Patents by Inventor Thijs C. Hosman

Thijs C. Hosman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • APPARATUS AND METHOD FOR SEMICONDUCTOR PACKAGE FAILURE ANALYSIS
    Publication number: 20230373028
    Abstract: A pulsed laser apparatus for milling a sample is described. The apparatus includes a pulsed laser, a scan head for scanning a beam from the pulsed laser across the sample an F-theta lens for focusing the scanned beam onto the sample and a confocal detector for detection of ablation depth. Methods of pulsed laser milling are also described.
    Type: Application
    Filed: October 8, 2021
    Publication date: November 23, 2023
    Applicant: Gatan, Inc.
    Inventors: Steven Thomas COYLE, Thijs C. HOSMAN, John Andrew HUNT, Michael Patrick HASSEL-SHEARER
  • APPARATUS AND METHOD FOR SEMICONDUCTOR PACKAGE FAILURE ANALYSIS
    Publication number: 20230311244
    Abstract: A pulsed laser apparatus for milling a sample is described. The apparatus includes a pulsed laser, a scan head for scanning a beam from the pulsed laser across the sample and an F-theta lens for focusing the scanned beam onto the sample. The apparatus may also include a liquid bath for milling the sample under the liquid, such as water. Methods of pulsed laser milling are also described.
    Type: Application
    Filed: August 27, 2021
    Publication date: October 5, 2023
    Applicant: Gatan, Inc.
    Inventors: Steven Thomas COYLE, Thijs C. HOSMAN, John Andrew HUNT, Michael Patrick HASSEL-SHEARER
  • Methods and apparatus for determining, using, and indicating ion beam working properties
    Patent number: 11004656
    Abstract: Disclosed are embodiments of an ion beam sample preparation and coating apparatus and methods. A sample may be prepared in one or more ion beams and then a coating may be sputtered onto the prepared sample within the same apparatus. A vacuum transfer device may be used with the apparatus in order to transfer a sample into and out of the apparatus while in a controlled environment. Various methods to improve preparation and coating uniformity are disclosed including: rotating the sample retention stage; modulating the sample retention stage; variable tilt ion beam irradiating means, more than one ion beam irradiating means, coating thickness monitoring, selective shielding of the sample, and modulating the coating donor holder.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: May 11, 2021
    Assignee: Gatan, Inc.
    Inventors: John Andrew Hunt, Steven Thomas Coyle, Michael Patrick Hassel-Shearer, Thijs C Hosman
  • Ion beam sample preparation and coating apparatus and methods
    Patent number: 10731246
    Abstract: Disclosed are embodiments of an ion beam sample preparation and coating apparatus and methods. A sample may be prepared in one or more ion beams and then a coating may be sputtered onto the prepared sample within the same apparatus. A vacuum transfer device may be used with the apparatus in order to transfer a sample into and out of the apparatus while in a controlled environment. Various methods to improve preparation and coating uniformity are disclosed including: rotating the sample retention stage; modulating the sample retention stage; variable tilt ion beam irradiating means, more than one ion beam irradiating means, coating thickness monitoring, selective shielding of the sample, and modulating the coating donor holder.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: August 4, 2020
    Assignee: Gatan, Inc.
    Inventors: John Andrew Hunt, Steven Thomas Coyle, Michael Patrick Hassel-Shearer, Thijs C Hosman
  • Methods and Apparatus for Determining, Using, and Indicating Ion Beam Working Properties
    Publication number: 20160111249
    Abstract: Disclosed are embodiments of an ion beam sample preparation and coating apparatus and methods. A sample may be prepared in one or more ion beams and then a coating may be sputtered onto the prepared sample within the same apparatus. A vacuum transfer device may be used with the apparatus in order to transfer a sample into and out of the apparatus while in a controlled environment. Various methods to improve preparation and coating uniformity are disclosed including: rotating the sample retention stage; modulating the sample retention stage; variable tilt ion beam irradiating means, more than one ion beam irradiating means, coating thickness monitoring, selective shielding of the sample, and modulating the coating donor holder.
    Type: Application
    Filed: October 13, 2015
    Publication date: April 21, 2016
    Inventors: John Andrew Hunt, Steven Thomas Coyle, Michael Patrick Hassel-Shearer, Thijs C. Hosman
  • Ion Beam Sample Preparation and Coating Apparatus and Methods
    Publication number: 20160024645
    Abstract: Disclosed are embodiments of an ion beam sample preparation and coating apparatus and methods. A sample may be prepared in one or more ion beams and then a coating may be sputtered onto the prepared sample within the same apparatus. A vacuum transfer device may be used with the apparatus in order to transfer a sample into and out of the apparatus while in a controlled environment. Various methods to improve preparation and coating uniformity are disclosed including: rotating the sample retention stage; modulating the sample retention stage; variable tilt ion beam irradiating means, more than one ion beam irradiating means, coating thickness monitoring, selective shielding of the sample, and modulating the coating donor holder.
    Type: Application
    Filed: July 24, 2015
    Publication date: January 28, 2016
    Inventors: John Andrew Hunt, Steven Thomas Coyle, Michael Patrick Hassel-Shearer, Thijs C. Hosman