observation region; an image processing and image management device including an image processing unit configured to perform synthesis after performing shading correction and contrast adjustment on an image obtained by detecting a first emission azimuth and an image obtained by detecting a second emission azimuth; an image database; and an image display unit.

Abstract: A scanning electron microscope includes a spin detector configured to measure secondary electron spin polarization of secondary electrons emitted from the sample, and an analysis device configured to analyze secondary electron spin polarization data measured by the spin detector. The analysis device evaluates the strain in the sample by calculating a difference in the secondary electron spin polarization data of adjacent pixels.

Abstract: To implement a charged particle beam device including an iron thin film spin detector. The charged particle beam device includes: a charged particle column 201 configured to perform scanning on a sample 203 with a charged particle beam 202; a spin detector including an iron thin film 207, a plurality of coils 208 configured to magnetize the iron thin film, a conveying lens 206 configured to focus, on the iron thin film, secondary electrons 204 emitted from the sample due to irradiation of the charged particle beam, and an electron detector 210 configured to detect backscattered electrons 209 emitted due to the iron thin film being irradiated with the secondary electrons; and a control unit 217 configured to control switching of a magnetization direction of the iron thin film in synchronization with scanning of one line with the charged particle beam from the charged particle column.

Abstract: To provide a magnetic domain image processing apparatus and a magnetic domain image processing method by which strain of an electromagnetic steel sheet can be evaluated in more detail.

Abstract: To provide a magnetic domain image processing apparatus and a magnetic domain image processing method by which strain of an electromagnetic steel sheet can be evaluated in more detail.

Abstract: A scanning electron microscope includes a spin detector configured to measure secondary electron spin polarization of secondary electrons emitted from the sample, and an analysis device configured to analyze secondary electron spin polarization data measured by the spin detector. The analysis device evaluates the strain in the sample by calculating a difference in the secondary electron spin polarization data of adjacent pixels.

Abstract: A charged particle beam device which prevents an appearance of a shading contrast due to azimuth discrimination and obtains a clear magnetic domain contrast image with a high resolution and a high throughput. The charged particle beam device includes an electron beam source; a sample stage; an objective lens configured to focus electron beams on a sample; a detector that is mounted on a charged particle beam source side with respect to the objective lens and separately detects secondary electrons emitted in azimuth angle ranges of two or more different azimuths for the same observation region; an image processing and image management device including an image processing unit configured to perform synthesis after performing shading correction and contrast adjustment on an image obtained by detecting a first emission azimuth and an image obtained by detecting a second emission azimuth; an image database; and an image display unit.

Abstract: A scanning electron microscope includes a spin detector configured to measure spin polarization of a secondary electron emitted from a sample, and an analysis device configured to analyze measurement data of the spin detector. The analysis device determines a width of a region where the secondary electron spin polarization locally changes in the measurement data. The analysis device further evaluates a strain in the sample based on the width of the region. With a configuration of the scanning electron microscope, it is possible to perform analysis of a strain in a magnetic material with high accuracy.

Abstract: In an image acquisition system, a distortion distribution is easily measured in a wide range. A standard image of magnetic domain of a sample serving as a standard is acquired by radiation of light using a standard external magnetic field which serves as a standard, a plurality of magnetic domain images are acquired in a state where an external magnetic field is applied while being changed, a plurality of subtraction images obtained by subtracting the standard image of magnetic domain from each of the plurality of magnetic domain images are acquired, a magnetization reversal area in which a magnetic domain is reversed is extracted from each of the plurality of subtraction images, and a composite image having a plurality of magnetization reversal areas is acquired by compositing the plurality of subtraction images each having the magnetization reversal area.

Abstract: A spin polarimeter includes: a particle beam source or a photon beam source that is a probe for a sample; a sample chamber in which the sample is accommodated; a spin detector that includes a target to be irradiated with an electron generated from the sample by a particle beam or a photon beam from the probe, and a target chamber in which the target is accommodated, and is configured to detect a spin of the sample by detecting an electron scattered on the target; a first exhaust system that is configured to exhaust the sample chamber; a second exhaust system that is configured to exhaust the target chamber; and an orifice that is disposed between the target chamber and the sample chamber.

Abstract: In an image acquisition system, a distortion distribution is easily measured in a wide range. A standard image of magnetic domain of a sample serving as a standard is acquired by radiation of light using a standard external magnetic field which serves as a standard, a plurality of magnetic domain images are acquired in a state where an external magnetic field is applied while being changed, a plurality of subtraction images obtained by subtracting the standard image of magnetic domain from each of the plurality of magnetic domain images are acquired, a magnetization reversal area in which a magnetic domain is reversed is extracted from each of the plurality of subtraction images, and a composite image having a plurality of magnetization reversal areas is acquired by compositing the plurality of subtraction images each having the magnetization reversal area.

Abstract: A spin polarimeter includes: a particle beam source or a photon beam source that is a probe for a sample; a sample chamber in which the sample is accommodated; a spin detector that includes a target to be irradiated with an electron generated from the sample by a particle beam or a photon beam from the probe, and a target chamber in which the target is accommodated, and is configured to detect a spin of the sample by detecting an electron scattered on the target; a first exhaust system that is configured to exhaust the sample chamber; a second exhaust system that is configured to exhaust the target chamber; and an orifice that is disposed between the target chamber and the sample chamber.

Abstract: A scanning electron microscope includes a spin detector configured to measure spin polarization of a secondary electron emitted from a sample, and an analysis device configured to analyze measurement data of the spin detector. The analysis device determines a width of a region where the secondary electron spin polarization locally changes in the measurement data. The analysis device further evaluates a strain in the sample based on the width of the region. With a configuration of the scanning electron microscope, it is possible to perform analysis of a strain in a magnetic material with high accuracy.

Abstract: Provided is an optical system which can adjust, including increase, a spin polarization degree of an electron beam. Disclosed is a charged particle device having a charged particle source which generates charged particles, a sample table on which a sample is placed, and a transport optical system which is disposed between the charged particle source and the sample table and transports the charged particles as charged particle flux toward the sample table. In this device, the transport optical system includes a magnetic field generating section which generates a magnetic field having a vertical component to a course of the charged particle flux, an electric field generating section which generates an electric field having a vertical component to the course of the charged particle flux, and a shielding section which shields at least a part of the charged particle flux passed through the magnetic field generating section and the electric field generating section.

Abstract: A device including an imaging-type or a projection-type ion detection system and being capable of performing observation or inspection at high speed with an ultrahigh resolution in a sample observation device using an ion beam is provided. The device includes a gas field ion source that generates an ion beam, an irradiation optical system that irradiates a sample with the ion beam, a potential controller that controls an accelerating voltage of the ion beam and a positive potential to be applied to the sample and an ion detection unit that images or projects ions reflected from the sample as a microscope image, in which the potential controller includes a storage unit storing a first positive potential allowing the ion beam to collide with the sample and a second positive potential for reflecting the ion beam before allowing the ion beam to collide with the sample.

Abstract: The outer shape and size of a diffraction grating including an edge dislocation is made smaller than the irradiation areas of light waves and electromagnetic waves, by using an opener different from in the diffraction grating, the shape and size of the opening is superposed on the shape of a spiral wave that is generated by an edge dislocation diffraction grating, and the shape and size of the opening are reflected in the shape and size of the spiral wave on the diffractive surface. In addition, not only a diffraction grating system including a pair of a single opener and a single diffraction grating, but also a diffraction grating system in which plural openers and plural edge dislocation diffraction gratings are combined are used, and plural spiral waves can be generated on the diffractive surface with a higher degree of freedom.

Abstract: Provided is an optical system which can adjust, including increase, a spin polarization degree of an electron beam. Disclosed is a charged particle device having a charged particle source which generates charged particles, a sample table on which a sample is placed, and a transport optical system which is disposed between the charged particle source and the sample table and transports the charged particles as charged particle flux toward the sample table. In this device, the transport optical system includes a magnetic field generating section which generates a magnetic field having a vertical component to a course of the charged particle flux, an electric field generating section which generates an electric field having a vertical component to the course of the charged particle flux, and a shielding section which shields at least a part of the charged particle flux passed through the magnetic field generating section and the electric field generating section.

Abstract: To provide a device particularly including an imaging-type or a projection-type ion detection system, not a scanning type such as in a scanning ion microscope, and capable of performing observation or inspection at high speed with an ultrahigh resolution in a sample observation device using an ion beam. To further provide a device capable of performing observation after surface cleaning, which has been difficult in an electron beam device, or a device capable of observing structures and defects in a depth direction.

Abstract: Although, conventionally, there were two methods, (1) a wave was transmitted through a spiral phase plate and (2) a diffraction grating containing an edge dislocation was used, they incurred complication of a configuration and securement of a larger amount of space and were not efficient because each of the spiral wave generation methods needed an incident wave to be a plane wave and at least one time of imaging is necessary at the time of wave irradiation on an observation object. In order to efficiently generate the spiral wave having a sufficient intensity, a structure of edge dislocation is taken in into a pattern of the zone plate and a spiral pattern containing a discontinuous zone is formed. Moreover, a thickness and a quality of material that change the phase of the wave by an odd multiple of ? are selected for a material of the wave-blocking section in the pattern.