Patents by Inventor Thierry Fried

Thierry Fried has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Tungsten silicide etch process selective to photoresist and oxide
    Patent number: 5338398
    Abstract: A process for etching tungsten silicide on a semiconductor wafer in a vacuum etch chamber in the presence of a plasma is described using chlorine (Cl.sub.2) and oxygen-bearing etchant gases in a ratio of not more that 20 volume % oxygen-bearing etchant gas, and preferably from about 6 to about 10 volume % oxygen-bearing etchant gas. The process is also capable of etching polysilicon and exhibits a high selectivity for both photoresist and oxide.
    Type: Grant
    Filed: December 23, 1992
    Date of Patent: August 16, 1994
    Assignee: Applied Materials, Inc.
    Inventors: Chester A. Szwejkowski, Robert Lum, Thierry Fried