Abstract: An X-ray lithography apparatus wherein a linear X-ray source is formed by line scanning a target with electron lines, a band-slit having slits which extend in the direction similar to the longitudinal direction of said linear X-ray source and a solar-slit having plural slits in the direction perpendicular to said band-slit are interposed between the X-ray source and a wafer in order to irradiate only the component which is substantially perpendicular to the surface of the wafer out of the X-ray generated from the linear source, and said wafer is made to move continuously or stepwise in respect of a rectangular region which is highly collimated in order to conduct X-ray transfer against a predetermined region.

Abstract: In a scanning electron microscope, a circle of least confusion of the electron beam is formed on a specimen without operation of a stigmator, then the circle of least confusion is minimized by a stigmator, thereby enabling lens astigmatism in said microscope to be fully corrected.

Abstract: An electron lens system comprising a plurality of quadrupole elements, a plurality of octupole elements for correcting the spherical aberrations of said plurality of quadrupole elements, and an axially symmetric lens, arranged at the inlet or outlet side of said quadrupole and octupole elements for varying the focal length of said lens system so that the excitation currents of said plurality of quadrupole elements remain fixed.

Abstract: An improved field emission type electron gun is automatically controlled so as to generate a stable emission current. The preferred embodiment employs a detecting means for detecting the emission current fluctuation and a control means for controlling the electric field for field emission according to the output signal of said detecting means.