Abstract: Disclosed are: a composition for hard tissue repair with excellent penetrability to an adherend such as a cancellous bone and excellent adhesion to an adherend, which comprises a monomer (A), a polymer (B), a polymerization initiator (C) and a contrast medium (X) having a volume mean particle diameter of 3 ?m or more; and a kit for hard tissue repair having members in which the components of the monomer (A), the polymer (B), the polymerization initiator (C) and the contrast medium (X) contained in this composition for hard tissue repair are encased in three or more divided groups in an optional combination.

Abstract: An image forming apparatus comprises a conveyance unit configured to convey a long-shaped print medium in a longitudinal direction, an image forming unit configured to form an image on the print medium, a drying unit configured to dry the print medium on which an image has been formed in the image forming unit, and a control unit configured to, after interrupting image formation on the print medium by the image forming unit, control the image forming unit and the conveyance unit so as to convey and then stop at an ejection position at which the portion has been ejected from inside of the drying unit a portion of the print medium on which image formation has been performed.

Abstract: Disclosed are: a composition for hard tissue repair with excellent penetrability to an adherend such as a cancellous bone and excellent adhesion to an adherend, which comprises a monomer (A), a polymer powder (B) comprising 54% by mass or more of a polymer powder (b1) having a volume mean particle diameter of 27 to 80 ?m and a polymerization initiator (C); and a kit for hard tissue repair comprising members in which the components of the monomer (A), the polymer powder (B) and the polymerization initiator (C) contained in this composition for hard tissue repair are encased in three or more divided groups in an optional combination.

Abstract: Disclosed are: a composition for hard tissue repair with excellent penetrability to an adherend such as a cancellous bone and excellent adhesion to an adherend, which comprises a monomer (A), a polymer (B), a polymerization initiator (C) and a contrast medium (X) having a volume mean particle diameter of 3 ?m or more; and a kit for hard tissue repair having members in which the components of the monomer (A), the polymer (B), the polymerization initiator (C) and the contrast medium (X) contained in this composition for hard tissue repair are encased in three or more divided groups in an optional combination.

Abstract: Disclosed are: a composition for hard tissue repair with excellent penetrability to an adherend such as a cancellous bone and excellent adhesion to an adherend, which comprises a monomer (A), a polymer powder (B) comprising 54% by mass or more of a polymer powder (b1) having a volume mean particle diameter of 27 to 80 ?m and a polymerization initiator (C); and a kit for hard tissue repair comprising members in which the components of the monomer (A), the polymer powder (B) and the polymerization initiator (C) contained in this composition for hard tissue repair are encased in three or more divided groups in an optional combination.

Abstract: The method for producing trans-rich-1,4-bis(aminomethyl)cyclohexane includes blending 1,4-bis(aminomethyl)cyclohexane with an alkali metal compound and XDA and heating the mixture to isomerize 1,4-bis(aminomethyl)cyclohexane so that the trans isomer content relative to the cis/trans isomers in total is more than 70 mass %, and purifying the isomerized 1,4-bis(aminomethyl)cyclohexane by distillation after the isomerization step. The alkali metal compound is at least one compound selected from the group consisting of alkali metal hydride, alkali metal amide, and alkyl alkali metal. In the isomerization step, 0.

Abstract: The method for producing trans-rich-1,4-bis(aminomethyl)cyclohexane includes blending 1,4-bis(aminomethyl)cyclohexane with an alkali metal compound and XDA and heating the mixture to isomerize 1,4-bis(aminomethyl)cyclohexane so that the trans isomer content relative to the cis/trans isomers in total is more than 70 mass %, and purifying the isomerized 1,4-bis(aminomethyl)cyclohexane by distillation after the isomerization step. The alkali metal compound is at least one compound selected from the group consisting of alkali metal hydride, alkali metal amide, and alkyl alkali metal. In the isomerization step, 0.

Abstract: The eyewear material is an eyewear material containing thermoplastic polyurethane. The eyewear material has a tan ? peak at both less than 0° C. and 0° C. or more and 70° C. or less observed in dynamic viscoelasticity measurement in tensile mode under the measurement conditions of a temperature increase speed of 5° C./min and a measurement frequency of 10 Hz.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.

Abstract: 1,4-bis(isocyanatomethyl)cyclohexane contains 70 mol % or more and 95 mol % or less of a trans isomer relative to a total amount of a cis isomer and the trans isomer, and 0.

Abstract: 1,4-bis(isocyanatomethyl)cyclohexane contains 70 mol % or more and 95 mol % or less of a trans isomer relative to a total amount of a cis isomer and the trans isomer, and 0.

Abstract: The eyewear material is an eyewear material containing thermoplastic polyurethane. The eyewear material has a tan ? peak at both less than 0° C. and 0° C. or more and 70° C. or less observed in dynamic viscoelasticity measurement in tensile mode under the measurement conditions of a temperature increase speed of 5° C./min and a measurement frequency of 10 Hz.

Abstract: A substrate processing method includes forming a first film on the upper surface of the substrate and supplying a first removal liquid to a peripheral edge of said first film to remove a first annular region at the peripheral edge. The method also includes correcting a relative positional relationship between the substrate and a first removal nozzle, forming a second film so as to cover the first film, and supplying a second removal liquid to a peripheral edge of said second film to remove a second annular region at the peripheral edge. The method also includes correcting a relative positional relationship between the substrate and a second removal nozzle so that said second annular region at the peripheral edge of said second film is removed in a predetermined second constant width and carrying the substrate into each of a first and second film formation units by a carry-in device.

Abstract: 1,4-bis(isocyanatomethyl)cyclohexane contains 70 mol % or more and 95 mol % or less of a trans isomer relative to a total amount of a cis isomer and the trans isomer, and 0.

Abstract: 1,4-bis(isocyanatomethyl)cyclohexane contains 70 mol % or more and 95 mol % or less of a trans isomer relative to a total amount of a cis isomer and the trans isomer, and 0.

Abstract: A method for producing urethane compounds includes allowing a primary amine, a urea and/or an N-unsubstituted carbamate, and an alcohol to react in the presence of a compound containing a noncoordinating anion and a metal atom as a catalyst.

Abstract: A printer of the present invention prohibits print-media replacement or operations of the printer, when executing a profile creation mode of creating profile data that is used for color conversion processing performed on image data that is to be printed by a print unit.

Abstract: A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.