Patents by Inventor Thomas D. Weiton

Thomas D. Weiton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of fluid placement and diversion in subterranean formations
    Patent number: 8016034
    Abstract: Improved methods of placing and/or diverting treatment fluids in subterranean formations are provided. In one embodiment, the methods comprise: introducing a diverting material into a subterranean formation penetrated by a well bore to reduce or prevent the flow of fluid into a first portion of the subterranean formation; introducing a first fluid into a second portion of the subterranean formation having a higher fluid flow resistance than the first portion of the subterranean formation; allowing the diverting material to be removed from the subterranean formation after at least a portion of the first fluid has been introduced into the second portion of the subterranean formation; and introducing a second fluid into the first portion of the subterranean formation.
    Type: Grant
    Filed: September 1, 2009
    Date of Patent: September 13, 2011
    Assignee: Halliburton Energy Services, Inc.
    Inventors: Gerard Glasbergen, Thomas D. Weiton, Danial Gualtien
  • Methods of Fluid Placement and Diversion in Subterranean Formations
    Publication number: 20110048708
    Abstract: Improved methods of placing and/or diverting treatment fluids in subterranean formations are provided. In one embodiment, the methods comprise: introducing a diverting material into a subterranean formation penetrated by a well bore to reduce or prevent the flow of fluid into a first portion of the subterranean formation; introducing a first fluid into a second portion of the subterranean formation having a higher fluid flow resistance than the first portion of the subterranean formation; allowing the diverting material to be removed from the subterranean formation after at least a portion of the first fluid has been introduced into the second portion of the subterranean formation; and introducing a second fluid into the first portion of the subterranean formation.
    Type: Application
    Filed: September 1, 2009
    Publication date: March 3, 2011
    Inventors: Gerard Glasbergen, Thomas D. Weiton, Danial Gualtien