Patents by Inventor Thomas F. Vezza

Thomas F. Vezza has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11261524
    Abstract: Chemical vapor deposition processes and coated articles are disclosed. The process includes a first introducing of a first amount of silane to the enclosed chamber, the first amount of the silane remaining within the enclosed chamber for a first period of time, a first decomposing of the first amount of the silane during at least a portion of the first period of time, a second introducing of a second amount of the silane to the enclosed chamber, the second amount of the silane remaining within the enclosed chamber for a second period of time, and a second decomposing of the second amount of the silane during at least a portion of the second period of time. The process is devoid of inert gas purging between the first decomposing and the second introducing and/or produces a chemical vapor deposition coating devoid of hydrogen bubbles.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: March 1, 2022
    Assignee: SilcoTek Corp.
    Inventors: Thomas F. Vezza, James B. Mattzela, Gary A. Barone, Jesse Bischof, David A. Smith
  • Patent number: 10876206
    Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: December 29, 2020
    Assignee: SILCOTEK CORP.
    Inventors: Thomas F. Vezza, James B. Mattzela, Gary A. Barone, William David Grove, Paul H. Silvis
  • Publication number: 20190309414
    Abstract: Chemical vapor deposition processes and coated articles are disclosed. The process includes a first introducing of a first amount of silane to the enclosed chamber, the first amount of the silane remaining within the enclosed chamber for a first period of time, a first decomposing of the first amount of the silane during at least a portion of the first period of time, a second introducing of a second amount of the silane to the enclosed chamber, the second amount of the silane remaining within the enclosed chamber for a second period of time, and a second decomposing of the second amount of the silane during at least a portion of the second period of time. The process is devoid of inert gas purging between the first decomposing and the second introducing and/or produces a chemical vapor deposition coating devoid of hydrogen bubbles.
    Type: Application
    Filed: April 9, 2019
    Publication date: October 10, 2019
    Inventors: Thomas F. VEZZA, James B. MATTZELA, Gary A. BARONE, Jesse BISCHOF, David A. SMITH
  • Publication number: 20180258529
    Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.
    Type: Application
    Filed: August 31, 2016
    Publication date: September 13, 2018
    Inventors: Thomas F. VEZZA, James B. MATTZELA, Gary A. BARONE, William David GROVE, Paul H. SILVIS
  • Publication number: 20170211180
    Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species.
    Type: Application
    Filed: January 22, 2016
    Publication date: July 27, 2017
    Inventors: Thomas F. VEZZA, Steven A. CONDO, Nicholas Peter DESKEVICH, James B. MATTZELA, Paul H. SILVIS
  • Patent number: 5976240
    Abstract: An additive for reducing the calcium aluminate cement content in a refractory mix containing calcium aluminate cement. The additive is comprised of about 80% by weight amorphous, powdered metakaolin, the metakaolin having a mean particle size of less than about 3.0 microns, and about 20% by weight microsilica, the microsilica having a mean particle size of less than 45 microns.
    Type: Grant
    Filed: September 8, 1997
    Date of Patent: November 2, 1999
    Assignee: North American Refractories Co.
    Inventor: Thomas F. Vezza
  • Patent number: 5972102
    Abstract: This invention relates to cement-free refractories exhibiting high green strength, improved corrosion resistance, and improved magnesium oxide hydration resistance useful as refractory castables for steel ladles, slag contact areas, ladle sidewalls and bottoms, and the like and as precast refractory shapes, such as well blocks, nest blocks, and the like. More particularly, this invention is directed hydraulically-bonded monolithic refractories containing a calcium oxide-free binder comprised of a hydratable alumina source and magnesium oxide and which exhibit high green strength, improved corrosion resistance, improved magnesium oxide hydration resistance, and controllable work and set times.
    Type: Grant
    Filed: October 29, 1996
    Date of Patent: October 26, 1999
    Assignee: North American Refractories Co.
    Inventor: Thomas F. Vezza
  • Patent number: 5135896
    Abstract: A high alumina ceramic composition has controlled small amounts of MgO and CaO. When refractories made from the composition are fired, the alumina and MgO react to form spinel. The CaO promotes such reaction while minimizing undesirable expansion, and results in a refractory having significantly improved hot strength and other desirable physical properties.
    Type: Grant
    Filed: October 31, 1989
    Date of Patent: August 4, 1992
    Assignee: North American Refractories Company
    Inventor: Thomas F. Vezza
  • Patent number: 4639474
    Abstract: A monolithic refractory composition having relatively high thermal conductivity and a relatively high degree of water insolubility consisting essentially of, by weight, 50-75% coarse grain flake graphite; 5-30% fine grain flake graphite; and the remainder crude clay; and the addition based upon the total weight of said mix of 10-25% liquid phenolic resin in combination with an alcoholic solvent, and a resin curing agent.
    Type: Grant
    Filed: December 8, 1983
    Date of Patent: January 27, 1987
    Assignee: Dresser Industries, Inc.
    Inventor: Thomas F. Vezza