Abstract: This invention is relates to a fire extinguishing system which obstructs a fire in a chemical bath containing a flammable chemical arranged within a closed space of high airtightness. The fire extinguishing system includes detecting means which generates a detection signal by detecting flames outbroken on the surface of the chemical, an injection nozzle which jets out a nonflammable gas toward the liquid surface of the chemical in response to the detection signal, an auxiliary bath which temporarily stores the chemical by discharging the chemical from the chemical bath in response to the detection signal, a feed water equipment which supplies water to the auxiliary bath in response to the detection signal to dilute and cool the chemical, a pipeline which discharges the vapor component of the chemical within the chemical bath from the closed space, and an inert gas supplying device which supplies an inert gas in order to dilute the vapor component of the chemical within the auxiliary bath.

Abstract: An apparatus for washing semiconductor wafers is disclosed which comprises a washing tub, a basket holding semiconductor wafers to be washed and placed in the washing tub, nozzles provided above and below the basket respectively for constantly squirting a washing liquid over the wafers, and a vent provided below the basket for periodically draining the waste liquid.