Abstract: Stable, aqueous solutions of chlorine dioxide and methods for producing stable, aqueous solutions of chlorine dioxide are disclosed. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 1000 ppm by weight or less of total impurities and/or 10 ppm or less of manganese and iron combined. The aqueous chlorine dioxide solutions are storage stable for at least 90 days at 25° C. and maintain at least 75% of the initial chlorine dioxide concentration. Methods of preparing, using and transporting the chlorine dioxide solutions are also disclosed.

Abstract: New methods are disclosed for decontaminating surfaces and enclosures that avoid problems such as salt deposits, corrosion and condensation that accompany the use of known methods. The methods involve the use of chlorine dioxide solutions prepared by passing dilute chlorine gas over solid granular sodium chlorite to produce chlorine dioxide gas which is then collected to form a solution with very low levels of impurities. The chlorine dioxide gas can be introduced into an enclosure and used to disinfect a portion of the contents of the enclosure.

Abstract: Stable, aqueous solutions of chlorine dioxide and methods for producing stable, aqueous solutions of chlorine dioxide are disclosed. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 1000 ppm by weight or less of total impurities and/or 10 ppm or less of manganese and iron combined. The aqueous chlorine dioxide solutions are storage stable for at least 90 days at 25° C. and maintain at least 75% of the initial chlorine dioxide concentration. Methods of preparing, using and transporting the chlorine dioxide solutions are also disclosed.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepared by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepared by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepared by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: A fluid application device includes a clamp portion including two clamp arms, at least one of the clamp arms including a sponge, a reservoir to store a fluid, and a trigger to move the clamp arms towards each other when pressed a first distance and to pump fluid from the reservoir to the sponge when pressed a second distance greater than the first distance.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: A fluid application device includes a clamp portion including two clamp arms, at least one of the clamp arms including a sponge, a reservoir to store a fluid, and a trigger to move the clamp arms towards each other when pressed a first distance and to pump fluid from the reservoir to the sponge when pressed a second distance greater than the first distance.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepared by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: New compositions and methods are disclosed for decontaminating surfaces and enclosures that avoid problems such as salt deposits, corrosion and condensation that accompany the use of known methods. The process involves the use of chlorine dioxide solutions prepared by passing dilute chlorine gas over solid granular sodium chlorite to produce chlorine dioxide gas which is then collected in solution. The chlorine dioxide gas can be introduced into an enclosure and used to disinfect a portion of the contents of the enclosure.

Abstract: A plastic cutlery item molded from a plastic material, such as polystyrene, having a metallic coating that imparts to this cutlery item the appearance of metal cutlery or silverware. In one embodiment the plastic cutlery or tableware items are molded using injection molding techniques, and subjected to a vacuum metallizing process in an individualized non-contiguous manner, where a thin metallic layer is deposited on at least one of their surfaces. The resultant items simulate the appearance of metal cutlery or tableware. In one embodiment of the invention the plastic cutlery or tableware articles are molded from a clear polystyrene resin and are coated with a thin stainless steel layer through vacuum sputtering deposition on only one of the sides. The abrasion resistance of the metallic coating can be enhanced by subjecting the articles to a post-metallizing holding period or by applying a clear protective overcoat.