Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.

Abstract: A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.

Abstract: A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.

Abstract: A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.

Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and includes a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.

Abstract: A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article suppor

Abstract: A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.

Abstract: A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.

Abstract: A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.

Abstract: In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool. A laser may also be used for in situ cleaning of components of a lithographic projection apparatus.

Abstract: A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.

Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

Abstract: In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool. A laser may also be used for in situ cleaning of components of a lithographic projection apparatus.

Abstract: The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic projection apparatus to compensate for the calculated change in aberration effect. The parameters are obtained by a calibration operation, which may comprise a coarse calibration followed by at least one fine calibration. The coarse calibration yields a first estimate of at least a subset of the parameters. The estimate can be used as an input for a subsequent fine calibration. The calibration may also comprise a single fine calibration.

Abstract: The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic projection apparatus to compensate for the calculated change in aberration effect.