Abstract: In an apparatus for the production of coatings with a uniform thickness profile on substrates by cathode sputtering, a substrate carriage held and guided between rollers is provided, which can be driven through the coating chamber, and which has substrate disks rotatably mounted on its side facing the cathode. The axes of rotation of the substrate disks are disposed transversely of the plane of movement of the substrate carriage. On the side of the substrate carriage facing away from the cathode, a row of permanent magnets is fixedly disposed on magnet holders. The permanent magnets produce a disk current in magnetic disks which are joined for co-rotation with the pivot shafts of the substrate disks. On account of the disk current, the magnetic disks, and with them also the substrate disks, are made to rotate in passing along the row of magnets.