Patents by Inventor Tetsushi Ishikawa

Tetsushi Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240066871
    Abstract: A method for manufacturing a flow path member includes bringing a flexible member into contact with a first substrate including a recessed portion via an adhesive agent so as to cover the recessed portion, wherein the flexible member is configured to suppress vibrations of a liquid in a flow path, curing the adhesive agent in a state where at least an area of the flexible member covering the recessed portion is supported by a support member, bonding a second substrate to a side of the first substrate with which the flexible member is brought into contact, wherein the second substrate is configured to form the flow path facing the flexible member, and removing the support member from the flexible member in a period after the curing and before the bonding.
    Type: Application
    Filed: August 28, 2023
    Publication date: February 29, 2024
    Inventors: KENJI TAMAMORI, TETSUSHI ISHIKAWA, MITSUNORI TOSHISHIGE
  • Publication number: 20240051298
    Abstract: Provided is a method for manufacturing a substrate bonded body in which a first substrate and a second substrate are bonded together, the first substrate forming a first portion of an element, and the second substrate forming a second portion of the element, including: a film-forming step of forming an inorganic film on a bonding face of the first substrate, the bonding face facing the second substrate, such that the bonding face has a convex shape toward the second substrate; a contact step of bringing the first substrate and the second substrate closer and into contact with each other; and a bonding step of bonding the first substrate and the second substrate by an adhesive.
    Type: Application
    Filed: July 26, 2023
    Publication date: February 15, 2024
    Inventor: TETSUSHI ISHIKAWA
  • Publication number: 20230311493
    Abstract: Provided is a method for manufacturing an element substrate for use in a liquid ejection head for ejecting a liquid to a recording medium. The element substrate, includes: a substrate having a nozzle including an ejection port, and a pressure generating chamber communicating with the nozzle, and subjected to a liquid repellent treatment on a part of a surface on a side opposed to the recording medium; and a generating element for generating an energy for ejecting the liquid. The method for manufacturing an element substrate includes: a liquid repellent treatment step of performing the liquid repellent treatment on the substrate; and a liquid repellent region removing step of removing a part of a liquid repellent region subjected to the liquid repellent treatment so that a non-liquid repellent region not subjected to the liquid repellent treatment is exposed at a surface of the substrate opposed to the recording medium.
    Type: Application
    Filed: March 15, 2023
    Publication date: October 5, 2023
    Inventor: TETSUSHI ISHIKAWA
  • Patent number: 11465418
    Abstract: A manufacturing method for a structure includes preparing a dry film supported on one surface of a support; bonding the dry film to a substrate so that the dry film and the substrate are in contact with each other; performing first exposure of the dry film bonded to the substrate via the support; removing the support after the first exposure; performing second exposure of the dry film after the support is removed via a photomask; and developing the dry film after the first exposure and the second exposure.
    Type: Grant
    Filed: March 17, 2021
    Date of Patent: October 11, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kenji Tamamori, Kazuhiro Asai, Tetsushi Ishikawa, Seiichiro Yaginuma
  • Patent number: 11424157
    Abstract: A method of manufacturing a structure that includes a substrate provided with a through hole, and a resin layer provided on a front surface of the substrate to close the through hole, includes, in order, preparing the substrate including the through hole and including a support substrate on a back surface of the substrate to close the through hole, bonding a dry film to a front surface of the substrate, the dry film including a support member and a resin layer on the support member, to close the through hole with the resin layer and turn the through hole into a closed space with the substrate, the support substrate, and the dry film, opening the through hole turned into the closed space from the support substrate side, and separating the support member from the dry film while retaining the resin layer on the front surface of the substrate.
    Type: Grant
    Filed: April 10, 2020
    Date of Patent: August 23, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Seiichiro Yaginuma, Ryotaro Murakami, Hideomi Kumano, Masahisa Watanabe, Tetsushi Ishikawa
  • Patent number: 11161344
    Abstract: A method for manufacturing a substrate having a resin layer, including, in this order: (1) providing the resin layer formed on a support, the support being larger than the outer size of the substrate; (2) bonding the resin layer supported on the support to the substrate; (3) removing an end portion of the resin layer disposed on the end portion of the support and in no contact with the substrate, by a solvent capable of dissolving the resin layer; and (4) peeling off the support from the resin layer.
    Type: Grant
    Filed: September 24, 2019
    Date of Patent: November 2, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Manabu Otsuka, Tetsushi Ishikawa
  • Patent number: 11155093
    Abstract: A method of producing a structure having a through substrate includes: forming a protective member having an atmosphere communication layer having a structure communicating with the through hole by permeation from at least a part of a layer side surface part to the through hole, and a gas-impermeable protective layer in this order, on the second surface of the through substrate; forming a dry film resist layer having a resin layer and a support member in this order, on the first surface of the through substrate; and peeling the support member from the resin layer, the support member being peeled from the resin layer in a state that the through hole of the through substrate is communicated with atmosphere by at least the atmosphere communication layer, in the peeling.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: October 26, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Manabu Otsuka, Tamaki Sato, Tetsushi Ishikawa, Yasuaki Tominaga
  • Publication number: 20210300042
    Abstract: A manufacturing method for a structure includes preparing a dry film supported on one surface of a support; bonding the dry film to a substrate so that the dry film and the substrate are in contact with each other; performing first exposure of the dry film bonded to the substrate via the support; removing the support after the first exposure; performing second exposure of the dry film after the support is removed via a photomask; and developing the dry film after the first exposure and the second exposure.
    Type: Application
    Filed: March 17, 2021
    Publication date: September 30, 2021
    Inventors: Kenji Tamamori, Kazuhiro Asai, Tetsushi Ishikawa, Seiichiro Yaginuma
  • Publication number: 20210237455
    Abstract: The present invention provides a liquid ejection apparatus and a liquid collection container that can suppress a decrease in productivity by reducing time required to remove an absorber from a waste liquid collection unit and time required to attach the absorber to the waste liquid collection unit. To this end, a second absorber is provided to cover partition walls in a collection unit.
    Type: Application
    Filed: January 28, 2021
    Publication date: August 5, 2021
    Inventors: Tetsushi ISHIKAWA, Seiichiro YAGINUMA
  • Publication number: 20210213765
    Abstract: A liquid ejection apparatus includes a liquid ejection head for ejecting liquid and a mounting section for receiving a waste liquid container to be attached thereto. The waste liquid container is capable of receiving and containing the waste liquid discharged from a discharge port arranged in the mounting section. The liquid ejection apparatus has a blocking member for shielding the discharge port in accordance with an operation of removing the waste liquid container from the mounting section. The liquid ejection apparatus minimizes the risk of staining one or both of the user's hands handling the waste liquid container and the user's clothes with the waste liquid remaining on the discharge port of the liquid ejection apparatus.
    Type: Application
    Filed: January 13, 2021
    Publication date: July 15, 2021
    Inventors: Kenji Tamamori, Tetsushi Ishikawa, Takashi Sugawara, Keiji Watanabe, Masafumi Morisue, Seiichiro Yaginuma
  • Patent number: 10894409
    Abstract: Provided is a method of manufacturing a liquid ejection head, which is capable of patterning a dry film while suppressing deformation of the dry film caused by a pressure. The method of manufacturing a liquid ejection head includes: preparing a substrate including an ejection orifice member on a first surface; forming, on an ejection orifice surface of the ejection orifice member, a protection film having communicating holes for allowing ejection orifices to communicate to outside; closing an opening of a supply port on a second surface on a side opposite to the first surface of the substrate with a dry film; and patterning the dry film by irradiating the dry film with light under a state in which the protection film is formed on the ejection orifice surface.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: January 19, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Jun Yamamuro, Kazuhiro Asai, Keiji Matsumoto, Kunihito Uohashi, Keiji Watanabe, Masahisa Watanabe, Tetsushi Ishikawa, Yasuaki Tominaga, Manabu Otsuka
  • Publication number: 20200335391
    Abstract: A method of manufacturing a structure that includes a substrate provided with a through hole, and a resin layer provided on a front surface of the substrate to close the through hole, includes, in order, preparing the substrate including the through hole and including a support substrate on a back surface of the substrate to close the through hole, bonding a dry film to a front surface of the substrate, the dry film including a support member and a resin layer on the support member, to close the through hole with the resin layer and turn the through hole into a closed space with the substrate, the support substrate, and the dry film, opening the through hole turned into the closed space from the support substrate side, and separating the support member from the dry film while retaining the resin layer on the front surface of the substrate.
    Type: Application
    Filed: April 10, 2020
    Publication date: October 22, 2020
    Inventors: Seiichiro Yaginuma, Ryotaro Murakami, Hideomi Kumano, Masahisa Watanabe, Tetsushi Ishikawa
  • Patent number: 10618286
    Abstract: In a structure such as a liquid ejecting head configured to cover an opening of a base with a covering member, the present invention alleviates the generation of a warp on the structure or the base even if the covering member is hardened and shrunk. The structure includes the base and the covering member attached onto the base. A manufacturing method for the structure includes: a first step of attaching the covering member having flexibility onto the base in such a manner as to cover an opening of the hole formed at the base and a second step of hardening the covering member attached onto the base. In the first step, the covering member is attached onto the base in a state in which a non-stuck portion of the covering member, covering the opening of the base, is slack.
    Type: Grant
    Filed: July 25, 2016
    Date of Patent: April 14, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tetsushi Ishikawa, Yasuaki Tominaga
  • Publication number: 20200094522
    Abstract: A method for manufacturing a substrate having a resin layer, including, in this order: (1) providing the resin layer formed on a support, the support being larger than the outer size of the substrate; (2) bonding the resin layer supported on the support to the substrate; (3) removing an end portion of the resin layer disposed on the end portion of the support and in no contact with the substrate, by a solvent capable of dissolving the resin layer; and (4) peeling off the support from the resin layer.
    Type: Application
    Filed: September 24, 2019
    Publication date: March 26, 2020
    Inventors: Manabu Otsuka, Tetsushi Ishikawa
  • Patent number: 10401730
    Abstract: A method for producing a microstructure provided with a member in which, on a substrate having a plurality of concave shapes processed thereon, a dry film resist is subjected to tenting on open faces of a plurality of concave shapes, and then openings are formed in the dry film resist where divided exposure is performed such that patterning is performed with first exposure light and second exposure is performed to cause overexposure.
    Type: Grant
    Filed: August 2, 2016
    Date of Patent: September 3, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventor: Tetsushi Ishikawa
  • Publication number: 20190255831
    Abstract: A resin film laminated on a support film is attached to the surface of a substrate having a pattern of unevenness. Firstly, the substrate is placed on a stage with the surface side up. Secondly, the resin film is placed so as to face the surface of the substrate and the surface is scanned with a roller while the resin film is pressed against the surface from the side of the support film to bring them into contact with each other. Surface temperatures of the stage and the roller are set to form a temperature gradient such that the temperature of the surface of the resin film to be attached to the surface of the substrate becomes not lower than the softening temperature of the resin film and the temperature of the surface of the support film side becomes lower than the softening temperature of the resin film.
    Type: Application
    Filed: February 12, 2019
    Publication date: August 22, 2019
    Inventors: Tetsushi Ishikawa, Manabu Otsuka
  • Patent number: 10364142
    Abstract: A method of forming a space includes a step of tenting, on a substrate having a recessed portion, a dry film including a dry film material that is to be a top plate on the recessed portion. The step of tenting the dry film includes a press period and a release period and performs a press-release cycle of the press period and the release period a plurality of times, a pressed state in which the dry film is pressed against the substrate by using a pressing member is maintained during the press period, and a released state in which the pressed state is released is maintained during the release period.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: July 30, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masafumi Morisue, Tamaki Sato, Akihiko Okano, Tetsushi Ishikawa
  • Publication number: 20190217617
    Abstract: A method of producing a structure having a through substrate includes: forming a protective member having an atmosphere communication layer having a structure communicating with the through hole by permeation from at least a part of a layer side surface part to the through hole, and a gas-impermeable protective layer in this order, on the second surface of the through substrate; forming a dry film resist layer having a resin layer and a support member in this order, on the first surface of the through substrate; and peeling the support member from the resin layer, the support member being peeled from the resin layer in a state that the through hole of the through substrate is communicated with atmosphere by at least the atmosphere communication layer, in the peeling.
    Type: Application
    Filed: January 8, 2019
    Publication date: July 18, 2019
    Inventors: Manabu Otsuka, Tamaki Sato, Tetsushi Ishikawa, Yasuaki Tominaga
  • Patent number: 10315425
    Abstract: Provided is a method of producing a structure including a substrate having openings in a first surface and a lid structure formed on the first surface and having an opening portion communicating with a part of the openings. The method includes preparing a laminate by forming a layer containing a photosensitive resin composition on a base film, stacking the laminate on the first surface such that the first surface is in contact with the photosensitive resin composition-containing layer, and forming a pattern for the opening portion of the lid structure in the photosensitive resin composition-containing layer by pattern exposure of the layer through the base film. The maximum scattering light intensity of the base film at a scattering angle of 10° or more is 1/100000 or less of the light intensity at a scattering angle of 0°, at a wavelength of 400 nm.
    Type: Grant
    Filed: May 8, 2017
    Date of Patent: June 11, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasuaki Tominaga, Tetsushi Ishikawa
  • Patent number: 10303062
    Abstract: A method of manufacturing a structure including a substrate and a photosensitive resin layer provided on the substrate includes irradiating a region of the photosensitive resin layer with light in a state where a layer is provided on a surface of the substrate, the region being located above a space surrounded by the substrate and the photosensitive resin layer, and the surface facing the space, and removing a portion of the photosensitive resin layer located above the space to form a hole, wherein the provided layer has a reflectance of 40% or less with respect to the light.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: May 28, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasuaki Tominaga, Tetsushi Ishikawa, Manabu Otsuka