Patents by Inventor Thomas A. Schuelke

Thomas A. Schuelke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230203641
    Abstract: A magnetic-field-assisted plasma coating system and method are provided. In another aspect, a coating system employs a cathode with a linearly moveable magnetic field. A further aspect employs a workpiece as an anode within which is located an elongated cathode which internally coats a bore of the workpiece. Still another aspect of the present system and method employs an elongated and hollow cathode with at least one magnetic source therein. In yet another aspect, end caps or plates seal against one or more open ends of a workpiece bore to be coated, with a cathode inserted into the bore and a vacuum being created within the bore such that the workpiece itself defines at least a portion of a vacuum chamber.
    Type: Application
    Filed: February 24, 2023
    Publication date: June 29, 2023
    Applicants: Board of Trustees of Michigan State University, Franhofer USA
    Inventors: Thomas Schuelke, Michael Becker, Lars Haubold, Qi Hua Fan
  • Patent number: 11592373
    Abstract: The disclosure relates to a method for pretreating a sample for metals determination.
    Type: Grant
    Filed: November 27, 2019
    Date of Patent: February 28, 2023
    Assignees: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USA
    Inventors: Thomas Schuelke, Cory A. Rusinek, Michael Becker, Mary Ensch
  • Publication number: 20210349047
    Abstract: A trace metal analysis detector and method of operating the same to detect metals in various fluid samples using boron doped diamond working electrodes.
    Type: Application
    Filed: July 20, 2021
    Publication date: November 11, 2021
    Inventors: Michael Frank Becker, Thomas Schuelke
  • Publication number: 20210323848
    Abstract: An electrode apparatus for removing contaminants from a fluid is provided. In another aspect, an electrochemical destruction apparatus for wastewater effluent using Boron-doped diamond electrodes is employed. A further aspect of the present apparatus includes a fluid-carrying conduit, electrodes located within the conduit, an electrical controller connected to the electrodes, a sensor connected to the controller being adapted to sense a chemical characteristic associated with contaminants in the fluid, and the controller automatically varying an electrical characteristic associated with at least one of the electrodes based, at least in part, on an input from the sensor. Yet another aspect includes a programmable controller and software which automatically employ a feedback control loop to increase or decrease electrical current density to contaminant-removing electrodes.
    Type: Application
    Filed: April 13, 2021
    Publication date: October 21, 2021
    Applicants: Board of Trustees of Michigan State University, Fraunhofer USA
    Inventors: Thomas SCHUELKE, Mary K. ENSCH, Michael BECKER, Cory A. RUSINEK
  • Publication number: 20210291138
    Abstract: A vertically oriented plasma reactor is provided. In another aspect, a plasma reactor includes a vertically elongated vacuum chamber, a wall internally projecting within a middle section of the housing, magnets, electrodes and a radio frequency source. A further aspect employs a workpiece-entry port and an opposite workpiece material-exit port, with one located adjacent a top end and the other adjacent a bottom end of a vertically elongated reactor housing or vacuum chamber. Yet another aspect employs a moving or falling-bed plasma reactor for use in activating biochar material.
    Type: Application
    Filed: July 11, 2019
    Publication date: September 23, 2021
    Applicant: Board of Trustees of Michigan State University
    Inventors: Qi Hua FAN, Martin E. TOOMAJIAN, Thomas SCHUELKE
  • Patent number: 11073494
    Abstract: A trace metal analysis detector and method of operating the same to detect metals in various fluid samples using boron doped diamond working electrodes.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: July 27, 2021
    Assignee: Fraunhofer USA, Inc.
    Inventors: Michael Frank Becker, Thomas Schuelke
  • Patent number: 11049697
    Abstract: A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.
    Type: Grant
    Filed: June 19, 2019
    Date of Patent: June 29, 2021
    Assignees: Board of Trustees of Michigan State University, Fraunhofer USA
    Inventors: Qi Hua Fan, Thomas Schuelke, Lars Haubold, Michael Petzold
  • Publication number: 20210147974
    Abstract: A magnetic-field-assisted plasma coating system and method are provided. In another aspect, a coating system employs a cathode with a linearly moveable magnetic field. A further aspect employs a workpiece as an anode within which is located an elongated cathode which internally coats a bore of the workpiece. Still another aspect of the present system and method employs an elongated and hollow cathode with at least one magnetic source therein. In yet another aspect, end caps or plates seal against one or more open ends of a workpiece bore to be coated, with a cathode inserted into the bore and a vacuum being created within the bore such that the workpiece itself defines at least a portion of a vacuum chamber.
    Type: Application
    Filed: June 7, 2018
    Publication date: May 20, 2021
    Applicants: Board of Trustees of Michigan State University, Fraunhofer USA
    Inventors: Thomas SCHUELKE, Michael BECKER, Lars HAUBOLD, Qi Hua FAN
  • Publication number: 20200303236
    Abstract: An electrode is provided. The electrode includes a contact pad composed of boron-doped polycrystalline diamond (BDD); a fiber core composed of BDD extending longitudinally from the contact pad from a first end that is in direct contact with the contact pad to an opposing second end; and a polycrystalline diamond (PCD) cladding that coats and hermetically seals the contact pad and the fiber core. A first portion of the contact pad and a second portion at or near the second end of the fiber core are not coated and hermetically scaled by the PCD cladding. A method of fabricating the electrode is also provided.
    Type: Application
    Filed: September 27, 2018
    Publication date: September 24, 2020
    Applicants: Board of Trustees of Michigan State University, Fraunhofer USA
    Inventors: Wen LI, Yue GUO, Thomas SCHUELKE, Michael BECKER, Robert RECHENBERG, Cory RUSINEK
  • Publication number: 20200303168
    Abstract: A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.
    Type: Application
    Filed: June 19, 2019
    Publication date: September 24, 2020
    Applicants: Board of Trustees of Michigan State University, Fraunhofer USA
    Inventors: Qi Hua FAN, Thomas SCHUELKE, Lars HAUBOLD, Michael PETZOLD
  • Publication number: 20200173891
    Abstract: The disclosure relates to a method for pretreating a sample for metals determination.
    Type: Application
    Filed: November 27, 2019
    Publication date: June 4, 2020
    Inventors: Thomas Schuelke, Cory A. Rusinek, Michael Becker, Mary Ensch
  • Publication number: 20200088671
    Abstract: A trade metal analysis detector and method of operating the same to detect metals in various fluid samples using boron doped diamond working electrodes.
    Type: Application
    Filed: August 8, 2016
    Publication date: March 19, 2020
    Inventors: Michael Frank Becker, Thomas Schuelke
  • Publication number: 20200035456
    Abstract: A material processing apparatus includes a vacuum chamber, an electrically grounded shield and/or workpiece, multiple radio frequency-powered electrodes within the vacuum chamber, magnets, and a gas inlet operable to flow a precursor gas to a plasma area located between the electrodes. In another aspect, magnets and spaced apart radio frequency-powered electrodes are operable to create a magnetic field and a radio frequency field within a plasma, which causes a plasma enhanced chemical vapor deposition of coating material onto a workpiece or substrate within a vacuum chamber.
    Type: Application
    Filed: July 24, 2019
    Publication date: January 30, 2020
    Applicants: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USA
    Inventors: Qi Hua FAN, Thomas Schuelke, Michael Becker, Bocong Zheng
  • Publication number: 20190366298
    Abstract: A method, system and equipment (31) for activating biochar (29) includes flowing a reactive gas into a chamber (33; 305), using an electrical field to create a plasma (75) in the chamber, using a magnetic field (105) to increase density of the plasma and activating biochar with the plasma in the chamber. Use of inductive magnetic coil(s) (131) with an essentially closed loop magnetic field, and/or a permanent magnet(s) (101; 317) are also provided in a further aspect of the present method and apparatus. Another aspect causes magnetic densification of one or multiple plasmas in a chamber (305) to treat a previously produced layer of thin film (303).
    Type: Application
    Filed: January 17, 2018
    Publication date: December 5, 2019
    Applicant: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY
    Inventors: Qi Hua FAN, Thomas SCHUELKE
  • Patent number: 10435567
    Abstract: Fluorinated and hydrogenated diamond-like carbon (“DLC-FH”) that have unique optical properties differ as a class from the existing DLC art, whose refractive indices [?]are limited to rather high values above a lower threshold of 1.7, and can range up to about 2.7. The DLC-FH materials can achieve very low refractive indices at 550 nm wavelength, [?550], i.e., below 1.5, and especially demonstrated down to 1.3. Moreover, whereas the absorption for the existing DLC art, as quantified by the extinction coefficient [?] at a wavelength of 550 nm, [?550] is limited to about 0.04, our DLC-FH material can achieve [?550] below 0.01. Both of these attributes, i.e., low [?550] and low [?550] means that, for the first time, a carbon-based material as represented by the DLC-FH material, can be used for anti-reflection (AR) coating, wherein there are no longer any restrictions in how they can be used to promote low reflectance (with low fit[?]) and high transmittance (with low [?]).
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: October 8, 2019
    Inventors: John Thomas Slagter, David V. Tsu, Lars Haubold, Thomas Schuelke
  • Patent number: 9732440
    Abstract: The present invention relates to a microwave plasma deposition process and apparatus for producing diamond, preferably as single crystal diamond (SCD). The process and apparatus enables the production of multiple layers of the diamond by the use of an extending device to increase the length and the volume of a recess in a holder containing a SCD substrate as layers of diamond are deposited. The diamond is used for abrasives, cutting tools, gems, electronic substrates, heat sinks, electrochemical electrodes, windows for high power radiation and electron beams, and detectors.
    Type: Grant
    Filed: November 1, 2016
    Date of Patent: August 15, 2017
    Assignees: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USA
    Inventors: Jes Asmussen, Timothy A. Grotjohn, Donnie K. Reinhard, Rahul Ramamurti, M. Kagan Yaran, Thomas Schuelke, Michael Becker, David King
  • Publication number: 20170114476
    Abstract: The present invention relates to a microwave plasma deposition process and apparatus for producing diamond, preferably as single crystal diamond (SCD). The process and apparatus enables the production of multiple layers of the diamond by the use of an extending device to increase the length and the volume of a recess in a holder containing a SCD substrate as layers of diamond are deposited. The diamond is used for abrasives, cutting tools, gems, electronic substrates, heat sinks, electrochemical electrodes, windows for high power radiation and electron beams, and detectors.
    Type: Application
    Filed: November 1, 2016
    Publication date: April 27, 2017
    Inventors: Jes Asmussen, Timothy A. Grotjohn, Donnie K. Reinhard, Rahul Ramamurti, M. Kagan Yaran, Thomas Schuelke, Michael Becker, David King
  • Patent number: 9487858
    Abstract: The present invention relates to a microwave plasma deposition process and apparatus for producing diamond, preferably as single crystal diamond (SCD). The process and apparatus enables the production of multiple layers of the diamond by the use of an extending device to increase the length and the volume of a recess in a holder containing a SCD substrate as layers of diamond are deposited. The diamond is used for abrasives, cutting tools, gems, electronic substrates, heat sinks, electrochemical electrodes, windows for high power radiation and electron beams, and detectors.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: November 8, 2016
    Assignees: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USA
    Inventors: Jes Asmussen, Timothy Grotjohn, Donnie Reinhard, Rahul Ramamurti, M. Kagan Yaran, Thomas Schuelke, Michael Becker, David King
  • Patent number: 9139909
    Abstract: New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures ranging from about 10 Torr to about 760 Torr. The disclosed microwave plasma assisted reactors include a movable lower sliding short and/or a reduced diameter conductive stage in a coaxial cavity of a plasma chamber. For a particular application, the lower sliding short position and/or the conductive stage diameter can be variably selected such that, relative to conventional reactors, the reactors can be tuned to operate over larger substrate areas, operate at higher pressures, and discharge absorbed power densities with increased diamond synthesis rates (carats per hour) and increased deposition uniformity.
    Type: Grant
    Filed: October 22, 2012
    Date of Patent: September 22, 2015
    Assignees: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY, Fraunhofer USA
    Inventors: Jes Asmussen, Timothy Grotjohn, Donnie K. Reinhard, Thomas Schuelke, M. Kagan Yaran, Kadek W. Hemawan, Michael Becker, David King, Yajun Gu, Jing Lu
  • Patent number: 8911868
    Abstract: A coating based on diamond-like is formed from a plurality of films of diamond-like carbon formed alternatingly over one another and in this respect a film in which no portion or only a much lower portion of doped fluorine is contained. A film in which fluorine or at least fluorine with a higher portion than the film arranged thereunder or thereabove are formed alternatingly over one another. The coating could be manufactured by using a target of pure carbon. Films are deposited on a surface of a substrate by means of a PVD process, with the portion of fluorine contained in doped form. Films are formed alternately being varied by varying a supplied volume flow of a fluorine/carbon compound or sulfur/fluorine compound as a precursor.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: December 16, 2014
    Assignees: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V., Fraunhofer USA, Inc.
    Inventors: Hans-Joachim Scheibe, Thomas Schuelke, Lars Haubold, Michael Becker, Yaran Mahmut