Patents by Inventor Thomas Bischoff
Thomas Bischoff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9329499Abstract: The disclosure provides an arrangement for an optical device including a component of the optical device and a support structure supporting the component. The support structure includes at least one locking device connected to the component and including a first fixation device and an associated second fixation device. The first fixation device and the second fixation device are adapted to be, in a movable state, movable with respect to each other along a first degree of freedom and a second degree of freedom into a final position. The first fixation device and the second fixation device are further adapted to be, in a locked state, fixed in the final position by at least one locking device contacting the first fixation device and the second fixation device.Type: GrantFiled: September 29, 2009Date of Patent: May 3, 2016Assignee: Carl Zeiss SMT GmbHInventors: Thomas Bischoff, Joachim Feucht, Jochen Wieland, Stefan Mueller
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Patent number: 9280060Abstract: A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.Type: GrantFiled: September 25, 2014Date of Patent: March 8, 2016Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Publication number: 20150167208Abstract: A textile part is configured for producing a composite-material element (11) or a composite-material body (12). The textile part (10) has a reinforcing system (15) including reinforcing warp threads (16) and reinforcing weft threads (17), and a binding system (25) with binding warp threads (27) and binding weft threads (26). The reinforcing system (15) has at least one first portion (20), into which the reinforcing threads (16, 17) are interwoven with one another directly for binding to facilitate withstanding high mechanical. The reinforcing system (15) also has at least one second portion (21), in which the reinforcing threads (16, 17) form binding-free crossover locations (22) preferably laid on one another in a drawn-out state to constitute a laid structure surrounded by the binding threads (26, 27). The laid structure of the reinforcing system (15), ensures particularly good draping and deformation capability at this location of the composite material.Type: ApplicationFiled: April 18, 2013Publication date: June 18, 2015Inventor: Thomas Bischoff
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Publication number: 20150126089Abstract: A fabric (10) for use in composite materials having a reinforcing system (11) made of reinforcing warp threads (13) and reinforcing weft threads (14), which are placed on top of one other in two different reinforcing layers (16), (17). A binding system (12) of binding warp threads (20) and binding weft threads (21) is formed from a binding yarn (30) with a lower yarn count than the reinforcing yarn (15). The reinforcing system (11) is enclosed between the binding warp threads (20) on the one side and the binding weft threads (21) on the other side, and thus, held in place at binding points (22). At each binding point (22), a binding warp thread (20) is guided and held between a stationary warp thread (25) and a regular warp thread (24) of a warp thread pair (23) of binding warp threads (20). Between two adjacent binding points of a warp thread pair (23), the stationary warp thread (25) and the regular warp thread (24) have intersecting points (26).Type: ApplicationFiled: March 1, 2012Publication date: May 7, 2015Applicant: GROZ-BECKERT KGInventors: Thomas Bischoff, Melike Afsar
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Publication number: 20150022798Abstract: A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.Type: ApplicationFiled: September 25, 2014Publication date: January 22, 2015Inventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Patent number: 8873023Abstract: An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects.Type: GrantFiled: July 19, 2011Date of Patent: October 28, 2014Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Publication number: 20140022658Abstract: There is provided a facet mirror device comprising a facet element and a support unit, the support unit supporting the facet element. The support unit comprises a first support element and a second support element, the second support element being connected to the facet element to support the facet element. The first support element is connected to the second support element to support the second support element, the first support element being connected to the second support element via at least one flexure unit, the flexure unit comprising at least one flexure.Type: ApplicationFiled: October 7, 2013Publication date: January 23, 2014Inventors: Gerhard-Wilhelm Ziegler, Thomas Bischoff
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Publication number: 20120075611Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: November 30, 2011Publication date: March 29, 2012Applicant: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bun Patrick Kwan, Michael Muehlbeyer
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Publication number: 20120019796Abstract: An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects.Type: ApplicationFiled: July 19, 2011Publication date: January 26, 2012Applicant: CARL ZEISS SMT GMBHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Patent number: 8089707Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: GrantFiled: February 4, 2010Date of Patent: January 3, 2012Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
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Patent number: 8009343Abstract: An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.Type: GrantFiled: July 2, 2004Date of Patent: August 30, 2011Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Gellrich, Thomas Bischoff, Hermann Bieg, Martin Huber, Francois Henzelin, Gerhard Szekely, Uy-Liem Nguyen, Martin E. Humphries
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Publication number: 20110063590Abstract: An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical element has a first coefficient of thermal expansion. The optical element holder holds the optical element via the first contact element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being different from the first coefficient of thermal expansion. At least one of the module components is adapted to provide at least a reduction of forces introduced into the optical element upon a thermally induced position change in the relative position between the optical element and the optical element holder, the position change resulting from a temperature situation variation in a temperature situation of the plurality of module components.Type: ApplicationFiled: November 22, 2010Publication date: March 17, 2011Applicant: CARL ZEISS SMT AGInventors: Thomas Bischoff, Hagen Federau, Willi Heintel, Bernd Wuesthoff, Jochen Wieland
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Patent number: 7859641Abstract: An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical element has a first coefficient of thermal expansion. The optical element holder holds the optical element via the first contact element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being different from the first coefficient of thermal expansion. At least one of the module components is adapted to provide at least a reduction of forces introduced into the optical element upon a thermally induced position change in the relative position between the optical element and the optical element holder, the position change resulting from a temperature situation variation in a temperature situation of the plurality of module components.Type: GrantFiled: January 17, 2008Date of Patent: December 28, 2010Assignee: Carl Zeiss SMT AGInventors: Thomas Bischoff, Hagen Federau, Willi Heintel, Bernd Wuesthoff, Jochen Wieland
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Publication number: 20100134777Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: February 4, 2010Publication date: June 3, 2010Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bun Patrick Kwan, Michael Muehlbeyer
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Publication number: 20100079737Abstract: The disclosure provides an arrangement for an optical device including a component of the optical device and a support structure supporting the component. The support structure includes at least one locking device connected to the component and including a first fixation device and an associated second fixation device. The first fixation device and the second fixation device are adapted to be, in a movable state, movable with respect to each other along a first degree of freedom and a second degree of freedom into a final position. The first fixation device and the second fixation device are further adapted to be, in a locked state, fixed in the final position by at least one locking device contacting the first fixation device and the second fixation device.Type: ApplicationFiled: September 29, 2009Publication date: April 1, 2010Applicant: CARL ZEISS SMT AGInventors: Thomas Bischoff, Joachim Feucht, Jochen Wieland, Stefan Mueller
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Patent number: 7684125Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: GrantFiled: December 18, 2003Date of Patent: March 23, 2010Assignee: Carl Zeiss SMT AGInventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bum Patrick Kwan, Michael Muehlbeyer
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Publication number: 20090021820Abstract: An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.Type: ApplicationFiled: July 2, 2004Publication date: January 22, 2009Applicant: CARL ZEISS SMT AGInventors: Bernhard Gellrich, Thomas Bischoff, Hermann Bieg, Martin Huber, Francois Henzelin, Gerhard Szekely, Uy-Liem Nguyen, Martin E. Humphries
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Publication number: 20080239270Abstract: An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical element has a first coefficient of thermal expansion. The optical element holder holds the optical element via the first contact element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being different from the first coefficient of thermal expansion. At least one of the module components is adapted to provide at least a reduction of forces introduced into the optical element upon a thermally induced position change in the relative position between the optical element and the optical element holder, the position change resulting from a temperature situation variation in a temperature situation of the plurality of module components.Type: ApplicationFiled: January 17, 2008Publication date: October 2, 2008Applicant: CARL ZEISS SMT AGInventors: Thomas Bischoff, Hagen Federau, Willi Heintel, Bernd Wuesthoff, Jochen Wieland
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Publication number: 20070155250Abstract: A modular terminal assembly, which may be a connector assembly, for a medical electrical lead includes at least one contact conductor extending therefrom that may or may not be coupled to a lead body conductor. A lead body assembly, for the medical electrical lead that includes the lead body conductor may be selected from a group of different lead body assemblies.Type: ApplicationFiled: December 29, 2005Publication date: July 5, 2007Inventors: Bruce Mehdizadeh, Thomas Bischoff, Scott Robinson, Eric Stetz, James Millin
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Publication number: 20070053076Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: December 18, 2003Publication date: March 8, 2007Inventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muhlbeyer