Patents by Inventor Thomas A. Schuelke
Thomas A. Schuelke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230203641Abstract: A magnetic-field-assisted plasma coating system and method are provided. In another aspect, a coating system employs a cathode with a linearly moveable magnetic field. A further aspect employs a workpiece as an anode within which is located an elongated cathode which internally coats a bore of the workpiece. Still another aspect of the present system and method employs an elongated and hollow cathode with at least one magnetic source therein. In yet another aspect, end caps or plates seal against one or more open ends of a workpiece bore to be coated, with a cathode inserted into the bore and a vacuum being created within the bore such that the workpiece itself defines at least a portion of a vacuum chamber.Type: ApplicationFiled: February 24, 2023Publication date: June 29, 2023Applicants: Board of Trustees of Michigan State University, Franhofer USAInventors: Thomas Schuelke, Michael Becker, Lars Haubold, Qi Hua Fan
-
Patent number: 11592373Abstract: The disclosure relates to a method for pretreating a sample for metals determination.Type: GrantFiled: November 27, 2019Date of Patent: February 28, 2023Assignees: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USAInventors: Thomas Schuelke, Cory A. Rusinek, Michael Becker, Mary Ensch
-
Publication number: 20210349047Abstract: A trace metal analysis detector and method of operating the same to detect metals in various fluid samples using boron doped diamond working electrodes.Type: ApplicationFiled: July 20, 2021Publication date: November 11, 2021Inventors: Michael Frank Becker, Thomas Schuelke
-
Publication number: 20210323848Abstract: An electrode apparatus for removing contaminants from a fluid is provided. In another aspect, an electrochemical destruction apparatus for wastewater effluent using Boron-doped diamond electrodes is employed. A further aspect of the present apparatus includes a fluid-carrying conduit, electrodes located within the conduit, an electrical controller connected to the electrodes, a sensor connected to the controller being adapted to sense a chemical characteristic associated with contaminants in the fluid, and the controller automatically varying an electrical characteristic associated with at least one of the electrodes based, at least in part, on an input from the sensor. Yet another aspect includes a programmable controller and software which automatically employ a feedback control loop to increase or decrease electrical current density to contaminant-removing electrodes.Type: ApplicationFiled: April 13, 2021Publication date: October 21, 2021Applicants: Board of Trustees of Michigan State University, Fraunhofer USAInventors: Thomas SCHUELKE, Mary K. ENSCH, Michael BECKER, Cory A. RUSINEK
-
Publication number: 20210291138Abstract: A vertically oriented plasma reactor is provided. In another aspect, a plasma reactor includes a vertically elongated vacuum chamber, a wall internally projecting within a middle section of the housing, magnets, electrodes and a radio frequency source. A further aspect employs a workpiece-entry port and an opposite workpiece material-exit port, with one located adjacent a top end and the other adjacent a bottom end of a vertically elongated reactor housing or vacuum chamber. Yet another aspect employs a moving or falling-bed plasma reactor for use in activating biochar material.Type: ApplicationFiled: July 11, 2019Publication date: September 23, 2021Applicant: Board of Trustees of Michigan State UniversityInventors: Qi Hua FAN, Martin E. TOOMAJIAN, Thomas SCHUELKE
-
Patent number: 11073494Abstract: A trace metal analysis detector and method of operating the same to detect metals in various fluid samples using boron doped diamond working electrodes.Type: GrantFiled: August 8, 2016Date of Patent: July 27, 2021Assignee: Fraunhofer USA, Inc.Inventors: Michael Frank Becker, Thomas Schuelke
-
Patent number: 11049697Abstract: A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.Type: GrantFiled: June 19, 2019Date of Patent: June 29, 2021Assignees: Board of Trustees of Michigan State University, Fraunhofer USAInventors: Qi Hua Fan, Thomas Schuelke, Lars Haubold, Michael Petzold
-
Publication number: 20210147974Abstract: A magnetic-field-assisted plasma coating system and method are provided. In another aspect, a coating system employs a cathode with a linearly moveable magnetic field. A further aspect employs a workpiece as an anode within which is located an elongated cathode which internally coats a bore of the workpiece. Still another aspect of the present system and method employs an elongated and hollow cathode with at least one magnetic source therein. In yet another aspect, end caps or plates seal against one or more open ends of a workpiece bore to be coated, with a cathode inserted into the bore and a vacuum being created within the bore such that the workpiece itself defines at least a portion of a vacuum chamber.Type: ApplicationFiled: June 7, 2018Publication date: May 20, 2021Applicants: Board of Trustees of Michigan State University, Fraunhofer USAInventors: Thomas SCHUELKE, Michael BECKER, Lars HAUBOLD, Qi Hua FAN
-
Publication number: 20200303236Abstract: An electrode is provided. The electrode includes a contact pad composed of boron-doped polycrystalline diamond (BDD); a fiber core composed of BDD extending longitudinally from the contact pad from a first end that is in direct contact with the contact pad to an opposing second end; and a polycrystalline diamond (PCD) cladding that coats and hermetically seals the contact pad and the fiber core. A first portion of the contact pad and a second portion at or near the second end of the fiber core are not coated and hermetically scaled by the PCD cladding. A method of fabricating the electrode is also provided.Type: ApplicationFiled: September 27, 2018Publication date: September 24, 2020Applicants: Board of Trustees of Michigan State University, Fraunhofer USAInventors: Wen LI, Yue GUO, Thomas SCHUELKE, Michael BECKER, Robert RECHENBERG, Cory RUSINEK
-
Publication number: 20200303168Abstract: A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.Type: ApplicationFiled: June 19, 2019Publication date: September 24, 2020Applicants: Board of Trustees of Michigan State University, Fraunhofer USAInventors: Qi Hua FAN, Thomas SCHUELKE, Lars HAUBOLD, Michael PETZOLD
-
Publication number: 20200173891Abstract: The disclosure relates to a method for pretreating a sample for metals determination.Type: ApplicationFiled: November 27, 2019Publication date: June 4, 2020Inventors: Thomas Schuelke, Cory A. Rusinek, Michael Becker, Mary Ensch
-
Publication number: 20200088671Abstract: A trade metal analysis detector and method of operating the same to detect metals in various fluid samples using boron doped diamond working electrodes.Type: ApplicationFiled: August 8, 2016Publication date: March 19, 2020Inventors: Michael Frank Becker, Thomas Schuelke
-
Publication number: 20200035456Abstract: A material processing apparatus includes a vacuum chamber, an electrically grounded shield and/or workpiece, multiple radio frequency-powered electrodes within the vacuum chamber, magnets, and a gas inlet operable to flow a precursor gas to a plasma area located between the electrodes. In another aspect, magnets and spaced apart radio frequency-powered electrodes are operable to create a magnetic field and a radio frequency field within a plasma, which causes a plasma enhanced chemical vapor deposition of coating material onto a workpiece or substrate within a vacuum chamber.Type: ApplicationFiled: July 24, 2019Publication date: January 30, 2020Applicants: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USAInventors: Qi Hua FAN, Thomas Schuelke, Michael Becker, Bocong Zheng
-
Publication number: 20190366298Abstract: A method, system and equipment (31) for activating biochar (29) includes flowing a reactive gas into a chamber (33; 305), using an electrical field to create a plasma (75) in the chamber, using a magnetic field (105) to increase density of the plasma and activating biochar with the plasma in the chamber. Use of inductive magnetic coil(s) (131) with an essentially closed loop magnetic field, and/or a permanent magnet(s) (101; 317) are also provided in a further aspect of the present method and apparatus. Another aspect causes magnetic densification of one or multiple plasmas in a chamber (305) to treat a previously produced layer of thin film (303).Type: ApplicationFiled: January 17, 2018Publication date: December 5, 2019Applicant: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITYInventors: Qi Hua FAN, Thomas SCHUELKE
-
Patent number: 10435567Abstract: Fluorinated and hydrogenated diamond-like carbon (“DLC-FH”) that have unique optical properties differ as a class from the existing DLC art, whose refractive indices [?]are limited to rather high values above a lower threshold of 1.7, and can range up to about 2.7. The DLC-FH materials can achieve very low refractive indices at 550 nm wavelength, [?550], i.e., below 1.5, and especially demonstrated down to 1.3. Moreover, whereas the absorption for the existing DLC art, as quantified by the extinction coefficient [?] at a wavelength of 550 nm, [?550] is limited to about 0.04, our DLC-FH material can achieve [?550] below 0.01. Both of these attributes, i.e., low [?550] and low [?550] means that, for the first time, a carbon-based material as represented by the DLC-FH material, can be used for anti-reflection (AR) coating, wherein there are no longer any restrictions in how they can be used to promote low reflectance (with low fit[?]) and high transmittance (with low [?]).Type: GrantFiled: February 12, 2015Date of Patent: October 8, 2019Inventors: John Thomas Slagter, David V. Tsu, Lars Haubold, Thomas Schuelke
-
Patent number: 9732440Abstract: The present invention relates to a microwave plasma deposition process and apparatus for producing diamond, preferably as single crystal diamond (SCD). The process and apparatus enables the production of multiple layers of the diamond by the use of an extending device to increase the length and the volume of a recess in a holder containing a SCD substrate as layers of diamond are deposited. The diamond is used for abrasives, cutting tools, gems, electronic substrates, heat sinks, electrochemical electrodes, windows for high power radiation and electron beams, and detectors.Type: GrantFiled: November 1, 2016Date of Patent: August 15, 2017Assignees: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USAInventors: Jes Asmussen, Timothy A. Grotjohn, Donnie K. Reinhard, Rahul Ramamurti, M. Kagan Yaran, Thomas Schuelke, Michael Becker, David King
-
Publication number: 20170114476Abstract: The present invention relates to a microwave plasma deposition process and apparatus for producing diamond, preferably as single crystal diamond (SCD). The process and apparatus enables the production of multiple layers of the diamond by the use of an extending device to increase the length and the volume of a recess in a holder containing a SCD substrate as layers of diamond are deposited. The diamond is used for abrasives, cutting tools, gems, electronic substrates, heat sinks, electrochemical electrodes, windows for high power radiation and electron beams, and detectors.Type: ApplicationFiled: November 1, 2016Publication date: April 27, 2017Inventors: Jes Asmussen, Timothy A. Grotjohn, Donnie K. Reinhard, Rahul Ramamurti, M. Kagan Yaran, Thomas Schuelke, Michael Becker, David King
-
Patent number: 9487858Abstract: The present invention relates to a microwave plasma deposition process and apparatus for producing diamond, preferably as single crystal diamond (SCD). The process and apparatus enables the production of multiple layers of the diamond by the use of an extending device to increase the length and the volume of a recess in a holder containing a SCD substrate as layers of diamond are deposited. The diamond is used for abrasives, cutting tools, gems, electronic substrates, heat sinks, electrochemical electrodes, windows for high power radiation and electron beams, and detectors.Type: GrantFiled: March 10, 2009Date of Patent: November 8, 2016Assignees: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USAInventors: Jes Asmussen, Timothy Grotjohn, Donnie Reinhard, Rahul Ramamurti, M. Kagan Yaran, Thomas Schuelke, Michael Becker, David King
-
Patent number: 9139909Abstract: New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures ranging from about 10 Torr to about 760 Torr. The disclosed microwave plasma assisted reactors include a movable lower sliding short and/or a reduced diameter conductive stage in a coaxial cavity of a plasma chamber. For a particular application, the lower sliding short position and/or the conductive stage diameter can be variably selected such that, relative to conventional reactors, the reactors can be tuned to operate over larger substrate areas, operate at higher pressures, and discharge absorbed power densities with increased diamond synthesis rates (carats per hour) and increased deposition uniformity.Type: GrantFiled: October 22, 2012Date of Patent: September 22, 2015Assignees: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USAInventors: Jes Asmussen, Timothy Grotjohn, Donnie K. Reinhard, Thomas Schuelke, M. Kagan Yaran, Kadek W. Hemawan, Michael Becker, David King, Yajun Gu, Jing Lu
-
Patent number: 8911868Abstract: A coating based on diamond-like is formed from a plurality of films of diamond-like carbon formed alternatingly over one another and in this respect a film in which no portion or only a much lower portion of doped fluorine is contained. A film in which fluorine or at least fluorine with a higher portion than the film arranged thereunder or thereabove are formed alternatingly over one another. The coating could be manufactured by using a target of pure carbon. Films are deposited on a surface of a substrate by means of a PVD process, with the portion of fluorine contained in doped form. Films are formed alternately being varied by varying a supplied volume flow of a fluorine/carbon compound or sulfur/fluorine compound as a precursor.Type: GrantFiled: July 13, 2012Date of Patent: December 16, 2014Assignees: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V., Fraunhofer USA, Inc.Inventors: Hans-Joachim Scheibe, Thomas Schuelke, Lars Haubold, Michael Becker, Yaran Mahmut