Patents by Inventor Theodorus M Modderman

Theodorus M Modderman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Off-axis levelling in lithographic projection apparatus
    Patent number: 7202938
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: April 10, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus M. Modderman, Gerrit J. Nijmeijer, Nicholaas A. A. J. van Asten, Frederik T. E. Heuts, Richard J. H. Du Croo de Jongh, Marcus E. J. Boonman, Jacob F. F. Klinkhamer
  • Off-axis leveling in lithographic projection apparatus
    Patent number: 7019815
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: March 28, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes C. M. Jasper, Erik R. Loopstra, Theodorus M. Modderman, Gerrit J. Nijmeijer, Nicolaas A. A. J. van Asten, Frederik T. E. Heuts, Jacobus Gemen, Richard J. H. Du Croo de Jongh, Marcus E. J. Boonman, Jacob F. F. Klinkhamer, Thomas J. M. Castenmiller
  • Off-axis levelling in lithographic projection apparatus
    Patent number: 6882405
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Grant
    Filed: October 17, 2003
    Date of Patent: April 19, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Christiaan Maria Jasper, Theodorus M Modderman, Gerrit Johannes Nijmeijer
  • Off-axis levelling in lithographic projection apparatus
    Patent number: 6674510
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: January 6, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes C. M. Jasper, Erik R. Loopstra, Theodorus M. Modderman, Gerrit J. Nijmeijer, Nicolaas A. A. J. van Asten, Frederik T. E. Heuts, Jacobus Gemen, Richard J. H. Du Croo de Jongh, Marcus E. J. Boonman, Jacob F. F. Klinkhamer, Thomas J. M. Castenmiller
  • Method of and an apparatus for frequency selective ultrasonic inspection of multi-layered structures
    Patent number: 5303590
    Abstract: A method of an apparatus for ultrasonic inspection of multi-layered structures having acoustic transmission (I, III, V and VII) and reflection (II, IV, VI and VIII) frequency bands. Variations in one or more parameters of specific layers are largely restricted to specific frequency bands of said layers. By analyzing transmitted or reflected signals with respect to the frequency bands of the structure, interpretation of signals due to parameter variations as caused by voids, inclusions or delaminations can be effectively eliminated. The method is preferably used for the inspection of laminated structures consisting of metal layers bonded by fibre reinforced resin layers.
    Type: Grant
    Filed: May 27, 1992
    Date of Patent: April 19, 1994
    Assignee: Fokker Aircraft, B.V.
    Inventors: Theodorus M. Modderman, Wiebe F. Pronker