Patents by Inventor Tetsuzo Tanimoto

Tetsuzo Tanimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Projection exposure apparatus and projection exposure method
    Patent number: 6094268
    Abstract: A projection exposure apparatus (1) comprises an incident light optical system for causing the light emitted from a light source 1 to enter an object of exposure (4) in diagonal direction, a detection apparatus (3) for causing an interference between the light reflected from the object of exposure (4) and a reference light and detecting the resultant interference fringe, a processing circuit for determining the inclination and height of the surface of the object of exposure (4) from the optical information on the interference fringe, and a stage (7) for supporting the object of exposure (4). The object of exposure (4) is subjected to projection exposure by driving the stage (7) according to the calculated inclination and height of the object of exposure (4).
    Type: Grant
    Filed: September 30, 1994
    Date of Patent: July 25, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Yoshitada Oshida, Tetsuzo Tanimoto, Minoru Tanaka
  • Projection exposure apparatus and projection exposure method
    Patent number: 5227862
    Abstract: A projection exposure apparatus (1) comprises an incident light optical system for causing the light emitted from a light source 1 to enter an object of exposure (4) in diagonal direction, a detection apparatus (3) for causing an interference between the light reflected from the object of exposure (4) and a reference light and detecting the resultant interference fringe, a processing circuit for determining the inclination and height of the surface of the object of exposure (4) from the optical information on the interference fringe, and a stage (7) for supporting the object of exposure (4). The object of exposure (4) is subjected to projection exposure by driving the stage (7) according to the calculated inclination and height of the object of exposure (4).
    Type: Grant
    Filed: December 14, 1990
    Date of Patent: July 13, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Yoshitada Oshida, Tetsuzo Tanimoto, Minoru Tanaka
  • Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same
    Patent number: 5016149
    Abstract: An illuminating method and an illuminating apparatus for use in combination, for example, with an exposure apparatus. The illuminating apparatus comprises amplitude distribution control means for converting the intensity distribution of a light beam emitted by a highly directional light source into a substantially linear intensity distribution, beam splitting means for splitting the light beam into a plurality of component beams, and superposing means for superposing the component beams in a desired area on an object, such as a reticle, in an uniform illuminance distribution.
    Type: Grant
    Filed: November 20, 1989
    Date of Patent: May 14, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Minoru Tanaka, Yoshitada Oshida, Yasuhiro Yoshitake, Tetsuzo Tanimoto